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Patent Agency Ranking
1.发明授权公开(公告)号：US09817315B2
公开(公告)日：2017-11-14
申请号：US14208529
申请日：2014-03-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , Y10T137/0318 , Y10T137/86187
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
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2.发明授权公开(公告)号：US12025917B2
公开(公告)日：2024-07-02
申请号：US16716792
申请日：2019-12-17
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
IPC: G03F7/16 , B67D7/02 , B67D7/36 , B67D7/78 , H01L21/027
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , H01L21/0274 , Y10T137/0318 , Y10T137/86187
Abstract: A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
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3.发明申请公开(公告)号：US20180067395A1
公开(公告)日：2018-03-08
申请号：US15806663
申请日：2017-11-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , Y10T137/0318 , Y10T137/86187
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
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4.发明申请SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS 有权供应和分配无泡沫光刻胶化学溶液的系统和方法公开(公告)号：US20150261089A1
公开(公告)日：2015-09-17
申请号：US14208529
申请日：2014-03-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , Y10T137/0318 , Y10T137/86187
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
Abstract translation: 光刻系统包括可变容积缓冲罐，连接到缓冲罐的分配系统以及被配置为从缓冲罐的顶部空间释放气体并阻止液体从顶部空间释放的阀。 储存容器在底部具有开口，并通过该开口排入缓冲罐。 缓冲罐具有足以容纳储存容器的完整内容物的存储容量。 该系统为分配系统提供化学溶液，同时保持化学溶液不与空气和其他气体接触。
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5.发明授权公开(公告)号：US10558120B2
公开(公告)日：2020-02-11
申请号：US15806663
申请日：2017-11-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
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