公开(公告)号：US20110311125A1

公开(公告)日：2011-12-22

申请号：US13131759

申请日：2009-11-19

申请人： Junko Konishi ,  Tomohiro Funakoshi ,  Tsunehiro Sakai

发明人： Junko Konishi ,  Tomohiro Funakoshi ,  Tsunehiro Sakai

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148 ,  H01L22/12

摘要： Provided is an observation condition determination support device which can improve the defect classification accuracy. The observation condition determination support device includes: a means (26) for acquiring a plurality of defects images which have captured the same defect under a plurality of observation conditions set in advance in an observation device (5) in accordance with check data relating to defects of a semiconductor device detected by an inspection device (4); a means (12) for classifying the plurality of the same defects according to the respective defect images and determining a first category to which the same defects belong for each of the observation conditions as a result of the classification; and a means (13) for determining an observation condition to be used when fabricating the semiconductor device among the plurality of the observation conditions according to the ratio at which the first category is matched with a second category determined by a user of the observation device who has classified the same defects

摘要翻译： 提供了可以提高缺陷分类精度的观察条件判定支持装置。 观察条件确定支持装置包括：根据与缺陷有关的检查数据，在观察装置（5）中预先设置的多个观察条件下获取已经捕获相同缺陷的多个缺陷图像的装置（26） 由检查装置（4）检测的半导体装置; 根据各个缺陷图像对多个相同的缺陷进行分类的装置（12），并且作为分类的结果确定与每个观察条件相同的缺陷属于的第一类别; 以及用于根据所述第一类别与所述观察装置的用户确定的第二类别匹配的比例，确定在所述多个观察条件中制造所述半导体装置时使用的观察条件的装置（13） 已分类相同的缺陷

公开(公告)号：US20110274362A1

公开(公告)日：2011-11-10

申请号：US13142812

申请日：2009-12-28

申请人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

发明人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

IPC分类号： G06K9/62

CPC分类号： G06K9/6263 ,  G01N21/94 ,  G01N21/95607 ,  G01N2021/8854 ,  G06K9/033 ,  G06K9/6254 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： The objective is to improve a classification standard. Classification standard data, in which is registered image data information that is the standard when image data is classified, and classification data, in which is registered image data information that is the result when newly input image data is classified using the classification standard data, are stored in a storage unit. An image classification device is characterized in that when any image data information of the image data that is registered in the classification data is selected by means of an input unit, and an instruction to additionally register the selected image data information in the classification standard data is input by means of the input unit, the selected image data information is additionally registered in the classification standard data.

摘要翻译： 目标是提高分类标准。 分类标准数据，其中作为分类图像数据时的标准的登记图像数据信息，以及分类数据，其中作为新输入图像数据使用分类标准数据分类的结果的登记图像数据信息是分类数据， 存储在存储单元中。 图像分类装置的特征在于，当通过输入单元选择登记在分类数据中的图像数据的任何图像数据信息，并且在分类标准数据中附加地注册所选择的图像数据信息的指令是 通过输入单元输入，所选择的图像数据信息被附加地登记在分类标准数据中。

公开(公告)号：US08625906B2

公开(公告)日：2014-01-07

申请号：US13142812

申请日：2009-12-28

申请人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

发明人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

IPC分类号： G06K9/62 ,  G06K9/54

CPC分类号： G06K9/6263 ,  G01N21/94 ,  G01N21/95607 ,  G01N2021/8854 ,  G06K9/033 ,  G06K9/6254 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： The objective is to improve a classification standard. Classification standard data, in which is registered image data information that is the standard when image data is classified, and classification data, in which is registered image data information that is the result when newly input image data is classified using the classification standard data, are stored in a storage unit. An image classification device is characterized in that when any image data information of the image data that is registered in the classification data is selected by means of an input unit, and an instruction to additionally register the selected image data information in the classification standard data is input by means of the input unit, the selected image data information is additionally registered in the classification standard data.

摘要翻译： 目标是提高分类标准。 分类标准数据，其中作为分类图像数据时的标准的登记图像数据信息，以及分类数据，其中作为新输入图像数据使用分类标准数据分类的结果的登记图像数据信息是分类数据， 存储在存储单元中。 图像分类装置的特征在于，当通过输入单元选择登记在分类数据中的图像数据的任何图像数据信息，并且在分类标准数据中附加地注册所选择的图像数据信息的指令是 通过输入单元输入，所选择的图像数据信息被附加地登记在分类标准数据中。

公开(公告)号：US08462352B2

公开(公告)日：2013-06-11

申请号：US13450226

申请日：2012-04-18

申请人： Yuji Miyoshi ,  Tomohiro Funakoshi

发明人： Yuji Miyoshi ,  Tomohiro Funakoshi

IPC分类号： G01B11/30

CPC分类号： G01B11/303 ,  G01B11/30 ,  G01N21/9501

摘要： A surface inspection tool 110 measures scattering light intensity of scattering light generated by irradiated irradiation light in association with a measurement coordinate on a wafer 200 with patterns and inspects the surface roughness of the wafer 200. The surface inspection tool includes a controller 250 which extracts measurement coordinate of the measured scattering light intensity that is equal to or more than a lower limit threshold L, sets an inspection range 406 of the surface roughness inspection in a partial layout 405a of a part of the whole layout 401 of the pattern corresponding to the periphery of the extracted measurement coordinate, and obtains the surface roughness in the inspection range 406.

