公开(公告)号：US20230102791A1

公开(公告)日：2023-03-30

申请号：US17740494

申请日：2022-05-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sung Ho JANG ,  Min Hwan SEO ,  Jang Hwi LEE ,  Young Chul KWON ,  Sang Woo BAE ,  Akinori OKUBO ,  Jung Chul LEE ,  Won Don JOO

IPC: B23K26/53 ,  B23K26/38 ,  B23K26/03

Abstract: A method for dicing a substrate includes setting a target height for forming a first reforming region inside a target substrate, the target height being a distance from an upper surface of the target substrate to the first reforming region; irradiating a laser beam to a first sample substrate including a first film and a second film being in contact with the first film, and setting a target condition on the basis of a sample condition that results in forming a condensing point of the laser beam on an upper surface of the first film being in contact with the second film; and irradiating the target substrate with the laser beam according to the target condition to form the first reforming region inside the target substrate, wherein a thickness of the second film is the target height.

公开(公告)号：US20240234177A1

公开(公告)日：2024-07-11

申请号：US18495224

申请日：2023-10-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hun Yong PARK ,  Yeon Tae KIM ,  Jang Hwi LEE ,  Sang Woo BAE ,  Kyung Su KIM ,  Tae Soon PARK ,  Jung Chul LEE ,  Sung Ho JANG ,  Won Don JOO

IPC: H01L21/67 ,  C23C16/44 ,  C23C16/452 ,  H01L21/02

CPC classification number: H01L21/67115 ,  C23C16/4412 ,  C23C16/452 ,  H01L21/0228

Abstract: A wafer processing apparatus may include a chamber providing an internal space; and a first rib on an outer side of a first sidewall of the chamber. An outer side of the first rib may include a first portion and a second portion. A light transmittance of the first portion may be different from a light transmittance of the second portion.

公开(公告)号：US20130214180A1

公开(公告)日：2013-08-22

申请号：US13768762

申请日：2013-02-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Won Don JOO ,  Woo Seok KO ,  Yu Sin YANG ,  Sue Jin CHO ,  Sang Don JANG ,  Byeong Hwan JEON

IPC: F21V13/04 ,  F21V7/00

CPC classification number: F21V13/04 ,  F21V7/0025 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8845

Abstract: An optical system includes a first light source to radiate light in a first wavelength band, a reflector to reflect light from the first light source, a second light source to radiate light in a second wavelength band, and a reflector reflect the second light source. The fourth reflector is set at a first position to allow light from the first light source to each the condenser lens and set to a second position to allow light from the second light source to reach the condenser lens.

Abstract translation: 光学系统包括：第一光源，用于照射第一波长带中的光;反射器，用于反射来自第一光源的光;第二光源，用于辐射第二波长带中的光，反射器反射第二光源。 第四反射器被设置在第一位置以允许来自第一光源的光到每个聚光透镜并且被设置到第二位置，以允许来自第二光源的光到达聚光透镜。