Inspection apparatus for detecting defects in photomasks and dies

    公开(公告)号:US11354798B2

    公开(公告)日:2022-06-07

    申请号:US16886591

    申请日:2020-05-28

    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.

    Method and electronic device for setting alarm

    公开(公告)号:US10659593B2

    公开(公告)日:2020-05-19

    申请号:US15903454

    申请日:2018-02-23

    Abstract: An electronic device includes a housing, one or more input/output (I/O) interfaces included in or on the housing, a processor, and a memory, wherein the memory stores a plurality of templates associated with a plurality of tasks, wherein each of the templates includes a plurality of parameters for at least partially completing a respective one of the tasks, and wherein the memory further stores instructions that, when executed, cause the processor to: receive a user input to set up an alarm associated with a task to be performed at a selected time, wherein the input includes a first time parameter associated with the selected time; select one of the plurality of templates; determine a second time parameter of the plurality of parameters of the selected template; determine a time for the alarm; and provide the alarm at the determined time.

    Inspection apparatus for detecting defects in photomasks and dies

    公开(公告)号:US10726541B2

    公开(公告)日:2020-07-28

    申请号:US16013417

    申请日:2018-06-20

    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.

    INSPECTION APPARATUS FOR DETECTING DEFECTS IN PHOTOMASKS AND DIES

    公开(公告)号:US20190139209A1

    公开(公告)日:2019-05-09

    申请号:US16013417

    申请日:2018-06-20

    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.

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