Display device and method of manufacturing the display device

    公开(公告)号:US11335869B2

    公开(公告)日:2022-05-17

    申请号:US16906866

    申请日:2020-06-19

    Abstract: A method of manufacturing a display device includes providing an inorganic layer on a carrier substrate, providing a first flexible substrate on the inorganic layer, providing a first shielding layer including a metal on the first flexible substrate, providing a first barrier layer on the first shielding layer, and providing a thin film transistor layer on the first barrier layer. The inorganic layer includes at least one material selected from silicon nitride (SiNx), silicon oxide (SiOx), and silicon oxynitride (SiOxNy), and a thickness of the inorganic layer is in a range from about 10 Å to about 6000 Å.

    LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20190096858A1

    公开(公告)日:2019-03-28

    申请号:US15927678

    申请日:2018-03-21

    Abstract: A light emitting device includes: a substrate; a first electrode and a second electrode on the substrate and spaced apart from each other; a light emitting diode between the first electrode and the second electrode and connected to the first and second electrodes; a first contact on the first electrode; and a second contact on the second electrode. The first contact contacts the first electrode and a first portion of the light emitting diode, and the second contact contacts the second electrode and a second portion of the light emitting diode.

    Display device
    5.
    发明授权

    公开(公告)号:US12094977B2

    公开(公告)日:2024-09-17

    申请号:US18109301

    申请日:2023-02-14

    CPC classification number: H01L29/78606 H01L27/1225 H10K59/1213

    Abstract: A display device includes a buffer layer disposed on a substrate and comprising a first buffer film, and a second buffer film, wherein the first buffer film and the second buffer film are sequentially stacked in a thickness direction of the display device; a semiconductor pattern disposed on the buffer layer; a gate insulating layer disposed on the semiconductor pattern; and a gate electrode disposed on the gate insulating layer, wherein the first buffer film and the second buffer film comprise a same material, and a density of the first buffer film is greater than a density of the second buffer film.

    Display device and method of manufacturing display device

    公开(公告)号:US11532682B2

    公开(公告)日:2022-12-20

    申请号:US16879291

    申请日:2020-05-20

    Abstract: A display device includes a base substrate including a display area and a non-display area around the display area are defined, a first interlayer insulating layer disposed on the base substrate, a second interlayer insulating layer disposed on the first interlayer insulating layer, a first semiconductor layer disposed on the second interlayer insulating layer and including an oxide, and a first gate insulating layer disposed on the first semiconductor layer, wherein the material of the first interlayer insulating layer and the material of the second interlayer insulating layer are different from each other. Methods of manufacturing a display device are also disclosed.

    Light emitting device having first and second electrodes

    公开(公告)号:US10607968B2

    公开(公告)日:2020-03-31

    申请号:US15927678

    申请日:2018-03-21

    Abstract: A light emitting device includes: a substrate; a first electrode and a second electrode on the substrate and spaced apart from each other; a light emitting diode between the first electrode and the second electrode and connected to the first and second electrodes; a first contact on the first electrode; and a second contact on the second electrode. The first contact contacts the first electrode and a first portion of the light emitting diode, and the second contact contacts the second electrode and a second portion of the light emitting diode.

Patent Agency Ranking