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    Chemically amplified positive resist composition
    1.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US06475699B2

    公开(公告)日：2002-11-05

    申请号：US09765671

    申请日：2001-01-22

    申请人： Yasunori Uetani ,  Seong-Hyeon Kim ,  Yoshiyuki Takata

    发明人： Yasunori Uetani ,  Seong-Hyeon Kim ,  Yoshiyuki Takata

    IPC分类号： G03F7004

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A chemically amplified positive resist composition excellent in sensitivity and resolution as well as other resist performance characteristics comprising a resin (X) which has a polymeric unit represented by the following formula (I): wherein R1 represents hydrogen or methyl, R2 and R3 represent alkyl having 1 to 4 carbon atoms, and R4 and R5 represent hydrogen, hydroxyl or alkyl, polymeric unit represented by the following formula (II): and a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride; and an acid generating agent (Y).

    摘要翻译： 包括具有由下式（I）表示的聚合单元的树脂（X）：其中R 1表示氢或甲基，R 2和R 3表示烷基的化合物增强正性抗蚀剂组合物，其灵敏度和分辨率以及其它抗蚀剂性能特征优异， 具有1至4个碳原子，R 4和R 5表示氢，羟基或烷基，由下式（II）表示的聚合单元：和衍生自不饱和二羧酸酐的聚合单元，其选自马来酸酐和衣康酸酐; 和酸产生剂（Y）。

    Chemically amplified positive resist composition
    2.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US06632581B2

    公开(公告)日：2003-10-14

    申请号：US09726476

    申请日：2000-12-01

    申请人： Yasunori Uetani ,  Seong-Hyeon Kim

    发明人： Yasunori Uetani ,  Seong-Hyeon Kim

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A chemically amplified positive resist composition is provided which is excellent in sensitivity and resolution; and comprises a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of acid, and has a polymeric unit (a) derived from an alicyclic unsaturated carboxylic acid ester in which a carboxylic acid ester group represented by the formula (I): wherein R1 represents an alkyl having 1 to 4 carbon atoms, R represents an alicyclic hydrocarbon residue which may be optionally substituted with a group selected from hydroxyl and oxo, and R2 represents an alkyl having 1 to 4 carbon atoms, or R and R2, together with carbon atoms to which R2 and R are bonded, form a ring, is bonded to an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in its ring; and a polymeric unit (b) derived from maleic anhydride; and an acid-generating agent (Y).

    摘要翻译： 提供了具有优异的灵敏度和分辨率的化学放大正光刻胶组合物; 并且包含本身不溶于或微溶于碱但通过酸作用而溶于碱的树脂（X），并且具有衍生自脂环族不饱和羧酸酯的聚合单元（a），其中羧酸 由式（I）表示的酸酯基团：其中R 1表示具有1至4个碳原子的烷基，R表示可选地被选定的基团取代的脂环族烃残基 由羟基和氧代取代，R 1和R 2彼此独立地表示碳原子数为1〜4的烷基，或者R 1和R 2彼此一起形成的碳原子 其中R <2 和R键合，形成环，在其环中与具有可聚合的碳 - 碳双键的脂环族烃键合; 和衍生自马来酸酐的聚合物单元（b）; 和酸产生剂（Y）

    Chemically amplified positive resist composition
    3.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US06495306B2

    公开(公告)日：2002-12-17

    申请号：US09741438

    申请日：2000-12-21

    申请人： Yasunori Uetani ,  Hiroaki Fujishima ,  Yoshiyuki Takata

    发明人： Yasunori Uetani ,  Hiroaki Fujishima ,  Yoshiyuki Takata

    IPC分类号： G03F7039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/111

    摘要： A chemically amplified positive resist composition which is suitable for use in an exposure process utilizing an ArF excimer laser and is capable of forming a resist coat exhibiting a high hydrophillcity; is excellent in adhesion to a substrate and satisfactory in resist performance characteristics; and comprises a resin (X) which has a polymeric unit(a) derived from dihydroxy-1-adamantyl (meth)acrylate and a polymeric unit(b) derived from 2-alkyl-2-adamantyl (meth)acrylate, and which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali due to an action of acid; and an acid generating agent (Y).

    摘要翻译： 一种化学放大正性抗蚀剂组合物，其适用于利用ArF准分子激光的曝光工艺，并且能够形成显示出高亲水性的抗蚀涂层; 对基材的附着性优异，抗蚀剂性能特性好; 并且包含具有衍生自（甲基）丙烯酸二羟基-1-金刚烷基酯的聚合单元（a）和衍生自（甲基）丙烯酸-2-烷基-2-金刚烷基酯的聚合单元（b）的树脂（X），并且其 不溶或微溶于碱，但由于酸的作用而溶于碱; 和酸产生剂（Y）。

    Chemically amplified positive resist composition
    4.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US06579659B2

