公开(公告)号：US20140091165A1

公开(公告)日：2014-04-03

申请号：US14122711

申请日：2012-07-23

Applicant: Tsuyoshi Ishikawa ,  Shogo Iwasawa ,  Takahiro Tamura

Inventor： Tsuyoshi Ishikawa ,  Shogo Iwasawa ,  Takahiro Tamura

IPC: B02C23/12

CPC classification number: B02C17/1815 ,  B02C17/16 ,  B02C17/161 ,  B02C17/168 ,  B02C17/18 ,  B02C17/184

Abstract: A media-agitation type pulverizer of the present invention includes: a guide ring installed to radially divide a lower region of a pulverization chamber into an inner section and an annular outer section. A flow of a mixture of a raw material slurry and pulverizing media is formed as a helicoidal flow comprising a secondary flow flowing through a circulation flow path which has an upward flow path and a downward flow path created, respectively, in the outer section and the inner section of the lower region of the pulverization chamber, with respect to the guide ring. A rotational-flow suppressing device is provided within the pulverization chamber and adapted to strengthen the secondary flow of the helicoidal flow, thereby stabilizing the helicoidal flow. As a result, a media-agitation type pulverizer is provided which is capable of creating a uniformized, stable helicoidal flow in a mixture of pulverizing media and a raw material slurry, without unevenness of a centrifugal force distribution, thereby performing pulverization/dispersion uniformly with satisfactory energy efficiency.

Abstract translation: 本发明的介质搅拌式粉碎机包括：引导环，其安装成将粉碎室的下部区域径向分割成内部部分和环形外部部分。 原料浆料和粉碎介质的混合物的流动被形成为螺旋流，其包括流过循环流动路径的二次流，该循环流路分别在外部产生向上的流动路径和向下的流动路径， 相对于导向环，粉碎室的下部区域的内部部分。 旋转流动抑制装置设置在粉碎室内并且适于加强螺旋流的二次流动，从而稳定螺旋流。 结果，提供了一种介质搅拌型粉碎机，其能够在粉碎介质和原料浆料的混合物中产生均匀的稳定的螺旋流，而不会使离心力分布不均匀，从而均匀地进行粉碎/分散 令人满意的能源效率。

公开(公告)号：US09089846B2

公开(公告)日：2015-07-28

申请号：US14122711

申请日：2012-07-23

Applicant: Tsuyoshi Ishikawa ,  Shogo Iwasawa ,  Takahiro Tamura

Inventor： Tsuyoshi Ishikawa ,  Shogo Iwasawa ,  Takahiro Tamura

IPC: B02C17/16 ,  B02C17/18

CPC classification number: B02C17/1815 ,  B02C17/16 ,  B02C17/161 ,  B02C17/168 ,  B02C17/18 ,  B02C17/184

Abstract: A media-agitation pulverizer is capable of creating a uniformized, stable helicoidal flow in a mixture of pulverizing media and a raw material slurry, thereby performing pulverization/dispersion uniformly with satisfactory energy efficiency. The media-agitation pulverizer includes a guide ring installed to radially divide a lower region of a pulverization chamber into an inner section and an annular outer section, whereby a flow of a mixture of a raw material slurry and pulverizing media is formed as a helicoidal flow including a secondary flow flowing through a circulation flow path with respect to the guide ring; and rotational-flow suppressing device is provided within the pulverization chamber and adapted to strengthen the secondary flow of the helicoidal flow, thereby stabilizing the helicoidal flow.

Abstract translation: 介质搅拌粉碎机能够在粉碎介质和原料浆料的混合物中产生均匀稳定的螺旋流，从而以令人满意的能量效率均匀地进行粉碎/分散。 介质搅拌式粉碎机包括导向环，其安装成将粉碎室的下部区域径向分割成内部区段和环形外部区段，由此将原料浆料和粉碎介质的混合物的流动形成为螺旋形流动 包括流过相对于所述导向环的循环流动路径的二次流; 并且旋转流动抑制装置设置在粉碎室内并且适于加强螺旋流的二次流动，从而稳定螺旋流。

公开(公告)号：US09196899B2

公开(公告)日：2015-11-24

申请号：US13814097

申请日：2011-08-05

Applicant: Chiaki Sotowa ,  Takahiro Tamura

Inventor： Chiaki Sotowa ,  Takahiro Tamura

IPC: H01M4/133 ,  H01B1/04 ,  H01M4/36 ,  H01M4/587 ,  H01M10/0525

CPC classification number: H01M4/133 ,  C01B32/20 ,  C01P2002/72 ,  C01P2004/51 ,  C01P2006/12 ,  H01B1/04 ,  H01G11/24 ,  H01G11/36 ,  H01G11/38 ,  H01G11/42 ,  H01G11/44 ,  H01G11/50 ,  H01M4/364 ,  H01M4/587 ,  H01M10/0525 ,  H01M2004/021 ,  H01M2004/027 ,  H01M2200/20 ,  Y02E60/13

