Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
    8.
    发明授权
    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby 有权
    在衬底上组装纳米结构的方法和由此形成的纳米结构的纳米分子器件

    公开(公告)号:US08329386B2

    公开(公告)日:2012-12-11

    申请号:US12704899

    申请日:2010-02-12

    IPC分类号: G03F7/26

    摘要: A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed.

    摘要翻译: 提供了一种在衬底上选择性地定位纳米结构的方法,其包括:在衬底上形成光致抗蚀剂图案,然后在纳米单元中控制光致抗蚀剂图案的线宽以形成纳米光致抗蚀剂层的第一步骤; 形成用于防止在其上形成有纳米光致抗蚀剂层的基板上的未成型区域中的纳米材料的吸附的保护层的第二步骤; 去除形成在基板上的光致抗蚀剂层的第三步骤; 在去除了光致抗蚀剂层的区域中形成带正电荷或带负电荷的吸附剂层的第四步骤; 以及将在吸附剂层的相反极性上填充的含纳米材料的溶液涂布到已经形成有吸附剂层的基板上的第五步骤。

    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
    9.
    发明申请
    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby 有权
    在衬底上组装纳米结构的方法和由此形成的纳米结构的纳米分子器件

    公开(公告)号:US20100216076A1

    公开(公告)日:2010-08-26

    申请号:US12704899

    申请日:2010-02-12

    IPC分类号: G03F7/20

    摘要: A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed.

    摘要翻译: 提供了一种在衬底上选择性地定位纳米结构的方法,其包括:在衬底上形成光致抗蚀剂图案,然后在纳米单元中控制光致抗蚀剂图案的线宽以形成纳米光致抗蚀剂层的第一步骤; 形成用于防止在其上形成有纳米光致抗蚀剂层的基板上的未成型区域中的纳米材料的吸附的保护层的第二步骤; 去除形成在基板上的光致抗蚀剂层的第三步骤; 在去除了光致抗蚀剂层的区域中形成带正电荷或带负电荷的吸附剂层的第四步骤; 以及将在吸附剂层的相反极性上填充的含纳米材料的溶液涂布到已经形成有吸附剂层的基板上的第五步骤。