公开(公告)号：US06585871B1

公开(公告)日：2003-07-01

申请号：US09553170

申请日：2000-04-20

申请人： Toshiaki Anzaki ,  Etsuo Ogino ,  Takayuki Toyoshima

发明人： Toshiaki Anzaki ,  Etsuo Ogino ,  Takayuki Toyoshima

IPC分类号： C25B1102

CPC分类号： H01J37/3429 ,  C23C14/027 ,  C23C14/352 ,  H01J37/3405

摘要： A method of film deposition is disclosed, which eliminates the conventional problem that a coating film having a component concentration gradient in the thickness direction and thus having a boundary with a compositional gradient or a coating film in which two or more components coexist as a mixture thereof cannot be stably obtained by sputtering. In the method, two planar cathodes are closely arranged as a pair, and a voltage is applied thereto while alternately inverting the polarities thereof so that when a target A bonded to one of the cathodes is used as a negative electrode, then a target B bonded to the other cathode and differing to the target A in component is used as a positive electrode. The targets A and B are simultaneously bombarded with positive ions while passing a substrate in front of the targets so as to cross the cathodes. Thus, a coating film having a boundary with a compositional gradient in the thickness direction or a coating film having a two-layer structure composed of a layer of ingredient A and a layer of ingredient B is deposited by sputtering through one-direction conveyance.

公开(公告)号：US06473235B2

公开(公告)日：2002-10-29

申请号：US09783331

申请日：2001-02-15

申请人： Takayuki Toyoshima ,  Daisuke Arai ,  Toshiaki Anzaki ,  Etsuo Ogino

发明人： Takayuki Toyoshima ,  Daisuke Arai ,  Toshiaki Anzaki ,  Etsuo Ogino

IPC分类号： G02B110

CPC分类号： G06F3/045 ,  B32B17/10018 ,  B32B17/10174

摘要： A transparent touch panel substrate comprising a transparent substrate and deposited thereon a transparent conductive metal oxide film which contains zinc, indium, and tin as metallic elements and is soluble in acids. The transparent conductive metal oxide film preferably contains zinc in an amount of from 40 to 65 atomic % based on all metals and contains indium in an amount of from 0.25 to 1.3 times the amount of tin on an atomic basis. The film preferably has a thickness of from 100 to 160 nm. Unlike the conventional substrate for resistive film type transparent touch panels which comprises a glass plate coated with a transparent conductive ITO film, the touch panel substrate of the invention combines three properties: high light transmittance; ease of processing in forming a transparent electrode by acid etching; and the transparent conductive film has a moderate sheet resistance of from 500 to 5,000&OHgr;. It therefore realizes a touch panel which combines the three functions of having satisfactory display quality, being of the power-saving type, and enabling touch switch operations to be conducted without fail.

摘要翻译： 一种透明触摸面板基板，包括透明基板并且在其上沉积有透明导电金属氧化物膜，其包含锌，铟和锡作为金属元素并且可溶于酸。 透明导电性金属氧化物膜优选含有相对于所有金属为40〜65原子％的量的锌，其含有锡原子量的0.25〜1.3倍的铟。 该膜优选具有100至160nm的厚度。 不同于传统的电阻膜型透明触摸屏基板，其包括涂有透明导电ITO膜的玻璃板，本发明的触摸面板基板结合了三种性能：高透光率; 通过酸蚀刻形成透明电极的易加工性; 并且透明导电膜具有500至5,000OMEGA的适度的薄层电阻。 因此，实现了具有令人满意的显示质量，省电型的功能和能够不间断地进行触摸开关操作的三个功能的触摸面板。

公开(公告)号：US06579423B2

公开(公告)日：2003-06-17

申请号：US10011765

申请日：2001-12-11

申请人： Toshiaki Anzaki ,  Etsuo Ogino

发明人： Toshiaki Anzaki ,  Etsuo Ogino

IPC分类号： C23C1406

CPC分类号： H05K9/0096 ,  B32B17/10174 ,  C03C17/36 ,  C03C17/3613 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3676 ,  C03C2217/78 ,  C23C14/08 ,  C23C14/3414 ,  G02B5/285 ,  G02B5/287 ,  H01J2211/446

