公开(公告)号：US20120315720A1

公开(公告)日：2012-12-13

申请号：US13589492

申请日：2012-08-20

Applicant: Jin Li ,  Ulrich C. Boettiger

Inventor： Jin Li ,  Ulrich C. Boettiger

IPC: H01L31/18 ,  B29D11/00

CPC classification number: G02B3/005 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0043 ,  G02B3/0056 ,  H01L27/14621 ,  H01L27/14627

Abstract: A micro-lens array with reduced or no empty space between individual micro-lenses and a method for forming same. The micro-lens array is formed by patterning a first set of micro-lens material in a checkerboard pattern on a substrate. The first set of micro-lens material is reflowed and cured into first micro-lenses impervious to subsequent reflows. Then, a second set of micro-lens material is patterned in spaces among the first micro-lenses, reflowed and cured into second micro-lenses. The reflows and cures can be conducted under different conditions, and the micro-lenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of micro-lenses are optimized for maximum sensor signal.

Abstract translation: 具有在单个微透镜之间减少或没有空白空间的微透镜阵列及其形成方法。 微透镜阵列通过在衬底上以棋盘图案形成第一组微透镜材料而形成。 第一组微透镜材料被回流并固化成不可逆转的第一微透镜。 然后，将第二组微透镜材料图案化在第一微透镜之间的空间中，回流并固化成第二微透镜。 可以在不同的条件下进行回流和固化，并且微透镜的尺寸可以不同。 可以选择回流条件以确保微透镜的焦距被优化用于最大传感器信号。

公开(公告)号：US07696588B2

公开(公告)日：2010-04-13

申请号：US11699029

申请日：2007-01-29

Applicant: Ulrich C. Boettiger ,  Jin Li ,  Steven D. Oliver

Inventor： Ulrich C. Boettiger ,  Jin Li ,  Steven D. Oliver

IPC: H01L31/0232

CPC classification number: H01L27/14618 ,  H01L27/14601 ,  H01L27/14625 ,  H01L27/14634 ,  H01L27/14683 ,  H01L27/14685 ,  H01L2924/0002 ,  H01L2924/351 ,  H01L2924/00

Abstract: Microelectronic imagers with shaped image sensors and methods for manufacturing curved image sensors. In one embodiment, a microelectronic imager device comprises an imaging die having a substrate, a curved microelectronic image sensor having a face with a convex and/or concave portion at one side of the substrate, and integrated circuitry in the substrate operatively coupled to the image sensor. The imaging die can further include external contacts electrically coupled to the integrated circuitry and a cover over the curved image sensor.

Abstract translation: 具有形状图像传感器的微电子成像器和用于制造弯曲图像传感器的方法。 在一个实施例中，微电子成像器件包括具有衬底的成像管芯，具有在衬底的一侧具有凸部和/或凹部的面的弯曲微电子图像传感器，以及可操作地耦合到图像的衬底中的集成电路 传感器。 成像芯片还可以包括电耦合到集成电路的外部触点和弯曲图像传感器上的盖。

公开(公告)号：US07683407B2

公开(公告)日：2010-03-23

申请号：US11193450

申请日：2005-08-01

Applicant: Ulrich C. Boettiger

Inventor： Ulrich C. Boettiger

IPC: H01L31/062 ,  H01L31/113

CPC classification number: H01L27/14625 ,  G01N2201/0642 ,  G01N2201/08 ,  H01L27/14629 ,  H01L27/14632 ,  H01L27/14643 ,  H01L27/14685 ,  H01L27/14687

Abstract: A pixel cell and imager device, and method of forming the same, where the pixel cell has a plurality of metallization and via layers formed over a photosensitive region. The metallization and via layers form a step-like light tunnel structure that augments the photosensitive region's ability to capture light impinging on the photosensitive region.

Abstract translation: 像素单元和成像器件及其形成方法，其中像素单元具有形成在感光区域上的多个金属化层和通孔层。 金属化和通孔层形成阶梯状光通道结构，其增强了感光区域捕获入射到感光区域上的光的能力。

公开(公告)号：US20090032987A1

公开(公告)日：2009-02-05

申请号：US11882689

申请日：2007-08-03

Applicant: Ulrich C. Boettiger

Inventor： Ulrich C. Boettiger

IPC: B29D11/00

CPC classification number: B29D11/00365 ,  B82Y10/00 ,  B82Y40/00 ,  G02B3/0006 ,  G03F7/0002 ,  G03F7/0005

Abstract: Methods of forming a lens master plate. In one embodiment, a substrate is coated with a polymer material layer. Isolated sections are formed in the polymer material layer. The isolated sections are formed into lens shapes using a lens master.

