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公开(公告)号：US20150082611A1
公开(公告)日：2015-03-26
申请号：US14376886
申请日：2012-02-06
Applicant: Rinya Kojo , Kenji Okushiro , Yuzuru Kataoka , Yoshikazu Yoshida , Hideki Takahashi , Ryo Matsuoka
Inventor： Rinya Kojo , Kenji Okushiro , Yuzuru Kataoka , Yoshikazu Yoshida , Hideki Takahashi , Ryo Matsuoka
CPC classification number: C21D11/005 , C21D9/04 , C21D2221/00 , Y10T29/49998
Abstract: A rail restraining method for restraining a hot-rolled rail in an upright position at a time of forced cooling of a head portion and a foot portion of the rail includes defining a predetermined position within 2 meters from each of both end faces of the rail along a longitudinal direction of the rail as a first restraining position, defining a predetermined position 3 to 10 meters from the first restraining position in a direction toward center of the rail along the longitudinal direction of the rail as a second restraining position at the time of forced cooling, and restraining displacement of the rail in a vertical direction at the first restraining position and the second restraining position by a restraining force F (kN) that satisfies following Expression (1): F≧100/L2 (1) where L2 (m) is a distance between the first restraining position and the second restraining position.
Abstract translation: 在强制冷却导轨的头部和脚部的同时，将热轧钢轨限制在直立位置的轨道限制方法包括在轨道的两个端面中的每一个的2m内限定预定位置 作为第一约束位置的轨道的纵向方向，在强制时作为第二限制位置，沿着轨道的纵向方向将轨道的中心方向从第一限制位置3至10米限定为第二限制位置 通过满足以下表达式（1）的约束力F（kN）来抑制轨道在第一约束位置和第二约束位置处的垂直方向的位移：F≥100/ L2（1）其中L2（m ）是第一约束位置和第二约束位置之间的距离。
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公开(公告)号：US20150021836A1
公开(公告)日：2015-01-22
申请号：US14375232
申请日：2012-02-06
Applicant: Yoshikazu Yoshida , Hideki Takahashi , Rinya Kojo , Ryo Matsuoka , Yuzuru Kataoka , Tomoo Horita
Inventor： Yoshikazu Yoshida , Hideki Takahashi , Rinya Kojo , Ryo Matsuoka , Yuzuru Kataoka , Tomoo Horita
CPC classification number: C21D9/04 , C21D1/667 , C21D11/00 , C21D11/005 , C21D2221/00
Abstract: A rail heat treatment device includes a cooling header, an oscillation mechanism, and a control system including: a storage unit that stores therein at least information required for a oscillation control; and a control unit that obtains a permissible range of required cooling time for a rail that satisfies a permissible range of hardness of the rail based on a correlation expression representing a correlation between the cooling time for the rail with the cooling header and the hardness of the rail after cooling, controls a stroke and a speed of relative reciprocation of the rail and the cooling header based on the permissible range of the required cooling time, and causes the oscillation mechanism to perform the relative reciprocation of the rail and the cooling header by the stroke and at the speed.
Abstract translation: 轨道式热处理装置包括冷却集管，振荡机构和控制系统，包括：存储单元，其至少存储振荡控制所需的信息; 以及控制单元，其基于表示轨道与冷却集管的冷却时间与冷却集管的硬度之间的相关性的相关表达式，获得满足轨道的容许硬度范围的轨道所需的冷却时间的允许范围 冷却后的轨道基于所需冷却时间的允许范围来控制轨道和冷却集管的行程和速度，并且使振荡机构通过轨道和冷却集管的相对往复运动 中风和速度。
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公开(公告)号：US20140372025A1
公开(公告)日：2014-12-18
申请号：US14373745
申请日：2012-02-23
Applicant: Yoshikazu Yoshida
Inventor： Yoshikazu Yoshida
IPC: G01C21/36
CPC classification number: G01C21/36 , G01C21/343 , G01C21/3611 , G01C21/3664
Abstract: It is an object of the present invention to improve the operability of the operation of changing a route by setting a new waypoint or destination point in a navigation device. To accomplish the object, the navigation device according to the present invention includes: a route searching unit that searches for a route from a departure point through waypoints to a destination point; a display controller that produces a screen display which allows one desired location among the departure point and at least one of the waypoints passed through to be designated as a new waypoint or destination point in one operation; and a route changing unit that changes the route searched for by the route searching unit in accordance with the designation performed by the one operation.
