-
公开(公告)号：US06475699B2
公开(公告)日：2002-11-05
申请号：US09765671
申请日：2001-01-22
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition excellent in sensitivity and resolution as well as other resist performance characteristics comprising a resin (X) which has a polymeric unit represented by the following formula (I): wherein R1 represents hydrogen or methyl, R2 and R3 represent alkyl having 1 to 4 carbon atoms, and R4 and R5 represent hydrogen, hydroxyl or alkyl, polymeric unit represented by the following formula (II): and a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride; and an acid generating agent (Y).
摘要翻译： 包括具有由下式（I）表示的聚合单元的树脂（X）：其中R 1表示氢或甲基，R 2和R 3表示烷基的化合物增强正性抗蚀剂组合物，其灵敏度和分辨率以及其它抗蚀剂性能特征优异， 具有1至4个碳原子，R 4和R 5表示氢，羟基或烷基，由下式（II）表示的聚合单元：和衍生自不饱和二羧酸酐的聚合单元，其选自马来酸酐和衣康酸酐; 和酸产生剂（Y）。
-
公开(公告)号：US06495306B2
公开(公告)日：2002-12-17
申请号：US09741438
申请日：2000-12-21
IPC分类号： G03F7039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A chemically amplified positive resist composition which is suitable for use in an exposure process utilizing an ArF excimer laser and is capable of forming a resist coat exhibiting a high hydrophillcity; is excellent in adhesion to a substrate and satisfactory in resist performance characteristics; and comprises a resin (X) which has a polymeric unit(a) derived from dihydroxy-1-adamantyl (meth)acrylate and a polymeric unit(b) derived from 2-alkyl-2-adamantyl (meth)acrylate, and which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali due to an action of acid; and an acid generating agent (Y).
摘要翻译： 一种化学放大正性抗蚀剂组合物，其适用于利用ArF准分子激光的曝光工艺，并且能够形成显示出高亲水性的抗蚀涂层; 对基材的附着性优异，抗蚀剂性能特性好; 并且包含具有衍生自（甲基）丙烯酸二羟基-1-金刚烷基酯的聚合单元（a）和衍生自（甲基）丙烯酸-2-烷基-2-金刚烷基酯的聚合单元（b）的树脂（X），并且其 不溶或微溶于碱，但由于酸的作用而溶于碱; 和酸产生剂（Y）。
-
公开(公告)号：US06495307B2
公开(公告)日：2002-12-17
申请号：US09791756
申请日：2001-02-26
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A chemically amplified positive resist composition excellent in adhesion to a substrate, as well as good in dry-etching resistance; suitable for use in excimer laser lithography utilizing ArF, KrF or the like; and comprising a resin (X) which, per se, is insoluble in alkali but becomes soluble in alkali when subjected to an action of acid, and has a polymeric unit represented by the formula(I), a polymeric unit represented by the formula(II) and a polymeric unit represented by the formula(III): and an acid generating agent (Y).
摘要翻译： 一种化学放大型正性抗蚀剂组合物，其与基材的密合性优异，耐干蚀刻性优异; 适用于利用ArF，KrF等的准分子激光光刻; 并且包含本身不溶于碱但在酸作用下变得可溶于碱的树脂（X），并且具有由式（I）表示的聚合单元，由式（II）表示的聚合单元 ）和由式（III）表示的聚合单元：和酸产生剂（Y）。
-
公开(公告)号：US5807656A
公开(公告)日：1998-09-15
申请号：US709323
申请日：1996-09-04
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226
摘要： A polyhydroxy compound represented by the following formula (I): ##STR1## and a positive resist composition which comprises an alkali-soluble resin, a quinonediazide sulfonic acid ester, and a polyhydroxy compound of formula (I) or a polyhydroxy compound represented by the following formula (C): ##STR2## which is satisfactory in properties such as sensitivity, resolution, .tau.-value and peeling off resistance.
摘要翻译： 由下式（I）表示的多羟基化合物：（I）和含有碱溶性树脂，醌二叠氮化物磺酸酯和式（I）的多羟基化合物或多羟基化合物的正性抗蚀剂组合物 由下式（C）表示：在图像敏感度，分辨率，tau值和抗剥离性等性能方面令人满意的。
-
公开(公告)号：US06815140B2
公开(公告)日：2004-11-09
申请号：US09323230
申请日：1999-06-01
IPC分类号： G03F7023
CPC分类号： G03F7/0226
摘要： A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a radiation-sensitive quinonediazide compound and a thioxanthone compound represented by the following formula (I): wherein R1, R2, R3, R4, R5, R6, R7 and R8 independently represent hydrogen, halogen, alkyl, alkoxy, aryl, carboxyl or alkoxycarbonyl.
