Pixel based machine for patterned wafers

    公开(公告)号:US07016526B2

    公开(公告)日:2006-03-21

    申请号:US10003347

    申请日:2001-12-06

    IPC分类号: G06K9/00

    CPC分类号: G01N21/94 G01N21/9501

    摘要: A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from said signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.

    Pixel based machine for patterned wafers
    2.
    发明授权
    Pixel based machine for patterned wafers 失效
    用于图案化晶片的基于像素的机器

    公开(公告)号:US06810139B2

    公开(公告)日:2004-10-26

    申请号:US10281229

    申请日:2002-10-28

    IPC分类号: G06K900

    CPC分类号: G01N21/94 G01N21/9501

    摘要: A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from said signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.

    摘要翻译: 提供一种通过检查晶片上的各个像素来检测半导体晶片上的缺陷的方法,收集由其响应于扫描光束的光的方式限定的每个像素的签名,以及确定该签名是否为 无缺陷像素或缺陷或怀疑有缺陷的像素的像素。 还提供了一种用于确定这种缺陷的装置,其包括用于支撑晶片的台,产生被引导到晶片上的光束的激光源,收集光学器件和用于收集由晶片散射的激光的光电传感器 方向数量和产生相应的模拟信号,从所述信号导出的定义像素签名的数字分量的A / D转换器,以及用于识别可疑像素的签名并验证可疑像素是否确实是有缺陷的选择系统。

    Pixel based machine for patterned wafers
    3.
    发明授权
    Pixel based machine for patterned wafers 失效
    用于图案化晶片的基于像素的机器

    公开(公告)号:US06366690B1

    公开(公告)日:2002-04-02

    申请号:US09110870

    申请日:1998-07-07

    IPC分类号: G06K900

    CPC分类号: G01N21/94 G01N21/9501

    摘要: A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from the signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.

    摘要翻译: 提供一种通过检查晶片上的各个像素来检测半导体晶片上的缺陷的方法,收集由其响应于扫描光束的光的方式限定的每个像素的签名,以及确定该签名是否为 无缺陷像素或缺陷或怀疑有缺陷的像素的像素。 还提供了一种用于确定这种缺陷的装置,其包括用于支撑晶片的台,产生被引导到晶片上的光束的激光源,收集光学器件和用于收集由晶片散射的激光的光电传感器 方向数量并产生相应的模拟信号,从定义像素特征的信号数字分量得到的A / D转换器,以及用于识别可疑像素的签名的选择系统,并验证可疑像素是否确实是有缺陷的。

    Pixel based machine for patterned wafers
    4.
    发明授权
    Pixel based machine for patterned wafers 有权
    用于图案化晶片的基于像素的机器

    公开(公告)号:US07454052B2

    公开(公告)日:2008-11-18

    申请号:US11042509

    申请日:2005-01-26

    IPC分类号: G06K9/00 H04N7/18

    CPC分类号: G01N21/94 G01N21/9501

    摘要: A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from the signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.

    摘要翻译: 提供一种通过检查晶片上的各个像素来检测半导体晶片上的缺陷的方法,收集由其响应于扫描光束的光的方式限定的每个像素的签名,以及确定该签名是否为 无缺陷像素或缺陷或怀疑有缺陷的像素。 还提供了一种用于确定这种缺陷的装置,其包括用于支撑晶片的台,产生被引导到晶片上的光束的激光源,收集光学器件和用于收集由晶片散射的激光的光电传感器 方向数量并产生相应的模拟信号,从定义像素特征的信号数字分量得到的A / D转换器,以及用于识别可疑像素的签名的选择系统,并验证可疑像素是否确实是有缺陷的。

    Pixel based machine for patterned wafers
    5.
    发明申请
    Pixel based machine for patterned wafers 有权
    用于图案化晶片的基于像素的机器

    公开(公告)号:US20050129303A1

    公开(公告)日:2005-06-16

    申请号:US11042509

    申请日:2005-01-26

    CPC分类号: G01N21/94 G01N21/9501

    摘要: A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from the signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.

    摘要翻译: 提供一种通过检查晶片上的各个像素来检测半导体晶片上的缺陷的方法,收集由其响应于扫描光束的光的方式限定的每个像素的签名,以及确定该签名是否为 无缺陷像素或缺陷或怀疑有缺陷的像素的像素。 还提供了一种用于确定这种缺陷的装置,其包括用于支撑晶片的台,产生被引导到晶片上的光束的激光源,收集光学器件和用于收集由晶片散射的激光的光电传感器 方向数量并产生相应的模拟信号,从定义像素特征的信号数字分量得到的A / D转换器,以及用于识别可疑像素的签名的选择系统,并验证可疑像素是否确实是有缺陷的。

    Pixel based machine for patterned wafers
    6.
    发明申请

    公开(公告)号:US20050129302A1

    公开(公告)日:2005-06-16

    申请号:US11042084

    申请日:2005-01-26

    CPC分类号: G01N21/94 G01N21/9501

    摘要: A method is provided for the detection of defects on a semiconductor wafer by checking individual pixels on the wafer, collecting the signature of each pixel, defined by the way in which it responds to the light of a scanning beam, and determining whether the signature is that of a faultless pixel or of a pixel that is defective or suspect to be defective. An apparatus is also provided for the determination of such defects, which comprises a stage for supporting a wafer, a laser source generating a beam that is directed onto the wafer, collecting optics and photoelectric sensors for collecting the laser light scattered by the wafer in a number of directions and generating corresponding analog signals, an A/D converter deriving from the signals digital components defining pixel signatures, and selection systems for identifying the signatures of suspect pixels and verifying whether the suspect pixels are indeed defective.