Abstract translation: 本发明的目的是通过在导航装置中设定新的航路点或目的地点来改善改变路线的操作的可操作性。 为了实现该目的，根据本发明的导航装置包括：路线搜索单元，其搜索从出发点经过路点到目的地点的路线; 显示控制器，其产生屏幕显示，其允许在一个操作中将出发点和所经过的点中的至少一个之间的一个期望位置指定为新的航路点或目的地点; 以及路线改变单元，其根据由一次操作执行的指定来改变由路径搜索单元搜索到的路线。
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公开(公告)号：US20060237216A1
公开(公告)日：2006-10-26
申请号：US11473583
申请日：2006-06-22
Applicant: Yoshikazu Yoshida , Kazuo Andoh , Masao Idei , Shinji Kono
Inventor： Yoshikazu Yoshida , Kazuo Andoh , Masao Idei , Shinji Kono
IPC: H01B3/30
CPC classification number: H02G3/0481 , F16C1/26 , F16F1/37
Abstract: Disclosed is a covering member comprising a cylindrical foam or a columnar foam including a cut consisting of a slit line which extends from the outer circumferential surface of the foam to reach a through-hole of the foam, wherein the slit line joining the open portion formed by the cut on the outer circumferential surface of the foam to the open portion formed by the cut on the inner circumferential surface of the foam is nonlinear in respect of the cross section of the covering member in a direction perpendicular to the axial direction of the foam.
Abstract translation: 公开了一种包括圆柱形泡沫或柱状泡沫的覆盖构件，其包括由从泡沫的外周表面延伸以到达泡沫的通孔的切割线的切口，其中形成的开口部分的切割线 通过在泡沫的外周面上的切割到由泡沫的内周面上的切口形成的开口部分，在与泡沫的轴向方向垂直的方向上的覆盖部件的截面方面是非线性的 。
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公开(公告)号：US07034621B2
公开(公告)日：2006-04-25
申请号：US10341413
申请日：2003-01-14
Applicant: Shuichi Matsumoto , Yoshikazu Yoshida
Inventor： Shuichi Matsumoto , Yoshikazu Yoshida
Abstract: A divider circuit including a plurality of latch circuits which are connected in series such that each of the latch circuits is responsive to a control signal to latch data which is output from a preceding latch circuit in the series, and a logic circuit which receives the data output from the plurality of latch circuits and which outputs a logic operation result to a first latch circuit in the series of the plurality of latch circuits.
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Patent Agency Ranking
6.发明授权Method of machining glass substrate and method fabricating high-frequency circuit 失效加工玻璃基板的方法和制造高频电路的方法公开(公告)号：US06772514B2
公开(公告)日：2004-08-10
申请号：US09878265
申请日：2001-06-12
Applicant: Hiroshi Ogura , Yuji Hashidate , Hiroyoshi Yajima , Yoshikazu Yoshida
Inventor： Hiroshi Ogura , Yuji Hashidate , Hiroyoshi Yajima , Yoshikazu Yoshida
IPC: H05K302
CPC classification number: H05K3/0029 , B23K26/0624 , C03C17/28 , C03C17/32 , C03C23/0025 , H01P11/003 , Y10T29/49126 , Y10T29/49155 , Y10T29/49156 , Y10T29/49165
Abstract: A method of machining a glass substrate by using a laser, in which a low-permittivity, low-dielectric-loss glass substrate capable of coping with mass production processes is made applicable as the substrate of a high-frequency circuit intended for microwave and millimeter-wave bands in particular. For that purpose, a glass substrate is provided in which the amount of air bubbles in glass is arbitrarily controlled to improve the workability of the substrate itself. Then, the glass substrate is machined while being irradiated with a pulsed laser for a plurality of times, thereby improving the machining shape of the glass substrate. Since glass substrates which are typically difficult to machine can be easily applied to the fabrication of high-frequency circuits, it becomes possible to supply high-performance circuits and apparatuses widely to the public.
Abstract translation: 通过使用能够应付大规模生产工艺的低介电常数低介电损耗玻璃基板的激光加工玻璃基板的方法可应用于用于微波和毫米的高频电路的基板 特别是波段。 为此，提供玻璃基板，其中玻璃中的气泡量被任意控制，以提高基板本身的可加工性。 然后，在用脉冲激光照射多次的同时对玻璃基板进行加工，从而提高玻璃基板的加工形状。 由于通常难以加工的玻璃基板可以容易地应用于高频电路的制造，所以可以向公众广泛地提供高性能电路和设备。
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公开(公告)号：US5468930A
公开(公告)日：1995-11-21
申请号：US29410
申请日：1993-03-10
Applicant: Yukio Nishikawa , Kunio Tanaka , Yoshikazu Yoshida
Inventor： Yukio Nishikawa , Kunio Tanaka , Yoshikazu Yoshida
CPC classification number: C23C14/505 , C23C14/28
Abstract: A laser sputtering apparatus includes a laser oscillator for emitting laser beams, a target-supporting member supporting a flat target thereon and being rotatable in a vacuum chamber while the target is inclined relative to the target-supporting member, a driving device for rotating the target-supporting member, a substrate-supporting member for supporting the substrate parallel with the target-supporting member, and an optical device for irradiating the target with the beams emitted by the laser oscillator.
