公开(公告)号：US08995748B2

公开(公告)日：2015-03-31

申请号：US13375880

申请日：2010-06-01

申请人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

发明人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

IPC分类号： G06T7/00 ,  G01N21/95 ,  H01L21/66

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G06T7/30 ,  G06T2200/24 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/20

摘要： A defect image processing apparatus uses a normalized cross correlation to image-match a layout image (52) acquired from a design data with an image acquired by removing, from a defect image (53), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image (54) on the display device. In the displayed layout image & defect image (54), not only the layout image, the layer of which is the same as that of the defect image (53), but also a layout image of another layer is displayed superimposed on the defect image (53). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.

摘要翻译： 缺陷图像处理装置使用归一化互相关，将从设计数据获取的布局图像（52）图像匹配到通过从缺陷图像（53）中删除其缺陷区域部分而获取的图像，并将其显示为 该匹配的结果，布局图像和缺陷图像（54）在显示装置上。 在显示的布局图像和缺陷图像（54）中，不仅叠加在缺陷图像上显示其图层与缺陷图像（53）相同的布局图像，而且还显示另一层的布局图像 （53）。 这使得更容易分析由于与另一层的位置关系而发生的系统缺陷的因素。

公开(公告)号：US20120141011A1

公开(公告)日：2012-06-07

申请号：US13375880

申请日：2010-06-01

申请人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

发明人： Tsunehiro Sakai ,  Shigeki Kurihara ,  Yutaka Tandai ,  Tamao Ishikawa ,  Yuichi Hamamura ,  Tomohiro Funakoshi ,  Seiji Isogai ,  Katsuhiko Ichinose

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G06T7/30 ,  G06T2200/24 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L22/12 ,  H01L22/20

摘要： A defect image processing apparatus uses a normalized cross correlation to image-match a layout image (52) acquired from a design data with an image acquired by removing, from a defect image (53), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image (54) on the display device. In the displayed layout image & defect image (54), not only the layout image, the layer of which is the same as that of the defect image (53), but also a layout image of another layer is displayed superimposed on the defect image (53). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.

摘要翻译： 缺陷图像处理装置使用归一化互相关，将从设计数据获取的布局图像（52）图像匹配到通过从缺陷图像（53）中删除其缺陷区域部分而获取的图像，并将其显示为 该匹配的结果，布局图像和缺陷图像（54）在显示装置上。 在显示的布局图像和缺陷图像（54）中，不仅叠加在缺陷图像上显示其图层与缺陷图像（53）相同的布局图像，而且还显示另一层的布局图像 （53）。 这使得更容易分析由于与另一层的位置关系而发生的系统缺陷的因素。

公开(公告)号：US08595666B2

公开(公告)日：2013-11-26

申请号：US13382437

申请日：2010-05-14

申请人： Koichi Hayakawa ,  Takehiro Hirai ,  Yutaka Tandai ,  Tamao Ishikawa ,  Tsunehiro Sakai ,  Kazuhisa Hasumi ,  Kazunori Nemoto ,  Katsuhiko Ichinose ,  Yuji Takagi

发明人： Koichi Hayakawa ,  Takehiro Hirai ,  Yutaka Tandai ,  Tamao Ishikawa ,  Tsunehiro Sakai ,  Kazuhisa Hasumi ,  Kazunori Nemoto ,  Katsuhiko Ichinose ,  Yuji Takagi

IPC分类号： G06F17/50

CPC分类号： G01N21/8851 ,  G01N21/95607

摘要： A defect is efficiently and effectively classified by accurately determining the state of overlap between a design layout pattern and the defect. This leads to simple identification of a systematic defect. A defective image obtained through defect inspection or review of a semiconductor device is automatically pattern-matched with design layout data. A defect is superimposed on a design layout pattern for at least one layer of a target layer, a layer immediately above the target layer, and a layer immediately below the target layer. The state of overlap of the defect is determined as within the pattern, over the pattern, or outside the pattern, and the defect is automatically classified.

摘要翻译： 通过精确地确定设计布局图案和缺陷之间的重叠状态，有效地和有效地分类缺陷。 这导致系统缺陷的简单识别。 通过半导体器件的缺陷检查或检查获得的缺陷图像与设计布局数据自动匹配。 缺陷叠加在目标层的至少一层，目标层上方的层和目标层正下方的层的设计布局图案上。 缺陷的重叠状态被确定为图案内，图案上或图案之外，并且缺陷被自动分类。

公开(公告)号：US20120131529A1

公开(公告)日：2012-05-24

申请号：US13382437

申请日：2010-05-14

申请人： Koichi Hayakawa ,  Takehiro Hirai ,  Yutaka Tandai ,  Tamao Ishikawa ,  Tsunehiro Sakai ,  Kazuhisa Hasumi ,  Kazunori Nemoto ,  Katsuhiko Ichinose ,  Yuji Takagi

发明人： Koichi Hayakawa ,  Takehiro Hirai ,  Yutaka Tandai ,  Tamao Ishikawa ,  Tsunehiro Sakai ,  Kazuhisa Hasumi ,  Kazunori Nemoto ,  Katsuhiko Ichinose ,  Yuji Takagi

IPC分类号： G06F17/50

CPC分类号： G01N21/8851 ,  G01N21/95607

摘要： A defect is efficiently and effectively classified by accurately determining the state of overlap between a design layout pattern and the defect. This leads to simple identification of a systematic defect. A defective image obtained through defect inspection or review of a semiconductor device is automatically pattern-matched with design layout data. A defect is superimposed on a design layout pattern for at least one layer of a target layer, a layer immediately above the target layer, and a layer immediately below the target layer. The state of overlap of the defect is determined as within the pattern, over the pattern, or outside the pattern, and the defect is automatically classified.

