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    DIFFUSION-AGENT COMPOSITION, METHOD FOR FORMING IMPURITY-DIFFUSION LAYER, AND SOLAR CELL
    3.
    发明申请
    DIFFUSION-AGENT COMPOSITION, METHOD FOR FORMING IMPURITY-DIFFUSION LAYER, AND SOLAR CELL 有权
    扩散剂组合物，形成扩散层和太阳能电池的方法

    公开(公告)号：US20140227865A1

    公开(公告)日：2014-08-14

    申请号：US14342959

    申请日：2012-09-03

    Applicant: Takashi Kamizono ,  Toshiro Morita

    Inventor： Takashi Kamizono ,  Toshiro Morita

    IPC: H01L21/22 ,  H01L21/225

    CPC classification number: H01L21/2225 ,  H01L21/225 ,  H01L21/2254 ,  H01L31/068 ,  Y02E10/547

    Abstract: A diffusion-agent composition including a borate ester (A); a polyhydric alcohol (B) represented by general formula (1); and an alkoxysilane compound (C). In general formula (1), k represents an integer from 0 to 3, m represents an integer of 1 or more, and R2 and R3 each independently represent a hydrogen atom, a hydroxyl group, a C1-5 alkyl group, or a C1-5 hydroxyalkyl group. When there are a plurality of R2s and R3s, the plurality of R2s and R3s may be the same as or different from one another. When k is 2 or more, the plurality of R2s and R3s always include at least one or more hydroxyl groups or C1-5 hydroxyalkyl groups having 1 to 5 carbon atoms. R4 and R5 each independently represent a hydrogen atom or a C1-3 alkyl group.

    Abstract translation: 包含硼酸酯（A）的扩散剂组合物; 由通式（1）表示的多元醇（B）; 和烷氧基硅烷化合物（C）。 通式（1）中，k表示0〜3的整数，m表示1以上的整数，R2和R3各自独立地表示氢原子，羟基，C1-5烷基或C1 -5羟烷基。 当存在多个R2和R3时，多个R2和R3可以彼此相同或不同。 当k为2以上时，多个R 2和R 3总是包含至少一个以上的羟基或碳原子数为1〜5的C 1-5羟烷基。 R4和R5各自独立地表示氢原子或C1-3烷基。

    PAINTABLE DIFFUSING AGENT COMPOSITION
    6.
    发明申请
    PAINTABLE DIFFUSING AGENT COMPOSITION 有权
    可涂抹剂组合物

    公开(公告)号：US20120132109A1

    公开(公告)日：2012-05-31

    申请号：US13302076

    申请日：2011-11-22

    Applicant: Toshiro Morita ,  Takashi Kamizono

    Inventor： Toshiro Morita ,  Takashi Kamizono

    IPC: C09D7/12

    CPC classification number: C09J183/04 ,  C09D11/30 ,  C09D183/06 ,  C09J183/06 ,  H01L21/2225 ,  H01L21/228 ,  H01L21/288 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    Abstract: A diffusing agent composition of an aspect of the invention contains: a condensation product (A) made from a starting material that is an alkoxysilane represented by the following general formula (1): [Chemical Formula 1] R1mSi(OR2)4-m   (1) where R1 and R2 are an organic group,a plurality of R1s and R2s included in condensation product are identical or different, and m is 0, 1 or 2,the condensation product including an alkoxysilane where m=0 also including at least one alkoxysilane where m is 1 or 2; an impurity diffusion component (C); and an organic solvent (D).

    Abstract translation: 本发明的一个方面的扩散剂组合物含有：作为由以下通式（1）表示的烷氧基硅烷的原料制成的缩合产物（A）：[化学式1] R 1mSi（OR 2）4-m（ 1）其中R1和R2是有机基团，缩合产物中包含的多个R1和R2相同或不同，m为0,1或2，其中m = 0的烷氧基硅烷的缩合产物还包括至少一个 m为1或2的烷氧基硅烷; 杂质扩散成分（C）; 和有机溶剂（D）。

    Diffusion-agent composition for forming an impurity-diffusing agent layer on a semiconductor substrate
    7.
    发明授权
    Diffusion-agent composition for forming an impurity-diffusing agent layer on a semiconductor substrate 有权
    用于在半导体衬底上形成杂质扩散剂层的扩散剂组合物

    公开(公告)号：US09048175B2

    公开(公告)日：2015-06-02

    申请号：US14342959

    申请日：2012-09-03

    Applicant: Takashi Kamizono ,  Toshiro Morita

    Inventor： Takashi Kamizono ,  Toshiro Morita

    IPC: H01L21/22 ,  H01L21/225 ,  H01L31/068

    CPC classification number: H01L21/2225 ,  H01L21/225 ,  H01L21/2254 ,  H01L31/068 ,  Y02E10/547

