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公开(公告)号:US10976586B2
公开(公告)日:2021-04-13
申请号:US16475379
申请日:2019-03-14
Inventor: Fei Al , Peng Lu , Chengzhi Luo
IPC: G02F1/1335 , G02F1/1333 , G02F1/1368 , H01L27/12 , H01L21/02
Abstract: A manufacturing method for a liquid crystal display panel is disclosed and includes a step forming a refractive index gradient layer, a step forming a gate electrode insulation layer, a step forming a first interlayer dielectric layer, and a step forming a second interlayer dielectric layer. The step forming a refractive index gradient layer includes depositing a silicon nitride layer on a glass substrate, depositing the refractive index gradient layer on the silicon nitride layer. The refractive index gradient layer is silicon oxide, and includes a lower refractive index decremental layer and a lower refractive index constant layer. A refractive index of the decremental layer gradually decreases along a direction away from the silicon nitride layer, the lower refractive index constant layer is on the lower refractive index decremental layer. A reflection rate between light in film layers can be lowered to improve light transmittance of the display panel.
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公开(公告)号:US12148839B2
公开(公告)日:2024-11-19
申请号:US17759866
申请日:2022-07-28
Inventor: Chengzhi Luo
IPC: H01L29/786 , G02F1/1368 , H01L27/12 , H01L29/66 , H10K59/12
Abstract: The present application provides a semiconductor device and an electronic device. In the semiconductor device, a metal layer is provided on the side of the active layer facing the buffer layer, and the metal layer includes at least one metal block, so that the metal block is in direct contact with at least part of the active layer, then when the active layer is converted from amorphous silicon to polycrystalline silicon, due to the catalytic effect of the metal block, the size of the crystal grains in the polycrystalline silicon becomes larger, which reduces the crystal grain boundaries in the polycrystalline silicon and improves the mobility of the semiconductor device.
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公开(公告)号:US20240038900A1
公开(公告)日:2024-02-01
申请号:US18050753
申请日:2022-10-28
Inventor: Zhifu Li , Guanghui Liu , Fei Ai , Dewei Song , Chengzhi Luo
IPC: H01L29/786 , H01L29/66
CPC classification number: H01L29/78696 , H01L29/66757 , H01L29/78633 , H01L29/78675
Abstract: A thin-film transistor (TFT) having a vertical structure and an electronic device are provided. The TFT having the vertical structure includes an insulating substrate and an active layer disposed on the insulating substrate. The active layer includes a first conductive part, an active section, and a second conductive part which are stacked. An orthographic projection of the first conductive part on the insulating substrate partly overlaps an orthographic projection of the second conductive part on the insulating substrate. Therefore, contamination ions may be prevented from entering the active section from the insulating substrate during manufacturing processes of the TFT. Thus, reliability of performance of the TFT may be improved.
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公开(公告)号:US11320711B1
公开(公告)日:2022-05-03
申请号:US16772784
申请日:2019-11-11
Inventor: Chengzhi Luo
IPC: G02F1/1368 , H01L27/12 , G02F1/1362
Abstract: The present disclosure provides a display panel and a manufacturing method of the display panel, and the display panel includes an array substrate. The array substrate includes a planarization layer, a first protective layer, a first electrode layer, and a passivation layer. The passivation layer is made of silicon-based inorganic dielectric material. A first protective layer is added between the planarization layer and the first electrode layer to support the first electrode layer.
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公开(公告)号:US12253772B2
公开(公告)日:2025-03-18
申请号:US17924412
申请日:2022-11-03
Inventor: Chengzhi Luo
IPC: G02F1/1362 , G02F1/1333 , G02F1/1335
Abstract: A display panel and a display device are provided. The display panel includes a non-opening region and opening regions. The display panel includes a substrate. The substrate is located on a side of the display panel away from a light-exiting surface. The substrate includes a first base layer, a second base layer, and a third base layer. A first interface is formed between the second base layer and the first base layer. A second interface is formed between the third base layer and the second base layer.
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公开(公告)号:US12164195B2
公开(公告)日:2024-12-10
申请号:US17925028
申请日:2022-11-08
Inventor: Fei Ai , Dewei Song , Chengzhi Luo
IPC: G02F1/1335 , G02F1/1333 , G02F1/1368
Abstract: A display panel and a manufacturing method thereof, and a display device are provided. The display panel includes a backlight module and an array substrate. The array substrate includes an insulation structure is located in the opening region. A first groove is defined at a side of the insulation structure away from the backlight module. A first insulation layer and a second insulation layer are filled in the first groove. The second insulation layer is located on a side of the first insulation layer close to the backlight module, and a refractive index of the second insulation layer is less than a refractive index of the first insulation layer.
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公开(公告)号:US12107094B2
公开(公告)日:2024-10-01
申请号:US17280913
申请日:2021-02-05
Inventor: Chengzhi Luo
IPC: G02F1/1368 , G02F1/1362 , H01L27/12
CPC classification number: H01L27/1251 , G02F1/136209 , G02F1/136218 , G02F1/1368 , H01L27/1225 , H01L27/1248 , G02F2202/104
Abstract: An array substrate and a display panel are provided. The array substrate includes a plurality of recess-shaped light-shielding patterns. An oxide semiconductor layer is correspondingly formed in a recess of one of the light-shielding patterns. In comparison with increasing a plane area for improving light-shielding performance of the light-shielding patterns, an area of an orthographic projection of the recess-shaped light-shielding patterns on the array substrate is smaller. Therefore, an area of a light-transmitting region of the array substrate is greater, thereby increasing an aperture of the array substrate.
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公开(公告)号:US20230098341A1
公开(公告)日:2023-03-30
申请号:US17280913
申请日:2021-02-05
Inventor: Chengzhi Luo
IPC: H01L27/12
Abstract: An array substrate and a display panel are provided. The array substrate includes a plurality of recess-shaped light-shielding patterns. An oxide semiconductor layer is correspondingly formed in a recess of one of the light-shielding patterns. In comparison with increasing a plane area for improving light-shielding performance of the light-shielding patterns, an area of an orthographic projection of the recess-shaped light-shielding patterns on the array substrate is smaller. Therefore, an area of a light-transmitting region of the array substrate is greater, thereby increasing an aperture of the array substrate.
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公开(公告)号:US11405604B2
公开(公告)日:2022-08-02
申请号:US16630474
申请日:2019-11-07
Inventor: Chengzhi Luo
IPC: H04N13/312 , G02F1/13363 , G02F1/1335
Abstract: A 3D display device and a manufacturing method thereof are provided. Metal nanowires perpendicular to each other are provided at the TFT glass substrate side and the CF glass substrate side. The metal nanowires can realize inherent function of polarizers at the TFT glass substrate side and the CF glass substrate side, and can also make the emitted light into stripe-shaped polarized light perpendicular to each other. Therefore, the polarizers, the λ/2 phase retarder with stripes, and the polarizers with stripes and perpendicular polarization that are originally at the TFT glass substrate side and the CF glass substrate side in a 3D polarizer display are excluded. The thickness of the 3D display device is made thinner. Moreover, according to the structural design, polarization effect is not limited by wavelength range of the light. Therefore, 3D stereoscopic display effect is greatly enhanced.
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