Abstract:
There is provided a semiconductor light emitting device having a zinc oxide-based transparent conductive thin film in which a Group III element is doped to have waveforms having a plurality of periods in a thickness direction.
Abstract:
An apparatus with a neural network operation of homomorphic encrypted data includes: one or more processors configured to: generate homomorphic conjugation data of encrypted data based on the encrypted data, wherein the encrypted data corresponds to an output of each of a plurality of layers included in a neural network; and remove noise of the encrypted data based on the encrypted data and the homomorphic conjugation data.
Abstract:
An apparatus includes one or more processors configured to execute instructions; and one or more memories storing the instructions; wherein the execution of the instructions by the one or more processors configures the one or more processors to generate an approximate polynomial, approximating a neural network operation, of a portion of a deep neural network model that is configured to receive input data, by using weighted least squares based on parameters corresponding to the generation of the approximate polynomial, a mean of the input data, and a standard deviation of the input data; and generate a homomorphic encrypted data operation result based on the input data and the approximate polynomial that approximates the neural network operation.
Abstract:
A semiconductor package including a lower substrate, a lower semiconductor chip mounted on the lower substrate, a lower mold layer on the lower substrate and enclosing the lower semiconductor chip, a redistribution layer on the lower mold layer, and a vertical connection terminal around the lower semiconductor chip and connecting the lower substrate to the redistribution layer may be provided. The lower semiconductor chip may include a cognition mark at a top surface thereof. The cognition mark may include a marking pattern having an intaglio shape at the top surface of the lower semiconductor chip, and a molding pattern filling an inner space of the marking pattern. A first material constituting the molding pattern may be the same as a second material constituting the lower mold layer.
Abstract:
A chemical vapor deposition apparatus can include a reaction chamber having a reaction space therein; a wafer boat disposed in the reaction space, the wafer boat arranged and structured to support a plurality of wafers; and a gas supplying part disposed in the reaction chamber to supply two or more reaction gases to the plurality of wafers. The gas supplying part can include a plurality of gas pipes disposed in the reaction chamber to supply the two or more reaction gases from outside to the reaction space; and a plurality of supplying pipes disposed around the wafer boat, wherein each of the supplying pipes is connected to two or more corresponding gas pipes, and wherein each supplying pipe is configured to supply the two or more reaction gases supplied by the two or more corresponding gas pipes to a corresponding one of the wafers.