摘要翻译： 表面检查工具110通过与图案的晶片200上的测量坐标相关联地测量由照射的照射光产生的散射光的散射光强度并检查晶片200的表面粗糙度。表面检查工具包括控制器250，其提取测量 将测量的散射光强度的坐标设定为等于或大于下限阈值L，设定与周边相对应的图案的整体布局401的一部分的部分布局405a中的表面粗糙度检查的检查范围406 提取测量坐标，并获得检查范围406中的表面粗糙度。

公开(公告)号：US20120262723A1

公开(公告)日：2012-10-18

申请号：US13450226

申请日：2012-04-18

申请人： Yuji MIYOSHI ,  Tomohiro Funakoshi

发明人： Yuji MIYOSHI ,  Tomohiro Funakoshi

IPC分类号： G01B11/30

CPC分类号： G01B11/303 ,  G01B11/30 ,  G01N21/9501

摘要： A surface inspection tool 110 measures scattering light intensity of scattering light generated by irradiated irradiation light in association with a measurement coordinate on a wafer 200 with patterns and inspects the surface roughness of the wafer 200. The surface inspection tool includes a controller 250 which extracts measurement coordinate of the measured scattering light intensity that is equal to or more than a lower limit threshold L, sets an inspection range 406 of the surface roughness inspection in a partial layout 405a of a part of the whole layout 401 of the pattern corresponding to the periphery of the extracted measurement coordinate, and obtains the surface roughness in the inspection range 406.

摘要翻译： 表面检查工具110通过与图案的晶片200上的测量坐标相关联地测量由照射的照射光产生的散射光的散射光强度并检查晶片200的表面粗糙度。表面检查工具包括控制器250，其提取测量 将测量的散射光强度的坐标设定为等于或大于下限阈值L，设定与周边相对应的图案的整体布局401的一部分的部分布局405a中的表面粗糙度检查的检查范围406 提取测量坐标，并获得检查范围406中的表面粗糙度。

公开(公告)号：US08209135B2

公开(公告)日：2012-06-26

申请号：US13040794

申请日：2011-03-04

申请人： Tomohiro Funakoshi ,  Junko Konishi ,  Yuko Kariya ,  Noritsugu Takahashi ,  Fumiaki Endo

发明人： Tomohiro Funakoshi ,  Junko Konishi ,  Yuko Kariya ,  Noritsugu Takahashi ,  Fumiaki Endo

IPC分类号： H04N7/18

CPC分类号： G03F7/7065 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8861 ,  G03F1/84

摘要： A defect detected by a wafer inspection tool is reliably captured by a defect review tool. A defect review condition in the defect review tool is varied depending on defect attributes provided by the wafer inspection tool so as to optimize the review process. For example, review magnification is varied depending on the size of the defect, or the frame addition number is varied depending on the maximum gray level difference.

摘要翻译： 由晶片检查工具检测到的缺陷由缺陷检查工具可靠地捕获。 缺陷检查工具中的缺陷检查条件根据晶片检查工具提供的缺陷属性而变化，以优化审查过程。 例如，根据缺陷的尺寸来改变复查倍率，或者根据最大灰度差来改变帧相加数。

公开(公告)号：US08995748B2

公开(公告)日：2015-03-31

申请号：US13375880

申请日：2010-06-01

申请人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

发明人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

IPC分类号： G06T7/00 ,  G01N21/95 ,  H01L21/66

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G06T7/30 ,  G06T2200/24 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/20

摘要： A defect image processing apparatus uses a normalized cross correlation to image-match a layout image (52) acquired from a design data with an image acquired by removing, from a defect image (53), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image (54) on the display device. In the displayed layout image & defect image (54), not only the layout image, the layer of which is the same as that of the defect image (53), but also a layout image of another layer is displayed superimposed on the defect image (53). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.