Abstract translation: 形成镜片主板的方法。 在一个实施例中，衬底被涂覆有聚合物材料层。 在聚合物材料层中形成隔离的部分。 使用透镜主体将隔离部分形成为透镜形状。

公开(公告)号：US07428103B2

公开(公告)日：2008-09-23

申请号：US11707113

申请日：2007-02-16

Applicant: Ulrich C. Boettiger ,  Jin Li

Inventor： Ulrich C. Boettiger ,  Jin Li

IPC: G02B27/10 ,  H04N3/14 ,  H04N5/335 ,  H04N9/04 ,  H04N9/083

CPC classification number: H01L27/14603 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0043 ,  G02B3/005 ,  G02B3/0056 ,  H01L27/14609 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14641 ,  H01L31/02327 ,  H04N5/37457 ,  H04N9/045

Abstract: A microlens array with reduced or no empty space between individual microlenses and a method for forming the same. The microlens array is formed by patterning a first set of microlens precursors in a checkerboard pattern on a substrate. The first set of microlens precursors is reflowed and cured into first microlenses impervious to subsequent reflows. Then, a second set of microlens precursors is patterned in spaces among the first microlenses, reflowed and cured into second microlenses. The reflows and cures can be conducted under different conditions, and the microlenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of microlenses are optimized for maximum sensor signal.

Abstract translation: 微透镜阵列，其在单个微透镜之间具有减少或不空的空间，以及用于形成微透镜的方法。 微透镜阵列通过在衬底上以棋盘图案形成第一组微透镜前体而形成。 第一组微透镜前体被回流并固化成第一微透镜，其不受后续回流的影响。 然后，将第二组微透镜前体图案化在第一微透镜之间的空间中，回流并固化成第二微透镜。 可以在不同的条件下进行回流和固化，并且微透镜的尺寸可以不同。 可以选择回流的条件，以确保微透镜的焦距被优化用于最大传感器信号。

公开(公告)号：US07333267B2

公开(公告)日：2008-02-19

申请号：US10721165

申请日：2003-11-26

Applicant: Ulrich C. Boettiger ,  Jin Li

Inventor： Ulrich C. Boettiger ,  Jin Li

IPC: G02B7/10 ,  H01L27/00

CPC classification number: G02B3/0031 ,  B29D11/00375 ,  G02B3/0043 ,  H01L27/14627 ,  H01L27/14685 ,  H01L31/02327

Abstract: A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate an lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.

Abstract translation: 提供微透镜和形成微透镜的方法。 微透镜包括位于衬底内的衬底和透镜材料，衬底具有用作透镜材料的模具的凹陷区域。 凹陷部分可以成形为使得透镜材料校正光学像差。 微透镜可以是微透镜阵列的一部分。 凹陷区域可以用作用于微透镜阵列的透镜材料的模具，并且可以成形为使得微透镜阵列包括弓形，非球形或非对称微透镜。

公开(公告)号：US07280279B2

公开(公告)日：2007-10-09

申请号：US11328158

申请日：2006-01-10

Applicant: Ulrich C. Boettiger ,  Jin Li

Inventor： Ulrich C. Boettiger ,  Jin Li

IPC: G02B27/10

CPC classification number: G02B27/10 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0043 ,  G02B3/0056 ,  H01L27/14627 ,  H01L27/14685

Abstract: Asymmetrical structures and methods are used to adjust the orientation of a microlens for a pixel array. The asymmetrical structures affect volume and surface force parameters during microlens formation. Exemplary microlens structures include an asymmetrical microlens frame, base, material or a combination thereof to affect the focal characteristics of the microlens. The asymmetrical frame alters the microlens flow resulting from the heating of the microlens during fabrication such that orientation of the microlens relative to an axis of the imager can be controlled.

