公开(公告)号：US20250065380A1

公开(公告)日：2025-02-27

申请号：US18791445

申请日：2024-08-01

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： MING-CHIEN CHIU ,  CHIA-HO CHUANG ,  HSIN-MIN HSUEH ,  YEN-CHENG TU

IPC: B08B7/00 ,  B08B9/28 ,  B08B9/46

Abstract: A dry cleaning device adapted to clean a container component of a container of a semiconductor manufacturing process and adapted to clean the container component by carbon dioxide snowflakes. The dry cleaning device can first inspect the container component before and after cleaning, clean the container component by carbon dioxide snowflakes according to a predetermined cleaning working set, and forwards the container component to a next workstation once the cleaning of the container component is complete. The dry cleaning device is adapted to clean a container of a semiconductor manufacturing process in a fast and effective manner without involving any liquid solvents.

公开(公告)号：US12154806B2

公开(公告)日：2024-11-26

申请号：US17163450

申请日：2021-01-31

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  Yung-Chin Pan ,  Wei-Chian Liu

IPC: H01L21/673

Abstract: The invention discloses a substrate carrier latching structure, which mainly comprises a top portion, a cover and a detachable module. The top portion is disposed on the enclosure of a substrate carrier, and the cover is connected to the top portion via a detachable module. As such, the excessive stress on the substrate carrier is avoided to maintain the integrity of substrates stored in the inner portion of the substrate carrier.

公开(公告)号：US20240321614A1

公开(公告)日：2024-09-26

申请号：US18519139

申请日：2023-11-27

Applicant: Gudeng Precision Industrial Co, Ltd.

Inventor： MING-CHIEN CHIU ,  EN-NIEN SHEN ,  CHIA-HO CHUANG ,  KUO-HUA LEE ,  JYUN-MING LYU

IPC: H01L21/673 ,  H01L21/67

CPC classification number: H01L21/67386 ,  H01L21/67017 ,  H01L21/67393

Abstract: A valve cover for using in a substrate carrier includes a main body and plural elastic arms. The substrate carrier has a shell and a base disposed on a bottom of the shell. A purge valve is received at the bottom and a gas opening is provided on the base. The main body of the valve cover is disposed on the base, and the elastic arms are disposed on the main body and located at the gas opening. The elastic arms are used for fixing the valve cover between the bottom of the shell and the base. A top face of the valve cover is lower than a surface height of the base and a surface height of the purge valve.

公开(公告)号：US20240312817A1

公开(公告)日：2024-09-19

申请号：US18539477

申请日：2023-12-14

Applicant: GUDENG PRECISION INDUSTRIAL CO, LTD.

Inventor： Ming-Chien CHIU ,  Chia-Ho CHUANG ,  Kuo-Hua LEE ,  En-Nien SHEN ,  Jyun-Ming LYU

IPC: H01L21/673

CPC classification number: H01L21/67386 ,  H01L21/67393

Abstract: Provided is a substrate carrier including: a shell defining therein a wafer storage space; and at least one installation structure integrally formed with an inner wall of the shell and adapted to hold at least one gas diffuser, allowing the at least one gas diffuser to be disposed outside an operating range of a front end of a robotic arm. Not only is the installation structure of the substrate carrier structurally simplified, but the gas diffuser is also prevented from interfering with the robotic arm.

公开(公告)号：US20240312816A1

公开(公告)日：2024-09-19

申请号：US18399889

申请日：2023-12-29

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  Chia-Ho Chuang ,  Hsin-Min Hsueh ,  Yu-Ruei Chen

IPC: H01L21/673 ,  G03F1/66 ,  G03F7/00 ,  H05F3/00

CPC classification number: H01L21/67386 ,  G03F1/66 ,  G03F7/70741 ,  H01L21/67359 ,  H05F3/00

Abstract: A reticle pod with backside static dissipation has an inner pod defining an accommodation space for a reticle. Multiple flexible guiding components are correspondingly disposed on multiple outer mounting portions of the inner pod in order to guide an inner cover and an inner base of the inner pod to position without relative displacement. Multiple conductive retainers are correspondingly arranged in the accommodation space to push against a backside of the reticle and form a full-time electrical conduction with the back side of the reticle, so as to establish a static dissipation path by the conductive retainers and the inner pod. Meanwhile, with the conductive retainers pushing against the reticle as well as the flexible guiding components providing the inner cover and the inner base with automatic position guiding, the reticle is automatically pushed and positioned to a center position of the inner base.

