Modelling and prediction of virtual inline quality control in the production of memory devices

    公开(公告)号:US12135542B2

    公开(公告)日:2024-11-05

    申请号:US17979142

    申请日:2022-11-02

    Abstract: To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.

    VIRTUAL QUALITY CONTROL INTERPOLATION AND PROCESS FEEDBACK IN THE PRODUCTION OF MEMORY DEVICES

    公开(公告)号:US20220413036A1

    公开(公告)日:2022-12-29

    申请号:US17360573

    申请日:2021-06-28

    Abstract: To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.

    MODELLING AND PREDICTION SYSTEM WITH AUTO MACHINE LEARNING  IN THE PRODUCTION OF MEMORY DEVICES

    公开(公告)号:US20230142936A1

    公开(公告)日:2023-05-11

    申请号:US18152669

    申请日:2023-01-10

    CPC classification number: G06T7/0002 G06N20/20

    Abstract: To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.

    MODELLING AND PREDICTION OF VIRTUAL INLINE QUALITY CONTROL IN THE PRODUCTION OF MEMORY DEVICES

    公开(公告)号:US20230054342A1

    公开(公告)日:2023-02-23

    申请号:US17979142

    申请日:2022-11-02

    Abstract: To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.

    VIRTUAL METROLOGY FOR FEATURE PROFILE PREDICTION IN THE PRODUCTION OF MEMORY DEVICES

    公开(公告)号:US20220415718A1

    公开(公告)日:2022-12-29

    申请号:US17725695

    申请日:2022-04-21

    Abstract: To provide more test data during the manufacture of non-volatile memories and other integrated circuits, machine learning is used to generate virtual test values. Virtual test results are interpolated for one set of tests for devices on which the test is not performed based on correlations with other sets of tests. In one example, machine learning determines a correlation study between bad block values determined at die sort and photo-limited yield (PLY) values determined inline during processing. The correlation can be applied to interpolate virtual inline PLY data for all of the memory dies, allowing for more rapid feedback on the processing parameters for manufacturing the memory dies and making the manufacturing process more efficient and accurate. In another set of embodiments, the machine learning is used to extrapolate limited metrology (e.g., critical dimension) test data to all of the memory die through interpolated virtual metrology data values.

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