Abstract: An anode active material for use in a lithium secondary battery including a mixture of graphite I that has, according to X-ray powder diffraction, d002 of not smaller than 0.3354 nm and not greater than 0.337 nm, Lc(004) of smaller than 100 nm, La(110) of not smaller than 100 nm, and a half width of the peak of a plane (101) at a diffraction angle (2θ) of 44 degrees to 45 degrees of not smaller than 0.65 degree and another graphite so as to have, according to X-ray powder diffraction, d002 of not smaller than 0.3354 nm and not greater than 0.337 nm, Lc(004) of not smaller than 80 nm, La(110) of not smaller than 100 nm, and a half width of the peak of a plane (101) at a diffraction angle (2θ) of 44 degrees to 45 degrees of not smaller than 0.5 degree.

Abstract translation: 一种用于锂二次电池的负极活性材料，其包括石墨I的混合物，所述石墨I根据X射线粉末衍射具有不小于0.3354nm且不大于0.337nm的d002，小于100的Lc（004） nm，La（110）不小于100nm，衍射角（2θ）的平面（101）的峰值的半值宽度不小于0.65度的44度至45度，另一种石墨 根据X射线粉末衍射，不小于0.3354nm且不大于0.337nm的d002，不小于80nm的Lc（004），不小于100nm的La（110），以及 衍射角（2θ）的平面（101）的峰值的半值宽度为44度至45度，不小于0.5度。

公开(公告)号：US20130130127A1

公开(公告)日：2013-05-23

申请号：US13814145

申请日：2011-08-05

Applicant: Chiaki Sotowa ,  Takahiro Tamura

Inventor： Chiaki Sotowa ,  Takahiro Tamura

IPC: H01M4/133 ,  H01M10/0569

CPC classification number: H01M4/133 ,  H01G11/24 ,  H01G11/26 ,  H01G11/36 ,  H01G11/38 ,  H01G11/42 ,  H01G11/44 ,  H01G11/50 ,  H01G11/60 ,  H01M4/587 ,  H01M10/0525 ,  H01M10/0569 ,  H01M2004/021 ,  H01M2004/027 ,  H01M2200/10 ,  H01M2200/20 ,  H01M2300/0028 ,  Y02E60/13

Abstract: By a method that includes coking a residue resulting from distillation of crude oil under reduced pressure and having API gravity of 1 to 5, an asphaltene content of 10 to 50%, a resin content of 5 to 30%, and a sulfur content of 1 to 12% to obtain coke, pulverizing the coke to obtain a carbon powder, and heating the carbon powder at 1000 to 3500 deg C., a graphite anode active material for use in a lithium secondary battery is obtained that has, in X-ray powder diffraction, d002 of not smaller than 0.3354 nm and not greater than 0.337 nm, Lc(004) of smaller than 100 nm, La(110) of not smaller than 100 nm, and a half width of the peak of a plane (101) at a diffraction angle (2θ) of 44 degrees to 45 degrees of not smaller than 0.65 degree.

Abstract translation: 通过包括焦化在减压下由原油蒸馏得到的残留物，其API比重为1〜5，沥青质含量为10〜50％，树脂含量为5〜30％，硫含量为1的方法 至12％以获得焦炭，粉碎焦炭以获得碳粉末，并将碳粉末加热至1000-350℃，得到在锂二次电池中使用的石墨负极活性物质，其具有X射线 粉末衍射，不小于0.3354nm且不大于0.337nm的d002，小于100nm的Lc（004），不小于100nm的La（110）和平面的峰的半值宽度（101 ）在44度至45度的衍射角（2θ）不大于0.65度。

公开(公告)号：US20070199675A1

公开(公告)日：2007-08-30

申请号：US11547713

申请日：2004-04-30

Applicant: Takahiro Tamura ,  Fumikazu Shiose

Inventor： Takahiro Tamura ,  Fumikazu Shiose

IPC: B22D17/26 ,  B22D33/04

CPC classification number: B22D17/26 ,  B22C9/062 ,  B22C23/00 ,  B22D18/04

Abstract: A device for moving a metal cope towards and apart from a stationary metal drag, used in a metal mold casting device that uses the metal cope and drag, comprising: an upper die plate (9) for carrying the metal cope; a frame (5; 25); a metal mold opening and closing device (6) mounted on the frame for carrying and vertically moving the upper die plate relative to the frame so as to move the metal cope attached to the upper die plate between a position that is above and relatively near the metal drag and a position that is at the metal drag; and an actuator (3; 23, 23) connected to the frame for moving the frame so as to move the metal cope attached to the upper die plate between the position that is above and relatively near the metal drag and a position that is relatively far from the metal drag.