摘要： A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n+1 (n≧1) layers in which at least two dielectric layers and at least one silver layer are alternately laminated, with each other with the dielectric layer being the first to be provided on the transparent substrate, wherein at least one of the dielectric layers is an antistatic metal oxide layer having a refractive index of 1.6 to 2.7 at a wavelength of 550 nm, which is preferably formed by sputtering using a metal oxide, e.g., tin-containing indium oxide, as a target in an atmosphere having a reduced oxygen content. The electromagnetic wave filter has a high visible light transmission and a low near infrared transmission, is free from pin holes or contamination, and exhibits high durability against moist heat, etc.

公开(公告)号：US06316110B1

公开(公告)日：2001-11-13

申请号：US09265417

申请日：1999-03-10

申请人： Toshiaki Anzaki ,  Etsuo Ogino ,  Terufusa Kunisada

发明人： Toshiaki Anzaki ,  Etsuo Ogino ,  Terufusa Kunisada

IPC分类号： B32B1500

CPC分类号： H05K9/0096 ,  H01J11/10 ,  H01J11/44 ,  H01J29/868 ,  H01J2211/446 ,  Y10T428/24942 ,  Y10T428/24975 ,  Y10T428/265 ,  Y10T428/28 ,  Y10T428/2804

摘要： An electromagnetic wave filter for a plasma display panel which is effective in preventing incorrect actions of a remote control of appliances, comprising a transparent substrate, a light transmitting electromagnetic wave shield film, and a resin protective film, wherein the electromagnetic wave shield film is a 7-layered laminate in which a dielectric layer and a metal layer containing silver as the principal ingredient are laminated alternately with the dielectric layer being the first to be provided on the transparent substrate, the dielectric layer has a refractive index of 1.6 to 2.8 at 550 nm, and the metal layer containing silver as the principal ingredient contains 0.1 atomic % or more and less than 0.5 atomic % of palladium based on silver and has a thickness of 5 to 25 nm, whereby the electromagnetic wave shield film has a sheet resistance of 3 &OHgr;/□ or lower and a near infrared transmission of 20% or lower at 850 nm.

摘要翻译： 一种用于等离子体显示面板的电磁波滤波器，其有效地防止了包括透明基板，透光电磁波屏蔽膜和树脂保护膜的电器遥控器的不正确动作，其中电磁波屏蔽膜是 电介质层和含有银作为主要成分的金属层与首先被设置在透明基板上的电介质层交替叠层，其电介质层的折射率为1.6至2.8，550 nm，以银为主要成分的金属层含有0.1原子％以上且小于0.5原子％的基于银的钯，其厚度为5〜25nm，电磁波屏蔽膜的薄层电阻为 3欧米伽/平方或更低，在850nm处的近红外透射率为20％以下。

公开(公告)号：US06277507B1

公开(公告)日：2001-08-21

申请号：US09336784

申请日：1999-06-21

申请人： Toshiaki Anzaki ,  Etsuo Ogino

发明人： Toshiaki Anzaki ,  Etsuo Ogino

IPC分类号： B32B900

CPC分类号： C03C17/3417 ,  C03C17/3435 ,  C23C14/0036 ,  C23C14/0652 ,  C23C14/0676 ,  C23C14/10 ,  G02F1/133345 ,  Y10T428/12014 ,  Y10T428/24967 ,  Y10T428/24975

摘要： A process for inexpensively producing an insulating substrate suitable for use in image displays fabricated through a high-temperature production step, such as plasma displays and field emission displays (FED). A multilayered insulating film of one member selected from SiO2, a silicon oxynitride, and a silicon nitride is coated on a surface of a glass plate by reactive sputtering using one or more silicon targets in oxygen or/and nitrogen. The interface between layers in the multilayered insulating film functions to trap sodium ions thermally diffusing from the glass, whereby the amount of sodium ions which dissolve in the insulating film and reach the surface thereof is considerably reduced.