Abstract translation: 激光溅射装置包括用于发射激光束的激光振荡器，支撑平板靶的靶支撑部件，并且在靶相对于靶支撑部件倾斜的同时可在真空室中旋转;驱动装置，用于使靶 支撑构件，用于支撑与靶支撑构件平行的基板的基板支撑构件，以及用于用激光振荡器发射的光束照射目标的光学装置。
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公开(公告)号：US5230784A
公开(公告)日：1993-07-27
申请号：US709223
申请日：1991-06-03
Applicant: Yoshikazu Yoshida
Inventor： Yoshikazu Yoshida
IPC: H05H1/46 , C23C14/35 , H01J37/32 , H01J37/34 , H01L21/203 , H01L21/302 , H01L21/3065 , H01L21/31
CPC classification number: H01J37/32229 , H01J37/32192 , H01J37/32247 , H01J37/3402 , H01J37/3414 , H01J37/3497
Abstract: A microwave plasma source includes: a microwave source; a rectangular waveguide having the microwave source at one end thereof; a coaxial waveguide arranged so as to penetrate through the other end of the rectangular waveguide and having an outer conductor and an inner conductor both having a door-knob-shaped portion at one end thereof and an opening at the end thereof; a target holder, for holding a target through an electrically insulating member, and arranged at the end of the inner conductor near the opening thereof; a magnet arranged at the end of the inner conductor near the opening thereof; and a vacuum chamber connected to the openings of the ends of the inner and outer conductors and having a gas inlet and a gas outlet. A microwave field generated by from the microwave source is propagated to the target through a space formed between the inner and outer conductors of the coaxial waveguide and is radiated on the target, so that an electrical discharge is caused in the vacuum chamber in which gas is introduced from the gas inlet, and a plasma is generated on the target.
Abstract translation: 微波等离子体源包括：微波源; 在其一端具有微波源的矩形波导; 布置成穿过矩形波导的另一端并具有外导体和内导体的同轴波导，两导体和内导体在其一端具有门把形部分和其末端的开口; 目标支架，用于通过电绝缘构件保持目标，并且布置在靠近其开口的内导体的端部; 布置在内导体的端部附近的磁体的开口附近的磁体; 以及与内导体和外导体的端部的开口连接并具有气体入口和气体出口的真空室。 由微波源产生的微波场通过形成在同轴波导的内外导体之间的空间传播到靶，并被辐射在目标上，使得在真空室中产生放电，其中气体是 从气体入口引入，并且在靶上产生等离子体。
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公开(公告)号：US4846953A
公开(公告)日：1989-07-11
申请号：US144464
申请日：1988-01-19
Applicant: Yoshikazu Yoshida
Inventor： Yoshikazu Yoshida
Abstract: A sputtering type of a metal ion source includes a microwave radiation means and a pair of magnetic poles to which a negative electric potential is applied. The magnetic pole acts as an electrode for retarding electrons when a sputtering target is placed at the pointed end of the magnetic pole, high density ions generated by the operation of PIG (Penning Ionization Guage) discharge and a magnetic field efficiently bombard and sputter a target, and a microwave discharge acts as an electron supplying source so that a stable discharge is maintained.
Abstract translation: 溅射型金属离子源包括微波辐射装置和施加负电位的一对磁极。 当溅射靶位于磁极的尖端时，磁极用作用于延迟电子的电极，通过PIG（Penning Ionization Guage）放电的操作产生的高密度离子和磁场有效地轰击并溅射靶 微波放电充当电子供给源，从而保持稳定的放电。
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公开(公告)号：US09429374B2
公开(公告)日：2016-08-30
申请号：US14376652
申请日：2012-02-06
Applicant: Rinya Kojo , Hiroyuki Fukuda , Yuta Tamura , Yoshikazu Yoshida , Hideki Takahashi , Ryo Matsuoka , Yuzuru Kataoka
Inventor： Rinya Kojo , Hiroyuki Fukuda , Yuta Tamura , Yoshikazu Yoshida , Hideki Takahashi , Ryo Matsuoka , Yuzuru Kataoka
CPC classification number: F28F27/00 , C21D1/62 , C21D9/04 , C21D11/005 , F27D15/0213
Abstract: A rail cooling method includes: calculating, based on a relation between temperatures and an amount of warp of the rail cooled to ambient temperature after the forced cooling, the temperatures including a cooling start temperature of the head, a cooling end temperature of the head, a cooling start temperature of the foot and a cooling end temperature of the foot, a target value or a target value range for each of the temperatures so that the amount of warp of the rail at ambient temperature falls within a permissive range; and setting a cooling condition in accordance with the target value or the target value range to perform the forced cooling on the head and the foot.
Abstract translation: 轨道冷却方法包括：基于温度与强制冷却后冷却至环境温度的轨道的翘曲量之间的关系，计算包括头部的冷却开始温度，头部的冷却结束温度， 脚的冷却开始温度和脚的冷却结束温度，目标值或目标值范围，使得轨道在环境温度下的翘曲量落入允许范围内; 并根据目标值或目标值范围设定冷却条件，对头部和脚部进行强制冷却。
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