公开(公告)号：US07604832B2

公开(公告)日：2009-10-20

申请号：US10927155

申请日：2004-08-27

申请人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

发明人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

IPC分类号： B05D1/02 ,  B05D3/12

CPC分类号： H01L21/6715 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/022 ,  H01L21/02282 ,  H01L21/288 ,  H01L21/31633

摘要： There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10−5 qγ (mm) given with respect to a surface tension γ (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10−5 (m·sec/N).

摘要翻译： 公开了一种成膜方法，其特征在于，连续地排出通过设置在喷嘴中的排出口将调整后的液体以一定量向基板扩散至基板，使喷嘴和基板相对移动， 将供给的溶液供给到基板上以形成液膜，其中喷嘴的排出口和基板之间的距离h被设定为不小于2mm，并且在小于5×10 -5 qgamma（mm）的范围内 相对于溶液的表面张力γ（N / m），通过排出口连续排出的溶液的排出速度q（m / sec），常数为5×10 -5（m·sec / N）。

公开(公告)号：US07364839B2

公开(公告)日：2008-04-29

申请号：US10624593

申请日：2003-07-23

申请人： Kei Hayasaki ,  Shinichi Ito ,  Tomoyuki Takeishi ,  Kenji Kawano ,  Tatsuhiko Ema

发明人： Kei Hayasaki ,  Shinichi Ito ,  Tomoyuki Takeishi ,  Kenji Kawano ,  Tatsuhiko Ema

IPC分类号： G03F7/26

CPC分类号： G03F7/40

摘要： A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to remove a surface layer of the pattern by causing the pattern to contact with an activated water.

摘要翻译： 图案形成方法包括在基板上形成感光性树脂膜，使感光性树脂膜曝光，通过向感光性树脂膜供给显影液而形成感光性树脂膜的图案，通过使感光性树脂膜变薄，从而除去图案的表面层 导致图案与活性水接触。

公开(公告)号：US06709531B2

公开(公告)日：2004-03-23

申请号：US10396407

申请日：2003-03-26

申请人： Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema ,  Katsuya Okamura

发明人： Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema ,  Katsuya Okamura

IPC分类号： B08B504

CPC分类号： H01L21/67034 ,  B05C11/06 ,  B05C11/08 ,  B05D1/005 ,  B05D3/0406 ,  H01L21/6708 ,  Y10S134/902 ,  Y10S438/906

摘要： In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

摘要翻译： 在本公开中，在化学液膜上方形成空气流，并且通过使空气流与化学液体的表面接触而产生化学液体的移动。 此外，通过旋转板在处理对象基板和板之间的空间中产生负压。 因此，提高了液体的处理均匀性，能够有效地进行液体除去工序。 结果，可以提高化学液体处理的产率。

公开(公告)号：US08071157B2

公开(公告)日：2011-12-06

申请号：US11987653

申请日：2007-12-03

申请人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

发明人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

IPC分类号： B05D3/12

CPC分类号： H01L21/6715 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/022 ,  H01L21/02282 ,  H01L21/288 ,  H01L21/31633

摘要： There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10−5 qγ (mm) given with respect to a surface tension γ (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10−5 (m·sec/N).

摘要翻译： 公开了一种成膜方法，其特征在于，连续地排出通过设置在喷嘴中的排出口将调整后的液体以一定量向基板扩散至基板，使喷嘴和基板相对移动， 将其供给到基板上形成液膜，其中喷嘴的排出口与基板的距离h设定为2mm以上且小于5×10 -5qγ（mm） ）相对于溶液的表面张力γ（N / m）给出，通过排出口连续排出的溶液的排出速度q（m / sec），常数为5×10-5（m·sec / N）。

公开(公告)号：US07067033B2

公开(公告)日：2006-06-27

申请号：US10775251

申请日：2004-02-11

申请人： Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema ,  Katsuya Okamura

发明人： Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema ,  Katsuya Okamura

IPC分类号： C23F1/00

CPC分类号： H01L21/67034 ,  B05C11/06 ,  B05C11/08 ,  B05D1/005 ,  B05D3/0406 ,  H01L21/6708 ,  Y10S134/902 ,  Y10S438/906

摘要： In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

摘要翻译： 在本公开中，在化学液膜上方形成空气流，并且通过使空气流与化学液体的表面接触而产生化学液体的移动。 此外，通过旋转板在处理对象基板和板之间的空间中产生负压。 因此，提高了液体的处理均匀性，能够有效地进行液体除去工序。 结果，可以提高化学液体处理的产率。

公开(公告)号：US20050022732A1

公开(公告)日：2005-02-03

申请号：US10927155

申请日：2004-08-27

申请人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

发明人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

IPC分类号： H01L21/027 ,  H01L21/00 ,  H01L21/20 ,  H01L21/288 ,  H01L21/316 ,  B05C5/00 ,  B05B7/00 ,  B05B13/02 ,  B05C15/00

CPC分类号： H01L21/6715 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/022 ,  H01L21/02282 ,  H01L21/288 ,  H01L21/31633

摘要： There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10−5 qγ (mm) given with respect to a surface tension γ (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10−5 (m·sec/N).