    公开(公告)日：2003-06-17

    申请号：US09824227

    申请日：2001-04-03

    申请人： Yasunori Uetani ,  Airi Yamada ,  Yoshiko Miya ,  Yoshiyuki Takata

    发明人： Yasunori Uetani ,  Airi Yamada ,  Yoshiko Miya ,  Yoshiyuki Takata

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent. (A): At least one polymeric unit of an alicyclic lactcone selected from polymeric units represented by the following formulae (Ia) and (Ib): (B): At least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl (meth)acrylate represented by the following formula (II), a polymeric unit of a combination of a unit represented by the following formula (III) and a unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride and a polymeric unit of (&agr;)&bgr;-(meth)acryloyloxy-&ggr;-butyrolactone represented by the following formula (IV):

    摘要翻译： 包含具有以下聚合单元（A），（B）和（C）的树脂的性能如分辨率，轮廓，灵敏度，耐干蚀刻性，粘附性等的平衡优异的化学增幅型正光刻胶组合物; （A）：选自由下式（Ia）和（Ib）表示的聚合单元的脂环族内聚焦的至少一种聚合单元:( B）：至少一种选自聚合单元的聚合单元 由下式（II）表示的3-羟基-1-金刚烷基（甲基）丙烯酸酯，由下式（III）表示的单元的组合的单体和来自选自马来酸酐的不饱和二羧酸酐的单元 酸酐和衣康酸酐以及由下式（IV）表示的（α）β-（甲基）丙烯酰氧基-γ-丁内酯的聚合单元：

    Positive resist composition
    5.
    发明授权
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号：US06815140B2

    公开(公告)日：2004-11-09

    申请号：US09323230

    申请日：1999-06-01

    申请人： Yasunori Uetani ,  Hiroshi Moriuma ,  Yoshiyuki Takata

    发明人： Yasunori Uetani ,  Hiroshi Moriuma ,  Yoshiyuki Takata

    IPC分类号： G03F7023

    CPC分类号： G03F7/0226

    摘要： A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a radiation-sensitive quinonediazide compound and a thioxanthone compound represented by the following formula (I): wherein R1, R2, R3, R4, R5, R6, R7 and R8 independently represent hydrogen, halogen, alkyl, alkoxy, aryl, carboxyl or alkoxycarbonyl.

    Chemically amplified positive resist composition
    6.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US06495307B2

    公开(公告)日：2002-12-17

    申请号：US09791756

    申请日：2001-02-26

    申请人： Yasunori Uetani ,  Hiroaki Fujishima ,  Yoshiyuki Takata

    发明人： Yasunori Uetani ,  Hiroaki Fujishima ,  Yoshiyuki Takata

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/111

    摘要： A chemically amplified positive resist composition excellent in adhesion to a substrate, as well as good in dry-etching resistance; suitable for use in excimer laser lithography utilizing ArF, KrF or the like; and comprising a resin (X) which, per se, is insoluble in alkali but becomes soluble in alkali when subjected to an action of acid, and has a polymeric unit represented by the formula(I), a polymeric unit represented by the formula(II) and a polymeric unit represented by the formula(III): and an acid generating agent (Y).

    摘要翻译： 一种化学放大型正性抗蚀剂组合物，其与基材的密合性优异，耐干蚀刻性优异; 适用于利用ArF，KrF等的准分子激光光刻; 并且包含本身不溶于碱但在酸作用下变得可溶于碱的树脂（X），并且具有由式（I）表示的聚合单元，由式（II）表示的聚合单元 ）和由式（III）表示的聚合单元：和酸产生剂（Y）。

    Organic photoelectric converter
    9.
    发明授权
    Organic photoelectric converter 有权
    有机光电转换器

    公开(公告)号：US08723163B2

    公开(公告)日：2014-05-13

    申请号：US12922107

    申请日：2009-03-05

    申请人： Yasunori Uetani

    发明人： Yasunori Uetani

    IPC分类号： H01L51/54 ,  C07D333/02

    CPC分类号： H01L51/0068 ,  H01L51/0036 ,  H01L51/0039 ,  H01L51/0043 ,  H01L51/0067 ,  H01L51/0072 ,  H01L51/0074 ,  H01L51/4253 ,  Y02E10/549

    摘要： Disclosed is an organic photoelectric conversion device including a pair of electrodes, at least one of which is transparent or semi-transparent, and an organic layer arranged between the electrodes and containing a conjugated polymer compound and a sulfur-containing heterocyclic compound, wherein the sulfur-containing heterocyclic compound has a condensed polycyclic structure or a bithiophene structure. Examples of the sulfur-containing heterocyclic compound include a compound represented by formula (1): (wherein, a plurality of R1's may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an arylalkoxy group or an arylalkylthio group, and a hydrogen atom or atoms contained in these groups may be substituted by a fluorine atom or atoms; and m represents an integer of 0 to 10) or the like.

    摘要翻译： 公开了一种有机光电转换装置，其包括一对电极，其至少一个是透明或半透明的，并且有机层布置在电极之间并含有共轭高分子化合物和含硫杂环化合物，其中硫 的杂环化合物具有缩合多环结构或双噻吩结构。 含硫杂环化合物的实例包括由式（1）表示的化合物：（其中，多个R 1可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基， 烷硫基，芳基，芳氧基，芳硫基，芳烷基，芳烷氧基或芳烷硫基，这些基中所含的氢原子或原子可以被氟原子或原子取代; m 表示0〜10的整数）等。