公开(公告)号：US20240242991A1

公开(公告)日：2024-07-18

申请号：US18432196

申请日：2024-02-05

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  Chia-Ho Chuang ,  Kuo-Hua Lee ,  Shu-Hung Lin ,  Chia-Ch Lin

IPC: H01L21/673

CPC classification number: H01L21/67359 ,  H01L21/67379 ,  H01L21/67386

Abstract: The present invention provides a reticle pod comprising a lower cover and a support mechanism. The lower cover includes a carrying surface and a plurality of securing seats distributed on the carrying surface. The support mechanism includes a supporting portion extending upward for supporting a reticle or a reticle carrier, and a securing portion opposite the supporting portion, wherein the securing portion is detachably connected with a corresponding securing seat, so that the support mechanism can be selectively installed on the lower cover.

公开(公告)号：US20240105481A1

公开(公告)日：2024-03-28

申请号：US18070390

申请日：2022-11-28

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： MING-CHIEN CHIU ,  CHIH-MING LIN ,  CHENG-HAN CHOU ,  PO-TING LEE

IPC: H01L21/673

CPC classification number: H01L21/67373 ,  H01L21/67369 ,  H01L21/67386

Abstract: The present invention provides a latching guide structure arranged inside a door of semiconductor carrier. The latching guide structure comprises an upper latching part, a lower latching part, at least one elastic unit and a driver. Moreover, a first guiding portion of the upper latching part is matched with a second guiding portion of the lower latching part, therefore to define the installation space for the at least one elastic unit. On the other hand, the driver simultaneously actuates an upper actuating unit of the first guiding portion and a lower actuating unit of the second guiding portion to linearly move in reverse direction therebetween. The range of the linear motion of the upper actuating unit and the lower actuating unit represents the compression or extension of the at least one elastic unit, determining to control the open/close status of the upper latching part and the lower latching part.

公开(公告)号：US20240085807A1

公开(公告)日：2024-03-14

申请号：US18513827

申请日：2023-11-20

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien CHIU ,  Chia-Ho CHUANG ,  Hsin-Min HSUEH ,  Hsing-Min WEN

IPC: G03F7/00

CPC classification number: G03F7/70741

Abstract: The present invention discloses a reticle storage pod including an outer pod which includes an outer cover and an outer base. The outer cover and the outer base can be coupled to securely accommodate one of a first inner pod and a second inner pod that are differently structured in the outer pod. The first inner pod and the second inner pod are for individually accommodating a reticle. The outer cover is provided with at least one first hold-down mechanism and at least one second hold-down mechanism, and the first hold-down mechanism and the second hold-down mechanism respectively act on a cover of the first inner pod and a cover of the second inner pod that are differently structured.

公开(公告)号：US20230054753A1

公开(公告)日：2023-02-23

申请号：US17882703

申请日：2022-08-08

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Ming-Chien Chiu ,  CHIA-HO CHUANG ,  Kuo-Hua Lee ,  Shu-Hung Lin ,  Hao-Kang HSIA

IPC: H01L21/673

Abstract: The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.

公开(公告)号：US11511920B2

公开(公告)日：2022-11-29

申请号：US16929748

申请日：2020-07-15

Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.

Inventor： Chia-Ho Chuang ,  Hsin-Min Hsueh ,  Yi-Hsuan Lee ,  Hsing-Min Wen ,  Ming-Chien Chiu

IPC: B65D53/06 ,  B65D85/38 ,  G03F1/66 ,  H01L21/673 ,  B01D46/00 ,  B01D46/42 ,  B01D46/54 ,  F16K27/02 ,  B65D81/24 ,  B65D85/30 ,  G03F7/20

Abstract: The invention discloses a reticle storage device including a top lid, a bottom lid and a soft contact member. The top lid has a ceiling and a cover surrounding the ceiling. The bottom lid has a carrier and a peripheral structure surrounding the carrier. The soft contact member is configured to laterally extend in between the cover and the peripheral structure when the top lid and the bottom lid engage with each other, and to extend from an inside to an outside of the device in order to buffer the contact among the two lids.