Abstract translation: 非对称结构和方法用于调整像素阵列的微透镜的取向。 非对称结构在微透镜形成期间影响体积和表面力参数。 示例性微透镜结构包括不对称微透镜框架，基底，材料或其组合以影响微透镜的焦点特性。 非对称框架改变在制造期间由微透镜加热产生的微透镜流，从而可以控制微透镜相对于成像器的轴线的取向。

公开(公告)号：US07153778B2

公开(公告)日：2006-12-26

申请号：US10783843

申请日：2004-02-20

Applicant: Brett W. Busch ,  Luan C. Tran ,  Ardavan Niroomand ,  Fred D. Fishburn ,  Yoshiki Hishiro ,  Ulrich C. Boettiger ,  Richard D. Holscher

Inventor： Brett W. Busch ,  Luan C. Tran ,  Ardavan Niroomand ,  Fred D. Fishburn ,  Yoshiki Hishiro ,  Ulrich C. Boettiger ,  Richard D. Holscher

IPC: H01L21/3205

CPC classification number: H01L21/0332 ,  H01L21/0337 ,  H01L21/31144 ,  H01L27/10852 ,  H01L28/91 ,  Y10S438/942 ,  Y10S438/946

Abstract: A patterned mask can be formed as follows. A first patterned photoresist is formed over a masking layer and utilized during a first etch into the masking layer. The first etch extends to a depth in the masking layer that is less than entirely through the masking layer. A second patterned photoresist is subsequently formed over the masking layer and utilized during a second etch into the masking layer. The combined first and second etches form openings extending entirely through the masking layer and thus form the masking layer into the patterned mask. The patterned mask can be utilized to form a pattern in a substrate underlying the mask. The pattern formed in the substrate can correspond to an array of capacitor container openings. Capacitor structure can be formed within the openings. The capacitor structures can be incorporated within a DRAM array.

公开(公告)号：US07068432B2

公开(公告)日：2006-06-27

申请号：US10899009

申请日：2004-07-27

Applicant: Ulrich C. Boettiger ,  Jin Li

Inventor： Ulrich C. Boettiger ,  Jin Li

IPC: G02B27/10 ,  G03C5/00 ,  H01L21/00 ,  H01L27/148 ,  B29D11/00

CPC classification number: G02B3/0018 ,  G02B3/0043 ,  G02B3/005 ,  G02B3/0056 ,  G02B27/1013 ,  G02B27/1073 ,  G02B27/123 ,  H01L27/14603 ,  H01L27/14625 ,  H01L27/14627 ,  H01L27/14685

Abstract: A semi-conductor based imager includes a microlens array having microlenses with modified focal characteristics. The microlenses are made of a microlens material, the melting properties of which are selectively modified to obtain different shapes after a reflow process. Selected microlenses, or portions of each microlens, are modified, by exposure to ultraviolet light, for example, to control the microlens shape produced by reflow melting. Controlling the microlens shape allows for modification of the focal characteristics of selected microlenses in the microlens array.

Abstract translation: 基于半导体的成像器包括具有改进的焦点特性的微透镜的微透镜阵列。 微透镜由微透镜材料制成，其熔融性质被选择性地修改以在回流工艺之后获得不同的形状。 所选择的微透镜或每个微透镜的部分通过暴露于紫外光来修改，例如以控制通过回流熔融产生的微透镜形状。 控制微透镜形状允许修改微透镜阵列中所选微透镜的焦点特性。

公开(公告)号：US06995911B2

公开(公告)日：2006-02-07

申请号：US10603786

申请日：2003-06-26

Applicant: Ulrich C. Boettiger

Inventor： Ulrich C. Boettiger

IPC: G02B27/00

CPC classification number: B29D11/00365 ,  G02B3/0018

Abstract: Micro-lenses for use in imagers and their method of manufacture from intermediate lens structures are described. Lithographic masks are used to remove unwanted portions from the intermediate lens structures and to remove cut-out portions from the intermediate lens structures to alter the radius of the resultant micro-lenses. Lithographic masks are also used to inhibit pull-back of the micro-lenses during a reflow step.

Abstract translation: 描述了用于成像器的微透镜及其从中间透镜结构制造的方法。 使用平版印刷掩模来从中间透镜结构去除不想要的部分，并从中间透镜结构去除切除部分以改变所得微透镜的半径。 平版印刷掩模也用于在回流步骤期间抑制微透镜的拉回。