Abstract translation: 一种用于使用金属模具和金属模具的金属模铸造装置中使用的用于将金属底板朝向和远离固定金属阻力移动的装置，包括：用于承载金属模具的上模板（9） 框架（5; 25）; 安装在框架上的金属模具打开和关闭装置（6），用于相对于框架运送和垂直移动上模板，以便将附接到上模板的金属上模移动到位于上模 金属阻力和金属阻力位置; 以及连接到所述框架的致动器（3; 23,23），用于移动所述框架，以便将附接到所述上模板的所述金属复合件移动在所述金属阻力之上并相对接近所述金属阻力的位置和相对较远的位置 从金属拖曳。

公开(公告)号：US06470768B2

公开(公告)日：2002-10-29

申请号：US09739787

申请日：2000-12-20

Applicant: Yasunari Kato ,  Takahiro Tamura

Inventor： Yasunari Kato ,  Takahiro Tamura

IPC: G05G114

CPC classification number: G05G1/30 ,  G05G1/38 ,  Y10T74/20528 ,  Y10T74/20534 ,  Y10T74/20888

Abstract: In an accelerator, an acceleration rotor made of resin is rotatably supported in a support shaft, one end portion of a pedal arm is connected to an acceleration pedal, and the other end portion of the pedal arm is attached to attachment portions of the acceleration rotor. The attachment portions are provided in the acceleration rotor to be separated in a rotation direction of the acceleration rotor. For example, the attachment portions are a press-fitting portion, into which a top end part of the other end portion of the pedal arm is press-fitted, and an insertion portion, into which a bending part of the other end portion of the pedal arm is inserted. Thus, the pedal arm can be accurately readily attached to the resinous acceleration rotor to be only rotated around the support shaft of the acceleration rotor.

Abstract translation: 在加速器中，由树脂制成的加速转子可旋转地支撑在支撑轴中，踏板臂的一端连接到加速踏板，踏板臂的另一端部附接到加速转子的安装部 。 安装部设置在加速转子中，以在加速转子的旋转方向上分离。 例如，安装部是压入嵌合部的踏板臂的另一端部的顶端部压入其中的插入部和插入部， 插入踏板臂。 因此，能够将踏板臂准确地容易地安装到树脂加速转子上，使其仅绕加速转子的支撑轴旋转。

公开(公告)号：US5948165A

公开(公告)日：1999-09-07

申请号：US695023

申请日：1996-08-09

Applicant: Takahiro Tamura

Inventor： Takahiro Tamura

IPC: B23Q3/15 ,  C23C16/44 ,  C23C16/458 ,  H01L21/205 ,  H01L21/683 ,  C23C16/00

CPC classification number: C23C16/4586 ,  H01L21/6831

Abstract: An electrostatic chucking mechanism including an electrode body, a dielectric block placed on the front of the electrode body and having a dielectric portion to be dielectrically polarized for electrostatically chucking an object to be chucked, and an intermediate layer placed between the electrode body and the dielectric block. The intermediate layer is formed of a metal such as indium having extendibility for absorbing thermal deformation of the electrode body or the dielectric block and is heated and pressurized, thereby joining the electrode body and the dielectric block. A thin film of indium, chrome, or the like, is prepared on the junction face of the dielectric block, enhancing a junction force and adhesion by the intermediate layer.