摘要翻译： 缺陷图像处理装置使用归一化互相关，将从设计数据获取的布局图像（52）图像匹配到通过从缺陷图像（53）中删除其缺陷区域部分而获取的图像，并将其显示为 该匹配的结果，布局图像和缺陷图像（54）在显示装置上。 在显示的布局图像和缺陷图像（54）中，不仅叠加在缺陷图像上显示其图层与缺陷图像（53）相同的布局图像，而且还显示另一层的布局图像 （53）。 这使得更容易分析由于与另一层的位置关系而发生的系统缺陷的因素。

公开(公告)号：US20120141011A1

公开(公告)日：2012-06-07

申请号：US13375880

申请日：2010-06-01

申请人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

发明人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G06T7/30 ,  G06T2200/24 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/20

摘要： A defect image processing apparatus uses a normalized cross correlation to image-match a layout image (52) acquired from a design data with an image acquired by removing, from a defect image (53), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image (54) on the display device. In the displayed layout image & defect image (54), not only the layout image, the layer of which is the same as that of the defect image (53), but also a layout image of another layer is displayed superimposed on the defect image (53). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.

摘要翻译： 缺陷图像处理装置使用归一化互相关，将从设计数据获取的布局图像（52）图像匹配到通过从缺陷图像（53）中删除其缺陷区域部分而获取的图像，并将其显示为 该匹配的结果，布局图像和缺陷图像（54）在显示装置上。 在显示的布局图像和缺陷图像（54）中，不仅叠加在缺陷图像上显示其图层与缺陷图像（53）相同的布局图像，而且还显示另一层的布局图像 （53）。 这使得更容易分析由于与另一层的位置关系而发生的系统缺陷的因素。

公开(公告)号：US08041443B2

公开(公告)日：2011-10-18

申请号：US12469762

申请日：2009-05-21

申请人： Tomohiro Funakoshi

发明人： Tomohiro Funakoshi

IPC分类号： G06F19/00 ,  G06F11/30 ,  G21C17/00 ,  G01N21/00 ,  G06K9/00

CPC分类号： G06F3/0481 ,  H01L22/20 ,  Y10T70/5637 ,  Y10T70/5659

摘要： A surface defect data display and management system comprises a risk score calculation unit for calculating the magnitude of an influence a surface defect on a wafer detected by a wafer inspection system or review system has upon a reduction in the yield of a final product as a risk score of the surface defect based on a defect size of the surface defect on the wafer and a pattern concentration obtained from design data of a pattern figure nearby a location corresponding to the position of the surface defect, and a correlation graph and defect image display unit for preparing a correlation graph showing the correlation between the defect size and the risk score of each defect, displaying the prepared correlation graph on the display apparatus and displaying additionally a defect image list of one or more defects selected by using the correlation graph.

摘要翻译： 表面缺陷数据显示和管理系统包括：风险分数计算单元，用于计算由晶片检查系统或检查系统检测到的晶片上的表面缺陷对降低最终产品的产量作为风险的影响的大小 基于晶片表面缺陷的缺陷尺寸的表面缺陷的得分以及从与表面缺陷的位置相对应的位置附近的图案图形的设计数据获得的图案浓度，以及相关图和缺陷图像显示单元 用于准备示出缺陷大小和每个缺陷的风险评分之间的相关性的相关图，在显示装置上显示准备的相关图，并另外显示通过使用相关图选择的一个或多个缺陷的缺陷图像列表。

公开(公告)号：US20090281755A1

公开(公告)日：2009-11-12

申请号：US12430701

申请日：2009-04-27

申请人： Tomohiro Funakoshi

发明人： Tomohiro Funakoshi

IPC分类号： G06F19/00

CPC分类号： G05B19/41875 ,  G01R31/2894 ,  G05B2219/32186 ,  G05B2219/37224 ,  Y02P90/20 ,  Y02P90/22

摘要： In operation to obtain an optimal observation condition in a review system, the number of trial reviews can be reduced to improve efficiency of the operation. For a defect review conducted by the review system, a recipe parameter management system stores, as recipe parameter setting history in a recipe parameter setting history DB, recipe parameter setting values of recipe parameters set when the defect review is conducted, the number of trial reviews carried out until the recipe parameter setting values are set, and defect images obtained when the defect review is conducted. The apparatus displays, on a terminal, histograms and the numbers of trial reviews generated based on the recipe parameter setting history data stored in the recipe parameter setting history DB. Hence, the operator can easily obtain data regarding the recipe parameter setting in the past.

摘要翻译： 在审查系统中获得最佳观察条件的操作中，可以减少审查次数以提高操作效率。 对于由检查系统进行的缺陷检查，配方参数管理系统将作为配方参数设置历史DB中的配方参数设置历史存储在进行缺陷检查时设定的配方参数的配方参数设定值，审查次数 进行到配方参数设定值的设定，进行缺陷检查时获得的缺陷图像。 该装置在终端上显示基于存储在配方参数设置历史DB中的食谱参数设置历史数据生成的直方图和试验评价的数量。 因此，操作者可以容易地获得关于过去配方参数设置的数据。