摘要翻译： 通过精确地确定设计布局图案和缺陷之间的重叠状态，有效地和有效地分类缺陷。 这导致系统缺陷的简单识别。 通过半导体器件的缺陷检查或检查获得的缺陷图像与设计布局数据自动匹配。 缺陷叠加在目标层的至少一层，目标层上方的层和目标层正下方的层的设计布局图案上。 缺陷的重叠状态被确定为图案内，图案上或图案之外，并且缺陷被自动分类。

公开(公告)号：US20110311125A1

公开(公告)日：2011-12-22

申请号：US13131759

申请日：2009-11-19

申请人： Junko Konishi ,  Tomohiro Funakoshi ,  Tsunehiro Sakai

发明人： Junko Konishi ,  Tomohiro Funakoshi ,  Tsunehiro Sakai

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148 ,  H01L22/12

摘要： Provided is an observation condition determination support device which can improve the defect classification accuracy. The observation condition determination support device includes: a means (26) for acquiring a plurality of defects images which have captured the same defect under a plurality of observation conditions set in advance in an observation device (5) in accordance with check data relating to defects of a semiconductor device detected by an inspection device (4); a means (12) for classifying the plurality of the same defects according to the respective defect images and determining a first category to which the same defects belong for each of the observation conditions as a result of the classification; and a means (13) for determining an observation condition to be used when fabricating the semiconductor device among the plurality of the observation conditions according to the ratio at which the first category is matched with a second category determined by a user of the observation device who has classified the same defects

摘要翻译： 提供了可以提高缺陷分类精度的观察条件判定支持装置。 观察条件确定支持装置包括：根据与缺陷有关的检查数据，在观察装置（5）中预先设置的多个观察条件下获取已经捕获相同缺陷的多个缺陷图像的装置（26） 由检查装置（4）检测的半导体装置; 根据各个缺陷图像对多个相同的缺陷进行分类的装置（12），并且作为分类的结果确定与每个观察条件相同的缺陷属于的第一类别; 以及用于根据所述第一类别与所述观察装置的用户确定的第二类别匹配的比例，确定在所述多个观察条件中制造所述半导体装置时使用的观察条件的装置（13） 已分类相同的缺陷

公开(公告)号：US20110274362A1

公开(公告)日：2011-11-10

申请号：US13142812

申请日：2009-12-28

申请人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

发明人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

IPC分类号： G06K9/62

CPC分类号： G06K9/6263 ,  G01N21/94 ,  G01N21/95607 ,  G01N2021/8854 ,  G06K9/033 ,  G06K9/6254 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： The objective is to improve a classification standard. Classification standard data, in which is registered image data information that is the standard when image data is classified, and classification data, in which is registered image data information that is the result when newly input image data is classified using the classification standard data, are stored in a storage unit. An image classification device is characterized in that when any image data information of the image data that is registered in the classification data is selected by means of an input unit, and an instruction to additionally register the selected image data information in the classification standard data is input by means of the input unit, the selected image data information is additionally registered in the classification standard data.

摘要翻译： 目标是提高分类标准。 分类标准数据，其中作为分类图像数据时的标准的登记图像数据信息，以及分类数据，其中作为新输入图像数据使用分类标准数据分类的结果的登记图像数据信息是分类数据， 存储在存储单元中。 图像分类装置的特征在于，当通过输入单元选择登记在分类数据中的图像数据的任何图像数据信息，并且在分类标准数据中附加地注册所选择的图像数据信息的指令是 通过输入单元输入，所选择的图像数据信息被附加地登记在分类标准数据中。

公开(公告)号：US20140177940A1

公开(公告)日：2014-06-26

申请号：US14236887

申请日：2011-05-28

申请人： Ryo Nakagaki ,  Yuichi Hamamura ,  Yuji Enomoto ,  Yutaka Tandai ,  Tsunehiro Sakai ,  Kazuhisa Hasumi

发明人： Ryo Nakagaki ,  Yuichi Hamamura ,  Yuji Enomoto ,  Yutaka Tandai ,  Tsunehiro Sakai ,  Kazuhisa Hasumi

IPC分类号： G06T7/00 ,  G06F17/50

CPC分类号： G06T7/0006 ,  G06F17/5081 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01L22/12

摘要： A desired area is extracted by directly analyzing information recorded in a design layout, an inspection recipe is generated by using this extraction method, and an efficient inspection is realized. The invention makes it easy to extract an area of a desired circuit module such as a memory mat by analyzing hierarchy information of design layout data, calculating reference frequency of each one cell in the design layout data that is its internal data, sorting the cells in order of increasing reference frequency, searching the object, and tracing its upper cell.