Abstract translation: 一种静电吸附机构，包括电极体，放置在电极主体的前面的介电体块，并具有介电部分以被介电极化以静电夹持要夹持的物体;以及中间层，位于电极体和电介质之间 块。 中间层由诸如铟的金属形成，其具有用于吸收电极体或介质块的热变形的可扩展性，并且被加热和加压，从而接合电极体和介电块。 在介质块的接合面上制备铟，铬等的薄膜，增强了中间层的接合力和粘附力。

公开(公告)号：US5522936A

公开(公告)日：1996-06-04

申请号：US519732

申请日：1995-08-28

Applicant: Takahiro Tamura

Inventor： Takahiro Tamura

IPC: C23C16/40 ,  C23C16/42 ,  C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  C23C16/507 ,  H01J37/32 ,  C23C16/48

CPC classification number: C23C16/4558 ,  C23C16/4401 ,  C23C16/507 ,  H01J37/3244 ,  H01J37/32633 ,  H01J2237/022

Abstract: A thin film deposition apparatus forms a thin film onto substrates by use of a plasma gas and a material gas. In this apparatus, generation of particles in a deposition chamber can be reduced and hence a high quality thin film with fewer surface defects can be formed. The apparatus comprises a bell jar, a power-supply unit for supplying electric power to the bell jar, a deposition chamber, a vacuum pumping unit for evacuating the deposition chamber, a first gas introduction unit for introducing a gas used for generating plasma, and a second gas introduction unit for introducing a material gas used for forming the thin film, and further a blocking member for preventing either or both of the material gas and the plasma from entering a space between a gas supply end-portion of the second introduction unit and an interior surface of the deposition chamber. The blocking member is shaped to have relatively large curvature.

Abstract translation: 薄膜沉积装置通过使用等离子体气体和材料气体在基板上形成薄膜。 在该装置中，可以减少沉积室中的颗粒的产生，因此可以形成具有较少表面缺陷的高质量薄膜。 该装置包括钟罩，用于向钟罩提供电力的电源单元，沉积室，用于抽空沉积室的真空泵单元，用于引入用于产生等离子体的气体的第一气体引入单元，以及 用于引入用于形成薄膜的材料气体的第二气体引入单元，以及用于防止材料气体和等离子体中的一种或两种进入第二引入单元的气体供给端部之间的空间的阻挡构件 和沉积室的内表面。 阻挡构件成形为具有相对较大的曲率。

公开(公告)号：US07464745B2

公开(公告)日：2008-12-16

申请号：US11547713

申请日：2004-04-30

Applicant: Takahiro Tamura ,  Fumikazu Shiose

Inventor： Takahiro Tamura ,  Fumikazu Shiose

IPC: B22D33/04

CPC classification number: B22D17/26 ,  B22C9/062 ,  B22C23/00 ,  B22D18/04

Abstract: A device for moving a metal cope towards and apart from a stationary metal drag, used in a metal mold casting device that uses the metal cope and drag, comprising: an upper die plate (9) for carrying the metal cope; a frame (5; 25); a metal mold opening and closing device (6) mounted on the frame for carrying and vertically moving the upper die plate relative to the frame so as to move the metal cope attached to the upper die plate between a position that is above and relatively near the metal drag and a position that is at the metal drag; and an actuator (3; 23, 23) connected to the frame for moving the frame so as to move the metal cope attached to the upper die plate between the position that is above and relatively near the metal drag and a position that is relatively far from the metal drag.

Abstract translation: 一种用于使用金属模具和金属模具的金属模铸造装置中使用的用于将金属底板朝向和远离固定金属阻力移动的装置，包括：用于承载金属模具的上模板（9） 框架（5; 25）; 安装在框架上的金属模具打开和关闭装置（6），用于相对于框架运送和垂直移动上模板，以便将附接到上模板的金属上模移动到位于上模 金属阻力和金属阻力位置; 以及连接到所述框架的致动器（3; 23,23），用于移动所述框架，以便将附接到所述上模板的所述金属复合件移动在所述金属阻力之上并相对接近所述金属阻力的位置和相对较远的位置 从金属拖曳。

公开(公告)号：US06283130B1

公开(公告)日：2001-09-04

申请号：US09374112

申请日：1999-08-16

Applicant: Takahiro Tamura

Inventor： Takahiro Tamura

IPC: B08B700

CPC classification number: H01L21/67069 ,  C23C16/4405 ,  H01J37/32082 ,  H01J37/32862 ,  Y10T428/21

Abstract: In a vacuum processing system used in a semiconductor device manufacturing process, a plate-shaped placement area protector made of a dielectric material having a surface of dimensions and shape matching those of a surface of a substrate or an area for substrate placement in a surface of a substrate stage in place of the substrate. An etching gas is introduced into a vacuum vessel by a gas introduction mechanism and predetermined high-frequency electromagnetic wave power is applied to the substrate stage from a stage high-frequency electromagnetic wave power source. Plasma is formed in the proximity of the surface of the substrate stage by the applied high-frequency electromagnetic wave power, and a deposited film on the surface of the substrate stage is removed with the plasma. The placement area protector has the same electrical properties as the deposited film.