Abstract:
A method of supplying ammonia to a gas chromatography-chemical ionization tandem mass spectrometry (GC/CI-MS/MS) includes the steps of: providing ammonium carbonate and diethanolamine in a reaction vessel; heating the reaction vessel to a temperature of 50-60° C. to decompose the ammonium carbonate to form ammonia, carbon dioxide and water; absorbing the carbon dioxide and water by the diethanolamine to form diethanolamine carbonate; and supplying the ammonia to the GC/CI-MS/MS. Another method of supplying ammonia to a gas chromatography-chemical ionization tandem mass spectrometry (GC/CI-MS/MS) includes the steps of: providing ammonium carbonate and a mixture of monoethanolamine and diethanolamine in a reaction vessel; reacting the ammonium carbonate with the monoethanolamine to form ammonia and monoethanolamine carbonate; and supplying the ammonia to the GC/CI-MS/MS.
Abstract:
A system for ammonia distillation may include a condenser to condense ammonia vapor into liquid anhydrous ammonia, a flush tank to receive a flushed portion of the liquid anhydrous ammonia, a collection tank to receive a collected portion of the liquid anhydrous ammonia, and a corrosion inhibitor dispenser to transfer a corrosion inhibitor to the collected portion of the liquid anhydrous ammonia to form corrosion-inhibiting liquid anhydrous ammonia.
Abstract:
The present invention relates to a method for producing of electronic grade aqueous ammonium fluoride solution. The industrial grade liquid ammonia is used as the raw material, when it is heated, the ammonia gas will be released. The organic gas impurities in the ammonia gas are removed by activated charcoal, and the oxygen is removed by deoxidizer, and then the high-purity ammonia gas is gotten. The high-purity hydrofluoric acid absorbs and reacts with the high-purity ammonia gas to obtain the electronic grade aqueous ammonium fluoride solution. The product has high-purity and stable quality, and it can be used in producing of electronic products directly. The method for producing of electronic grade ammonium aqueous fluoride solution provided by the present invention is suitable for continuous production on a large scale because of its simple operation.
Abstract:
The present invention relates to a method for depleting halide ions from liquid ammonia, wherein the liquid ammonia is brought into contact with a strongly basic ion exchanger, where the basic structure of the strongly basic ion exchanger is a covalently crosslinked polymer matrix. Furthermore, the present invention relates to the use of an ammonia obtainable according to the invention as starting material in the production of amines.
Abstract:
An ammonia purification system includes a hydrocarbon removal station that removes hydrocarbons from gaseous ammonia via adsorption, a moisture removal station that removes water from gaseous ammonia via adsorption, and a distillation station including a distillation column connected with a condenser to facilitate removal of impurities from ammonia and condensation of gaseous ammonia to form a purified liquid ammonia product. The system further includes a storage tank to receive purified ammonia, a remote station connected with the storage tank, and a vaporizer connected with the storage tank. The vaporizer is configured to receive and vaporize liquid ammonia from the storage tank and deliver gaseous ammonia back to the storage tank so as to facilitate pumping of the ammonia to the remote station based upon a vapor pressure established within the storage tank.
Abstract:
The present invention relates to a novel process for the preparation of high-purity chemicals with an extremely low particle count, such as ammonia gas, hydrogen fluoride and hydrogen chloride, which are also used as aqueous solutions in semiconductor technology the corrosive gas is enriched with an absorbent which is miscible with the gas and in which impurities present in the gas are soluble, and the gas is subsequently subjected to membrane filtration.
Abstract:
A system and method for generating, purifying, and using ultra-pure ammonia on-site, such as at a semiconductor manufacturing facility. The system includes an ammonia generation system configured to generate ammonia including carbon dioxide, water, and other impurities. A purification system is provided with the generation system in the manufacturing facility and is linked to the output of the generation system. The purification system processes the effluent from the ammonia generation system to remove substantially all of the carbon dioxide, water, and other impurities to produce an outlet stream of ultra-pure ammonia. The system further includes a point of use system provided at the same manufacturing facility to utilize the outlet stream of ultra-pure ammonia.
Abstract:
This invention relates to an improvement in a process for removing water from a hydride gas, and particularly ammonia, by contacting the hydride gas with a drying agent under conditions for effecting removal of the water. The improvement for significantly reducing the water content to trace levels in said hydride gas resides in the use of at least Group 1 metal oxide and at least one Group 2 metal oxide as a drying agent.
Abstract:
The present invention relates to a novel process for the preparation of high-purity chemicals with an extremely low particle count, such as ammonia gas, hydrogen fluoride and hydrogen chloride, which are also used as aqueous solutions in semiconductor technology the corrosive gas is enriched with an absorbent which is miscible with the gas and in which impurities present in the gas are soluble, and the gas is subsequently subjected to membrane filtration.
Abstract:
A method which reduces iron contamination of a system which receives ammonia from an ammonia recovery process by one or more of the following techniques: a) Physically separating iron oxide, iron containing colloidal particles, and liquid droplets from the gas stream; b) Preventing AC from depositing on piping via elimination of condensation, thereby preventing corrosion of the piping; or c) Installing piping and equipment that is not susceptible to corrosive attack by AC, thereby eliminating the source of iron contamination.