公开(公告)号：US20220319876A1

公开(公告)日：2022-10-06

申请号：US17657821

申请日：2022-04-04

申请人： Tokyo Electron Limited

发明人： Shinichi Hayashi ,  Hiroaki Inadomi ,  Shota Umezaki ,  Suguru Enokida ,  Kouji Kimoto

IPC分类号： H01L21/67 ,  H01L21/02 ,  H01L21/677 ,  B08B3/08 ,  B08B13/00

摘要： A substrate processing apparatus includes multiple first substrate processing devices, one or more second substrate processing devices and a transfer unit. Each of the multiple first substrate processing devices is configured to process a substrate one by one. The one or more second substrate processing devices are configured to simultaneously process multiple substrates, which are processed in the multiple first substrate processing devices. The transfer unit is configured to simultaneously carry the multiple substrates, which are processed in the multiple first substrate processing devices, into a same second substrate processing device.

公开(公告)号：US09460947B2

公开(公告)日：2016-10-04

申请号：US14332473

申请日：2014-07-16

申请人： Tokyo Electron Limited

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： H01L21/67 ,  G03F7/16 ,  G03F7/30

CPC分类号： H01L21/67178 ,  G03F7/16 ,  G03F7/162 ,  G03F7/30 ,  G03F7/3021 ,  H01L21/67184 ,  H01L21/67225 ,  H01L21/6723

摘要： In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.

摘要翻译： 在一个实施例中，涂覆和显影装置设置有转移单元，其设置在一堆早期处理单元块和一堆后期处理单元块之间，用于在横向相邻单元块的传送机构之间传送基板 以及用于在转印单元之间输送基板的可垂直移动的辅助转印机构。 一堆第一显影单元块堆叠在早期处理单元块的堆叠上，并且第二显影单元块的堆叠堆叠在后级处理单元块的堆叠上。

公开(公告)号：US08740481B2

公开(公告)日：2014-06-03

申请号：US13967485

申请日：2013-08-15

申请人： Tokyo Electron Limited

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03D5/00 ,  G03B27/52 ,  B05C11/02 ,  B05C13/02 ,  G03F7/20 ,  H01L21/67

CPC分类号： G03F7/708 ,  H01L21/6715

摘要： A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.

摘要翻译： 涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。 每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。 每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。 分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。 第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。

公开(公告)号：US09287145B2

公开(公告)日：2016-03-15

申请号：US13663179

申请日：2012-10-29

申请人： Tokyo Electron Limited

发明人： Masahiro Nakaharada ,  Yoji Sakata ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Tsunenaga Nakashima

IPC分类号： H01L21/67 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/67046 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67253 ,  H01L21/67748 ,  H01L21/6875

摘要： In a coating and developing treatment system including a treatment station and an interface station, the interface station has: a cleaning unit cleaning a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting whether the cleaned wafer is in an exposable state; and a wafer transfer mechanism including an arm transferring the wafer between the cleaning unit and the inspection unit. Each of the cleaning unit and the inspection unit is provided at multiple tiers in an up and down direction on the front side in the interface station, and the wafer transfer mechanism is provided in a region adjacent to the cleaning units and the inspection units.

摘要翻译： 在包括处理台和接口站的涂覆和显影处理系统中，界面站具有：清洁单元，其在将晶片转移到曝光装置之前清洁晶片的后表面; 检查单元检查清洁的晶片是否处于可曝光状态; 以及晶片传送机构，其包括在所述清洁单元和所述检查单元之间传送所述晶片的臂。 每个清洁单元和检查单元在接口站的前侧沿上下方向设置多层，并且晶片传送机构设置在与清洁单元和检查单元相邻的区域中。

公开(公告)号：US20130112223A1

公开(公告)日：2013-05-09

申请号：US13663179

申请日：2012-10-29

申请人： Tokyo Electron Limited

发明人： Masahiro Nakaharada ,  Yoji Sakata ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Tsunenaga Nakashima

IPC分类号： B08B3/00

CPC分类号： H01L21/67046 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67253 ,  H01L21/67748 ,  H01L21/6875

摘要： In a coating and developing treatment system including a treatment station and an interface station, the interface station has: a cleaning unit cleaning a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting whether the cleaned wafer is in an exposable state; and a wafer transfer mechanism including an arm transferring the wafer between the cleaning unit and the inspection unit. Each of the cleaning unit and the inspection unit is provided at multiple tiers in an up and down direction on the front side in the interface station, and the wafer transfer mechanism is provided in a region adjacent to the cleaning units and the inspection units.