-
公开(公告)号：US06579659B2
公开(公告)日：2003-06-17
申请号：US09824227
申请日：2001-04-03
申请人： Yasunori Uetani , Airi Yamada , Yoshiko Miya , Yoshiyuki Takata
发明人： Yasunori Uetani , Airi Yamada , Yoshiko Miya , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent. (A): At least one polymeric unit of an alicyclic lactcone selected from polymeric units represented by the following formulae (Ia) and (Ib): (B): At least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl (meth)acrylate represented by the following formula (II), a polymeric unit of a combination of a unit represented by the following formula (III) and a unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride and a polymeric unit of (&agr;)&bgr;-(meth)acryloyloxy-&ggr;-butyrolactone represented by the following formula (IV):
摘要翻译： 包含具有以下聚合单元（A），（B）和（C）的树脂的性能如分辨率，轮廓，灵敏度，耐干蚀刻性，粘附性等的平衡优异的化学增幅型正光刻胶组合物; （A）：选自由下式（Ia）和（Ib）表示的聚合单元的脂环族内聚焦的至少一种聚合单元:( B）：至少一种选自聚合单元的聚合单元 由下式（II）表示的3-羟基-1-金刚烷基（甲基）丙烯酸酯，由下式（III）表示的单元的组合的单体和来自选自马来酸酐的不饱和二羧酸酐的单元 酸酐和衣康酸酐以及由下式（IV）表示的（α）β-（甲基）丙烯酰氧基-γ-丁内酯的聚合单元：
-
公开(公告)号：US07572570B2
公开(公告)日：2009-08-11
申请号：US12052189
申请日：2008-03-20
申请人： Yusuke Fuji , Yoshiyuki Takata
发明人： Yusuke Fuji , Yoshiyuki Takata
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a resin which comprises (a) a structural unit having an acid-labile group, (b) a structural unit having at least one hydroxyl group, (c) a structural unit having at least one lactone structure, and (d) a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and (B) at least one acid generator.
摘要翻译： 本发明提供一种化学放大抗蚀剂组合物，其包含：（A）树脂，其包含（a）具有酸不稳定基团的结构单元，（b）具有至少一个羟基的结构单元，（c）结构单元 具有至少一个内酯结构，和（d）由式（Ia）或（Ib）表示的结构单元：其中R1表示氢原子或甲基，R3表示甲基，n表示0〜 14，Z表示单键或 - [CH 2] k-COO-，和（B）至少一种酸发生剂。
-
公开(公告)号：US20050214676A1
公开(公告)日：2005-09-29
申请号：US11082835
申请日：2005-03-18
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provide a chemically amplified positive resist composition comprising a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound of the formula (C-1) wherein R1 and R2 each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R3, R4 and R5 each independently represents a hydrogen or a hydroxyl.
摘要翻译： 本发明提供了一种化学放大型正性抗蚀剂组合物，其包含含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，并且通过酸的作用变得可溶于碱性水溶液 ; 酸发生器; 和其中R 1和R 2各自独立地表示氢或具有1至4个碳原子的烷基的式（C-1）化合物， R 4，R 4和R 5各自独立地表示氢或羟基。
-
公开(公告)号：US20050031984A1
公开(公告)日：2005-02-10
申请号：US10694719
申请日：2003-10-29
申请人： Yoshiyuki Takata , Youngjoon Lee , Koshiro Ochiai
发明人： Yoshiyuki Takata , Youngjoon Lee , Koshiro Ochiai
CPC分类号： G03F7/0397
摘要： The present invention provides a resin which comprises a structural unit of the formula (I) wherein R1 represents alkylene having 1 to 4 carbon atoms, R2 represents alkyl having 1 to 4 carbon atoms, and R3 represents hydrogen or methyl, and also prvides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.
摘要翻译： 本发明提供一种树脂，其包含式（I）的结构单元，其中R 1表示具有1至4个碳原子的亚烷基，R 2表示具有1至4个碳原子的烷基，R 3表示 氢或甲基，并且还提供包含上述定义的树脂和酸产生剂的化学扩增型正性抗蚀剂组合物。
-
公开(公告)号：US06835527B2
公开(公告)日：2004-12-28
申请号：US10105386
申请日：2002-03-26
申请人： Yoshiyuki Takata , Hiroshi Moriuma
发明人： Yoshiyuki Takata , Hiroshi Moriuma
IPC分类号： G03F7004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/111
摘要： A resist composition excellent in balance of performance of resolution and sensitivity as well as in solubility and, particularly, suitable for use as a positive photo resist which comprises a resin having a alicyclic lactone structure unit that is insoluble in alkali by itself but becomes soluble due to the action of an acid, a solvent containing 2-heptanone and an acid generating agent, wherein a content of 2-heptanone in the solvent is in a weight ratio of from about 5 to about 95% is provided.
摘要翻译： 具有优异的分辨率和灵敏度以及溶解性的平衡性优异的抗蚀剂组合物，特别适合用作正型光致抗蚀剂，其包含具有脂环内酯结构单元的树脂，该单体本身不溶于碱，但变得易溶于 对酸，含有2-庚酮和酸产生剂的溶剂的作用，其中溶剂中2-庚酮的含量为约5至约95重量％。
-
-
-
-
-
-
-
-
-
搜索结果
30 条记录 (耗时 0.022 秒)
