公开(公告)号：US12025917B2

公开(公告)日：2024-07-02

申请号：US16716792

申请日：2019-12-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Zhan Zhou ,  Heng-Jen Lee ,  Hsu-Yuan Liu ,  Yu-Chen Huang ,  Cheng-Han Wu ,  Shih-Che Wang ,  Ho-Yung David Hwang

IPC: G03F7/16 ,  B67D7/02 ,  B67D7/36 ,  B67D7/78 ,  H01L21/027

CPC classification number: G03F7/16 ,  B67D7/0294 ,  B67D7/36 ,  B67D7/78 ,  H01L21/0274 ,  Y10T137/0318 ,  Y10T137/86187

Abstract: A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.

公开(公告)号：US09817315B2

公开(公告)日：2017-11-14

申请号：US14208529

申请日：2014-03-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Zhan Zhou ,  Heng-Jen Lee ,  Hsu-Yuan Liu ,  Yu-Chen Huang ,  Cheng-Han Wu ,  Shih-Che Wang ,  Ho-Yung David Hwang

IPC: G03F7/16 ,  B67D7/02 ,  B67D7/36 ,  B67D7/78

CPC classification number: G03F7/16 ,  B67D7/0294 ,  B67D7/36 ,  B67D7/78 ,  Y10T137/0318 ,  Y10T137/86187

Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.

公开(公告)号：US10558120B2

公开(公告)日：2020-02-11

申请号：US15806663

申请日：2017-11-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Zhan Zhou ,  Heng-Jen Lee ,  Hsu-Yuan Liu ,  Yu-Chen Huang ,  Cheng-Han Wu ,  Shih-Che Wang ,  Ho-Yung David Hwang

IPC: G03F7/16 ,  B67D7/02 ,  B67D7/36 ,  B67D7/78

Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.

公开(公告)号：US09196515B2

公开(公告)日：2015-11-24

申请号：US14551302

申请日：2014-11-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

IPC: H01L21/67 ,  H01J37/317 ,  H01J37/32 ,  H01J37/16 ,  H01J37/20 ,  G03F7/16 ,  G03F7/30 ,  G03F7/20 ,  H01L21/677

CPC classification number: H01L21/67225 ,  G03F7/16 ,  G03F7/30 ,  G03F7/70991 ,  H01J37/16 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/32899 ,  H01L21/67276 ,  H01L21/67745

Abstract: The present disclosure relates to a lithographic tool arrangement for semiconductor workpiece processing. The lithographic tool arrangement groups lithographic tools into clusters, and selectively transfers a semiconductor workpiece between a plurality of lithographic tools of a first type in a first cluster to a plurality of lithographic tools of a second type in a second cluster. The selective transfer is achieved though a transfer assembly, which is coupled to a defect scan tool that identifies defects generated in the lithographic tool of the first type. The disclosed lithographic tool arrangement also utilizes shared structural elements such as a housing assembly, and shared functional elements such as gases and chemicals. The lithographic tool arrangement may consist of baking, coating, exposure, and development units configured to provide a modularization of these various components in order to optimize throughput and efficiency for a given lithographic fabrication process.

Abstract translation: 本公开涉及一种用于半导体工件加工的平版印刷工具装置。 光刻工具装置将光刻工具组合成簇，并且将半导体工件在第一簇中的第一类型的多个光刻工具之间选择性地传输到第二簇中的第二类型的光刻工具。 通过转移组件实现选择性转移，转移组件耦合到识别第一类型的光刻工具中产生的缺陷的缺陷扫描工具。 所公开的平版印刷工具装置还利用共同的结构元件，例如壳体组件和诸如气体和化学品的共享功能元件。 光刻工具装置可以包括被配置成提供这些各种部件的模块化的烘烤，涂覆，曝光和显影单元，以便为给定的光刻制造工艺优化产量和效率。

公开(公告)号：US20180067395A1

公开(公告)日：2018-03-08

申请号：US15806663

申请日：2017-11-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Zhan Zhou ,  Heng-Jen Lee ,  Hsu-Yuan Liu ,  Yu-Chen Huang ,  Cheng-Han Wu ,  Shih-Che Wang ,  Ho-Yung David Hwang

IPC: G03F7/16 ,  B67D7/78 ,  B67D7/02 ,  B67D7/36

CPC classification number: G03F7/16 ,  B67D7/0294 ,  B67D7/36 ,  B67D7/78 ,  Y10T137/0318 ,  Y10T137/86187

Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.

公开(公告)号：US20150261089A1

公开(公告)日：2015-09-17

申请号：US14208529

申请日：2014-03-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Zhan Zhou ,  Heng-Jen Lee ,  Hsu-Yuan Liu ,  Yu-Chen Huang ,  Cheng-Han Wu ,  Shih-Che Wang ,  Ho-Yung David Hwang

IPC: G03F7/16 ,  B67D7/78 ,  B67D7/36 ,  B67D7/02

CPC classification number: G03F7/16 ,  B67D7/0294 ,  B67D7/36 ,  B67D7/78 ,  Y10T137/0318 ,  Y10T137/86187

Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.

Abstract translation: 光刻系统包括可变容积缓冲罐，连接到缓冲罐的分配系统以及被配置为从缓冲罐的顶部空间释放气体并阻止液体从顶部空间释放的阀。 储存容器在底部具有开口，并通过该开口排入缓冲罐。 缓冲罐具有足以容纳储存容器的完整内容物的存储容量。 该系统为分配系统提供化学溶液，同时保持化学溶液不与空气和其他气体接触。

公开(公告)号：US20150076371A1

公开(公告)日：2015-03-19

申请号：US14551302

申请日：2014-11-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： I-Hsiung Huang ,  Heng-Hsin Liu ,  Heng-Jen Lee ,  Chin-Hsiang Lin

IPC: H01L21/67 ,  H01J37/20 ,  H01J37/16 ,  H01J37/32 ,  H01J37/317

CPC classification number: H01L21/67225 ,  G03F7/16 ,  G03F7/30 ,  G03F7/70991 ,  H01J37/16 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/32899 ,  H01L21/67276 ,  H01L21/67745

Abstract: The present disclosure relates to a lithographic tool arrangement for semiconductor workpiece processing. The lithographic tool arrangement groups lithographic tools into clusters, and selectively transfers a semiconductor workpiece between a plurality of lithographic tools of a first type in a first cluster to a plurality of lithographic tools of a second type in a second cluster. The selective transfer is achieved though a transfer assembly, which is coupled to a defect scan tool that identifies defects generated in the lithographic tool of the first type. The disclosed lithographic tool arrangement also utilizes shared structural elements such as a housing assembly, and shared functional elements such as gases and chemicals. The lithographic tool arrangement may consist of baking, coating, exposure, and development units configured to provide a modularization of these various components in order to optimize throughput and efficiency for a given lithographic fabrication process.

Abstract translation: 本公开涉及一种用于半导体工件加工的平版印刷工具装置。 光刻工具装置将光刻工具组合成簇，并且将半导体工件在第一簇中的第一类型的多个光刻工具之间选择性地传输到第二簇中的第二类型的光刻工具。 通过转移组件实现选择性转移，转移组件耦合到识别第一类型的光刻工具中产生的缺陷的缺陷扫描工具。 所公开的平版印刷工具装置还利用共同的结构元件，例如壳体组件和诸如气体和化学品的共享功能元件。 光刻工具装置可以包括被配置成提供这些各种部件的模块化的烘烤，涂覆，曝光和显影单元，以便为给定的光刻制造工艺优化产量和效率。