摘要翻译： 廉价地制造适合于通过高温生产步骤（诸如等离子体显示器和场发射显示器（FED））制造的图像显示器中的绝缘衬底的方法。 通过使用氧或/和氮中的一种或多种硅靶通过反应溅射将选自SiO 2，氮氧化硅和氮化硅中的一种的多层绝缘膜涂覆在玻璃板的表面上。 多层绝缘膜中的层之间的界面用于捕获从玻璃热扩散的钠离子，从而大大降低了溶解在绝缘膜中并到达其表面的钠离子的量。

公开(公告)号：US6040056A

公开(公告)日：2000-03-21

申请号：US864985

申请日：1997-05-29

申请人： Toshiaki Anzaki ,  Etsuo Ogino

发明人： Toshiaki Anzaki ,  Etsuo Ogino

IPC分类号： G02F1/1343 ,  B32B7/02 ,  B32B9/00 ,  B32B15/04 ,  C01G15/00 ,  C03C17/36 ,  H01B5/14

CPC分类号： C03C17/3613 ,  C03C17/36 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3655 ,  C03C17/3671 ,  H01L51/5215 ,  C03C2217/78 ,  C03C2217/948

摘要： A transparent electrically conductive film-attached substrate comprising a transparent glass substrate having formed on the surface thereof a transparent electrically conductive film, wherein the transparent electrically conductive film is formed by successively laminating a reflection preventing layer, a silver layer or a metal layer comprising silver as the main component, and a reflection preventing layer, and the reflection preventing layer comprises a composite oxide of zinc and indium. Atomic ratio of zinc and indium of the reflection preventing layer represented by Ad zinc/(zinc+indium) is from 0.03 to 0.9.The substrate has both the moisture and heat resistance and the alkali resistance and is suitable for a display element such as a liquid crystal cell.

摘要翻译： 一种透明导电膜附着基板，其具有透明玻璃基板，该透明玻璃基板的表面形成有透明导电膜，其中，所述透明导电膜通过依次层叠防反射层，银层或包含银的金属层而形成 作为主要成分和反射防止层，防反射层包含锌和铟的复合氧化物。 由Ad锌/（锌+铟）表示的防反射层的锌和铟的原子比为0.03〜0.9。 基板具有耐湿热性和耐碱性，并且适用于诸如液晶单元的显示元件。

公开(公告)号：US06362084B1

公开(公告)日：2002-03-26

申请号：US09619329

申请日：2000-07-20

申请人： Maki Nakamura ,  Toshiaki Mizuno ,  Etsuo Ogino ,  Toshiaki Anzaki

发明人： Maki Nakamura ,  Toshiaki Mizuno ,  Etsuo Ogino ,  Toshiaki Anzaki

IPC分类号： H01L2120

CPC分类号： C03C17/3435 ,  C23C14/0676 ,  C23C14/3414

摘要： A method of manufacturing a substrate for displays is provided, which can easily control the surface electrical resistance of the anti-electrification film formed on a surface of the substrate, and a substrate for displays manufactured by the same method. The film is formed by preparing a target from a metal oxide, and forming a thin film of a metal oxynitride on a surface of the substrate by sputtering using the target in an atmosphere of a mixture gas of an inert gas and nitrogen, a mixing ratio of the inert gas and nitrogen in the atmosphere being adjusted such that the thin film has a desired surface electrical resistance.

摘要翻译： 提供了一种制造用于显示器的基板的方法，其可以容易地控制形成在基板表面上的防电磁膜的表面电阻和通过相同方法制造的显示器基板。 通过从金属氧化物制备靶材，并在惰性气体和氮气的混合气体的气氛中使用靶材溅射，在基板的表面上形成金属氮氧化物薄膜，混合比例 的气氛中的惰性气体和氮气被调节，使得薄膜具有期望的表面电阻。

公开(公告)号：US06328857B1

公开(公告)日：2001-12-11

申请号：US09632617

申请日：2000-08-04

申请人： Toshiaki Anzaki ,  Etsuo Ogino

发明人： Toshiaki Anzaki ,  Etsuo Ogino

IPC分类号： C23C1434

CPC分类号： C23C14/3464 ,  H01J37/34

摘要： Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.