    Abstract: A diffusion-agent composition including a borate ester (A); a polyhydric alcohol (B) represented by general formula (1); and an alkoxysilane compound (C). In general formula (1), k represents an integer from 0 to 3, m represents an integer of 1 or more, and R2 and R3 each independently represent a hydrogen atom, a hydroxyl group, a C1-5 alkyl group, or a C1-5 hydroxyalkyl group. When there are a plurality of R2s and R3s, the plurality of R2s and R3s may be the same as or different from one another. When k is 2 or more, the plurality of R2s and R3s always include at least one or more hydroxyl groups or C1-5 hydroxyalkyl groups having 1 to 5 carbon atoms. R4 and R5 each independently represent a hydrogen atom or a C1-3 alkyl group.

    Abstract translation: 包含硼酸酯（A）的扩散剂组合物; 由通式（1）表示的多元醇（B）; 和烷氧基硅烷化合物（C）。 通式（1）中，k表示0〜3的整数，m表示1以上的整数，R2和R3各自独立地表示氢原子，羟基，C1-5烷基或C1 -5羟烷基。 当存在多个R2和R3时，多个R2和R3可以彼此相同或不同。 当k为2以上时，多个R 2和R 3总是包含至少一个以上的羟基或碳原子数为1〜5的C 1-5羟烷基。 R4和R5各自独立地表示氢原子或C1-3烷基。

    FILM-FORMING COMPOSITION
    8.
    发明申请
    FILM-FORMING COMPOSITION 审中-公开
    成膜组合物

    公开(公告)号：US20090292053A1

    公开(公告)日：2009-11-26

    申请号：US12307848

    申请日：2007-07-02

    Applicant: Toshiro Morita

    Inventor： Toshiro Morita

    IPC: C08K3/18

    CPC classification number: C08L71/02 ,  C08L83/04 ,  C09D171/02 ,  C09D183/00 ,  C09D183/04 ,  C09D183/16 ,  H01L21/2225 ,  H01L21/2254 ,  C08L83/00

    Abstract: A film-forming composition for use in a coating diffusion method, capable of diffusing a dopant at a higher concentration, and further capable of concomitantly forming a silica-based coating film is provided. A film-forming composition for constituting a diffusion film provided for diffusing a dopant element into a silicon wafer, the film-forming composition including: (A) a polymeric silicon compound; (B) an oxide of the dopant element, or a salt including the dopant element; and (C) porogene.

    Abstract translation: 提供一种用于涂布扩散方法的能够以更高浓度扩散掺杂剂并且还能够同时形成二氧化硅基涂膜的成膜组合物。 一种用于构成用于将掺杂剂元素扩散到硅晶片中的扩散膜的成膜组合物，所述成膜组合物包括：（A）聚合物硅化合物; （B）掺杂剂元素的氧化物，或包含掺杂剂元素的盐; 和（C）孔隙。

    Film-forming composition
    9.
    发明授权
    Film-forming composition 有权
    成膜组合物

    公开(公告)号：US08563409B2

    公开(公告)日：2013-10-22

    申请号：US13175341

    申请日：2011-07-01

    Applicant: Toshiro Morita

    Inventor： Toshiro Morita

    IPC: H01L21/22

    CPC classification number: C08L71/02 ,  C08L83/04 ,  C09D171/02 ,  C09D183/00 ,  C09D183/04 ,  C09D183/16 ,  H01L21/2225 ,  H01L21/2254 ,  C08L83/00

    Abstract: A film-forming composition for use in a coating diffusion method, capable of diffusing a dopant at a higher concentration, and further capable of concomitantly forming a silica-based coating film is provided. A film-forming composition for constituting a diffusion film provided for diffusing a dopant element into a silicon wafer, the film-forming composition including: (A) a polymeric silicon compound; (B) an oxide of the dopant element, or a salt including the dopant element; and (C) porogene.

    Abstract translation: 提供一种用于涂布扩散方法的能够以更高浓度扩散掺杂剂并且还能够同时形成二氧化硅基涂膜的成膜组合物。 一种用于构成用于将掺杂剂元素扩散到硅晶片中的扩散膜的成膜组合物，所述成膜组合物包括：（A）聚合物硅化合物; （B）掺杂剂元素的氧化物，或包含掺杂剂元素的盐; 和（C）孔隙。

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