摘要翻译： 公开了一种成膜方法，其特征在于，连续地排出通过设置在喷嘴中的排出口将调整后的液体以一定量向基板扩散至基板，使喷嘴和基板相对移动， 将供给的溶液供给到基板上以形成液膜，其中喷嘴的排出口与基板之间的距离h被设定为不小于2mm，并且在小于5×10 -5 qmam ）相对于溶液的表面张力γ（N / m）给出，通过排出口连续排出的溶液的排出速度q（m / sec）和常数为5×10 -5（m.sec / N）。

公开(公告)号：US06842281B2

公开(公告)日：2005-01-11

申请号：US10133626

申请日：2002-04-29

申请人： Atsushi Tsurumune ,  Jiro Mizuno ,  Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema

发明人： Atsushi Tsurumune ,  Jiro Mizuno ,  Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema

IPC分类号： G02B21/00 ,  G02B21/16 ,  G02B21/26 ,  G02B21/36 ,  G02B11/04

CPC分类号： G02B21/16

摘要： An ultraviolet microscope comprises an observation device which observes a specimen with ultraviolet light; a gas supply device which, during the observation with ultraviolet light, supplies an inert gas to surroundings of the specimen; and a timing control device which controls supply timing of the inert gas by the gas supply device, and the timing control device controls the gas supply device so as to cause preliminary supply of the inert gas before the observation of the specimen with ultraviolet light, and also so as to cause regular supply of the inert gas at least during the observation of the specimen with ultraviolet light.

摘要翻译： 紫外线显微镜包括用紫外线观察样品的观察装置; 在紫外线观察期间，向样本周围供给惰性气体的气体供给装置; 以及定时控制装置，其通过气体供给装置控制惰性气体的供给定时，并且定时控制装置控制气体供给装置，以便在用紫外线观察样品之前使惰性气体预先供应，以及 也可以至少在用紫外线观察试样时使惰性气体定期供给。

公开(公告)号：US06800569B2

公开(公告)日：2004-10-05

申请号：US10352954

申请日：2003-01-29

申请人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

发明人： Shinichi Ito ,  Tatsuhiko Ema ,  Kei Hayasaki ,  Rempei Nakata ,  Nobuhide Yamada ,  Katsuya Okumura

IPC分类号： H01L2131

CPC分类号： H01L21/6715 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/022 ,  H01L21/02282 ,  H01L21/288 ,  H01L21/31633

摘要： There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10−5 q&ggr; (mm) given with respect to a surface tension &ggr; (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10−5 (m·sec/N).

摘要翻译： 公开了一种成膜方法，其特征在于，连续地排出通过设置在喷嘴中的排出口将调整后的液体以一定量向基板扩散至基板，使喷嘴和基板相对移动， 将供给的溶液供给到基板上以形成液膜，其中喷嘴的排出口与基板之间的距离h被设定为不小于2mm，并且在小于5×10 -5 qmam ）相对于溶液的表面张力γ（N / m）给出，通过排出口连续排出的溶液的排出速度q（m / sec）和常数为5×10 -5（m.sec / N）。

公开(公告)号：US20060151015A1

公开(公告)日：2006-07-13

申请号：US11372010

申请日：2006-03-10

申请人： Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema ,  Katsuya Okamura

发明人： Shinichi Ito ,  Riichiro Takahashi ,  Tatsuhiko Ema ,  Katsuya Okamura

IPC分类号： B08B3/00

CPC分类号： H01L21/67034 ,  B05C11/06 ,  B05C11/08 ,  B05D1/005 ,  B05D3/0406 ,  H01L21/6708 ,  Y10S134/902 ,  Y10S438/906

摘要： In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

公开(公告)号：US06719844B2

公开(公告)日：2004-04-13

申请号：US10302894

申请日：2002-11-25

申请人： Tatsuhiko Ema ,  Shinichi Ito

发明人： Tatsuhiko Ema ,  Shinichi Ito

IPC分类号： B05C1302

CPC分类号： B05D3/02 ,  B05D1/02 ,  B05D1/26

摘要： Using a scan coating method, a liquid film is formed on a substrate having a temperature distribution for correcting a temperature distribution of a liquid film caused by the heat of evaporation due to the volatilization of a solvent contained in the liquid film, and then the solvent is removed from the liquid film to form a coating film.

摘要翻译： 使用扫描涂布法，在具有温度分布的基板上形成液膜，所述温度分布用于校正由于液膜中所含溶剂的挥发引起的蒸发热引起的液膜的温度分布，然后溶剂 从液膜中除去以形成涂膜。