摘要翻译： 在包括处理台和接口站的涂覆和显影处理系统中，界面站具有：清洁单元，其在将晶片转移到曝光装置之前清洁晶片的后表面; 检查单元检查清洁的晶片是否处于可曝光状态; 以及晶片传送机构，其包括在所述清洁单元和所述检查单元之间传送所述晶片的臂。 每个清洁单元和检查单元在接口站的前侧沿上下方向设置多层，并且晶片传送机构设置在与清洁单元和检查单元相邻的区域中。

公开(公告)号：US09984905B2

公开(公告)日：2018-05-29

申请号：US15252422

申请日：2016-08-31

申请人： Tokyo Electron Limited

发明人： Masahiro Nakaharada ,  Yoji Sakata ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Tsunenaga Nakashima

IPC分类号： H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  H01L21/02 ,  H01L21/66 ,  G03F7/20

CPC分类号： H01L21/67051 ,  G03F7/70691 ,  H01L21/02043 ,  H01L21/67046 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67225 ,  H01L21/67242 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/67706 ,  H01L21/67748 ,  H01L21/6875 ,  H01L22/20

摘要： An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

公开(公告)号：US09984904B2

公开(公告)日：2018-05-29

申请号：US15252374

申请日：2016-08-31

申请人： Tokyo Electron Limited

发明人： Masahiro Nakaharada ,  Yoji Sakata ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Tsunenaga Nakashima

IPC分类号： H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  H01L21/02 ,  H01L21/66 ,  G03F7/20

CPC分类号： H01L21/67051 ,  G03F7/70691 ,  H01L21/02043 ,  H01L21/67046 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67225 ,  H01L21/67242 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/67706 ,  H01L21/67748 ,  H01L21/6875 ,  H01L22/20

摘要： An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

公开(公告)号：US09460942B2

公开(公告)日：2016-10-04

申请号：US13663846

申请日：2012-10-30

申请人： Tokyo Electron Limited

发明人： Masahiro Nakaharada ,  Yoji Sakata ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Tsunenaga Nakashima

IPC分类号： H01L21/67 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/67051 ,  G03F7/70691 ,  H01L21/02043 ,  H01L21/67046 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67225 ,  H01L21/67242 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/67706 ,  H01L21/67748 ,  H01L21/6875 ,  H01L22/20

摘要： An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

摘要翻译： 涂装和显影处理系统的界面站具有：在将晶片转移到曝光装置之前，清洁单元至少清洁晶片的后表面; 检查单元，在将其转印到曝光装置之前，检查清洁晶片的背面是否可曝光; 晶片传送机构包括在晶片传送机构之间转移晶片的晶片传送控制部件。 当通过检查结果确定晶片的状态通过重新清洁在清洁单元中时，晶片转移控制部分控制晶片传送机构将晶片再次传送到清洁单元。

公开(公告)号：US09417529B2

公开(公告)日：2016-08-16

申请号：US14626295

申请日：2015-02-19

申请人： TOKYO ELECTRON LIMITED

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida ,  Hiroshi Tomita ,  Makoto Hayakawa ,  Tatsuhei Yoshida

IPC分类号： G03B27/52 ,  G03F7/16 ,  H01L21/67

CPC分类号： G03F7/16 ,  H01L21/6715

摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

摘要翻译： 在一个实施例中，涂层和显影装置包括具有两个早期涂层单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。该装置至少具有 适用于异常的两种操作模式M1和M2。 在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。 在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。