摘要翻译： 溅射方法和装置，用于在平坦基板的两侧或在庞大的基板的整个表面上形成涂层，而不涉及基板的旋转。 每个具有附着靶的至少一对溅射阴极布置在能够控制其目标侧面对的真空气氛的成膜室中，并且将基板设置在靶的前方。 以这样的方式将溅射阴极施加电压，使得溅射阴极之间的极性交替地使得该溅射阴极在溅射阴极之间引起辉光放电。 因此，溅射阴极上的靶被溅射并沉积在衬底上。

公开(公告)号：US20050158575A1

公开(公告)日：2005-07-21

申请号：US10495077

申请日：2002-11-06

申请人： Kenji Hattori ,  Etsuo Ogino

发明人： Kenji Hattori ,  Etsuo Ogino

IPC分类号： G02B5/02 ,  B32B15/08 ,  C23C14/06 ,  C23C14/20 ,  G02B5/08 ,  G02B5/20 ,  G02F1/1333 ,  G02F1/1335 ,  G02F1/13357 ,  C23C14/32

CPC分类号： G02B1/14 ,  C23C14/20 ,  G02B1/10 ,  G02B5/0833 ,  G02B5/0858 ,  G02F1/133553 ,  Y10T428/12569

摘要： An object of the invention, in the formation of a thin film on a synthetic resin, is to improve adhesiveness between the synthetic resin and the thin film by a relatively simple method. In the invention, a protective metallic layer is formed on a synthetic resin, and one thin film of (1) a semi-transmitting metallic mirror, (2) a total reflection metallic mirror, or (3) a transparent conductive film is formed. The material of the protective metallic layer is preferably selected from the group of Ti, Zr, Nb, Si, In, and Sn, and for sake of ensuring adhesiveness between the synthetic resin and the thin film, the film thickness of the protective metal layer is preferably 1 nm or more. Also, when the film thickness of the protective metallic layer is large, transmittance of the whole of the laminated film is lowered due to light absorption by the protective metallic layer, and hence, the film thickness of the protective metallic layer is preferably not more than 5 nm.

摘要翻译： 本发明的目的在于在合成树脂上形成薄膜的方法是通过相对简单的方法改善合成树脂和薄膜之间的粘附性。 在本发明中，在合成树脂上形成保护金属层，形成（1）半透射金属镜，（2）全反射金属镜，或（3）透明导电膜的一个薄膜。 保护金属层的材料优选选自Ti，Zr，Nb，Si，In和Sn中的一种，为了确保合成树脂和薄膜之间的粘附性，保护金属层的膜厚度 优选为1nm以上。 此外，当保护金属层的膜厚大时，由于保护金属层的光吸收，整个层压膜的透光率降低，因此保护金属层的膜厚优选不大于 5nm。

公开(公告)号：US06833089B1

公开(公告)日：2004-12-21

申请号：US09630777

申请日：2000-08-02

申请人： Tetsuro Kawahara ,  Kazuhiro Doushita ,  Hiroyuki Inomata ,  Etsuo Ogino ,  Kenji Mori ,  Yoshifumi Kijima ,  Hiroaki Tada

发明人： Tetsuro Kawahara ,  Kazuhiro Doushita ,  Hiroyuki Inomata ,  Etsuo Ogino ,  Kenji Mori ,  Yoshifumi Kijima ,  Hiroaki Tada

IPC分类号： B32B702

CPC分类号： C03C17/3417 ,  C03C2217/71 ,  Y10T428/24942 ,  Y10T428/2495

摘要： A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.

摘要翻译： 玻璃板的表面涂覆有作为底漆层的50nm厚的氧化铌膜的第一n型半导体膜。 底漆层涂覆有包含氧化钛的250nm厚的光催化剂膜。 因此，获得具有光催化活性表面的物品。 可以通过溅射形成两个涂膜。 选择作为底漆层的第一n型半导体膜具有比氧化钛更大的能带隙。 由于这种结构，在膜表面附近产生更多的孔。 本发明不含常规的具有光催化活性的氧化钛薄膜的问题，难以产生许多有助于光催化活性的表面空穴，因为电荷分离产生的电子和空穴在膜内复合，使得不可能有效地提高催化活性 活动。