摘要翻译： 通过直接分析设计布局中记录的信息来提取期望的区域，通过使用该提取方法生成检查配方，并且实现有效的检查。 本发明通过分析设计布局数据的层次信息，计算作为其内部数据的设计布局数据中的每一个单元的参考频率，对存储器垫等期望的电路模块的区域进行抽取， 增加参考频率，搜索对象和跟踪其上位单元的顺序。

公开(公告)号：US20130283227A1

公开(公告)日：2013-10-24

申请号：US13978114

申请日：2011-11-09

申请人： Tsunehiro Sakai ,  Yuichi Hamamura

发明人： Tsunehiro Sakai ,  Yuichi Hamamura

IPC分类号： G06F17/50

CPC分类号： G06F17/50 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A recipe necessary for a review tool or the like to image an image is efficiently made in order to identify a cause of a failed position on the basis of a result of a failure analysis system.A pattern review tool or a recipe making tool connected to the pattern review tool includes a recipe making unit which sets imaging conditions of an image so that the image is imaged along wiring including a failed position on the basis of wiring information including the failed position input from a failure analysis system connected to the pattern review tool through a network.

摘要翻译： 为了基于故障分析系统的结果来识别故障位置的原因，有效地进行了检查工具等对图像进行成像所需的配方。 连接到图案审查工具的图案审查工具或配方制作工具包括：配方制作单元，其设置图像的成像条件，使得基于包括故障位置输入的布线信息使图像沿着包括故障位置的布线成像 从通过网络连接到模式审查工具的故障分析系统。

公开(公告)号：US08472696B2

公开(公告)日：2013-06-25

申请号：US13131759

申请日：2009-11-19

申请人： Junko Konishi ,  Tomohiro Funakoshi ,  Tsunehiro Sakai

发明人： Junko Konishi ,  Tomohiro Funakoshi ,  Tsunehiro Sakai

IPC分类号： G06K9/62

CPC分类号： H01L22/20 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148 ,  H01L22/12

摘要： Provided is an observation condition determination support device which can improve the defect classification accuracy. The observation condition determination support device includes: a means (26) for acquiring a plurality of defects images which have captured the same defect under a plurality of observation conditions set in advance in an observation device (5) in accordance with check data relating to defects of a semiconductor device detected by an inspection device (4); a means (12) for classifying the plurality of the same defects according to the respective defect images and determining a first category to which the same defects belong for each of the observation conditions as a result of the classification; and a means (13) for determining an observation condition to be used when fabricating the semiconductor device among the plurality of the observation conditions according to the ratio at which the first category is matched with a second category determined by a user of the observation device who has classified the same defects.

摘要翻译： 提供了可以提高缺陷分类精度的观察条件判定支持装置。 观察条件确定支持装置包括：根据与缺陷有关的检查数据，在观察装置（5）中预先设置的多个观察条件下获取已经捕获相同缺陷的多个缺陷图像的装置（26） 由检查装置（4）检测的半导体装置; 根据各个缺陷图像对多个相同的缺陷进行分类的装置（12），并且作为分类的结果确定与每个观察条件相同的缺陷属于的第一类别; 以及用于根据所述第一类别与所述观察装置的用户确定的第二类别匹配的比例，确定在所述多个观察条件中制造所述半导体装置时使用的观察条件的装置（13） 已分类相同的缺陷。

公开(公告)号：US08625906B2

公开(公告)日：2014-01-07

申请号：US13142812

申请日：2009-12-28

申请人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

发明人： Yuya Isomae ,  Fumiaki Endo ,  Tomohiro Funakoshi ,  Junko Konishi ,  Tsunehiro Sakai

IPC分类号： G06K9/62 ,  G06K9/54

CPC分类号： G06K9/6263 ,  G01N21/94 ,  G01N21/95607 ,  G01N2021/8854 ,  G06K9/033 ,  G06K9/6254 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： The objective is to improve a classification standard. Classification standard data, in which is registered image data information that is the standard when image data is classified, and classification data, in which is registered image data information that is the result when newly input image data is classified using the classification standard data, are stored in a storage unit. An image classification device is characterized in that when any image data information of the image data that is registered in the classification data is selected by means of an input unit, and an instruction to additionally register the selected image data information in the classification standard data is input by means of the input unit, the selected image data information is additionally registered in the classification standard data.

摘要翻译： 目标是提高分类标准。 分类标准数据，其中作为分类图像数据时的标准的登记图像数据信息，以及分类数据，其中作为新输入图像数据使用分类标准数据分类的结果的登记图像数据信息是分类数据， 存储在存储单元中。 图像分类装置的特征在于，当通过输入单元选择登记在分类数据中的图像数据的任何图像数据信息，并且在分类标准数据中附加地注册所选择的图像数据信息的指令是 通过输入单元输入，所选择的图像数据信息被附加地登记在分类标准数据中。