METHODS FOR DEPOSITING A MONOLAYER ON A SUBSTRATE
    2.
    发明申请
    METHODS FOR DEPOSITING A MONOLAYER ON A SUBSTRATE 有权
    在基板上沉积单层的方法

    公开(公告)号:US20160307747A1

    公开(公告)日:2016-10-20

    申请号:US15130208

    申请日:2016-04-15

    IPC分类号: H01L21/02 C23C16/455

    摘要: Methods and compositions for depositing a monolayer onto a surface of a substrate are described. The method can include contacting the surface with a vapor phase comprising a carbene source, and reacting a carbene group from the carbene source with a functional group on the surface, to obtain a covalently bound monolayer on the surface of the substrate. The carbene source can be a diazirine compound. The functional group on the surface can be a C—H containing group, a Si—H containing group, among others, or combinations thereof. The method can further involve removing physisorbed molecules from the surface of the substrate.

    摘要翻译: 描述了将单层沉积到基底表面上的方法和组合物。 该方法可以包括使表面与包含卡宾源的气相接触,并将来自卡宾源的卡宾基团与表面上的官能团反应,以在基材的表面上获得共价结合的单层。 卡宾源可以是二氮嗪化合物。 表面上的官能团可以是含C-H的基团,含Si-H的基团,或其组合。 该方法还可以包括从衬底的表面去除物理吸附分子。