公开(公告)号：US20240309298A1

公开(公告)日：2024-09-19

申请号：US18413777

申请日：2024-01-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minhyung CHO ,  Minju IM ,  Hyojoong YOON ,  Mihyun PARK ,  Jinhye BAE ,  Taekyung LEE ,  Sangwon BAE

IPC: C11D3/20 ,  C11D3/30 ,  C11D3/39 ,  G03F7/42 ,  H01L21/02

CPC classification number: C11D3/201 ,  C11D3/2017 ,  C11D3/2068 ,  C11D3/30 ,  C11D3/3927 ,  G03F7/425 ,  H01L21/02071 ,  C11D2111/22

Abstract: A stripper composition may include a polar organic solvent, a pH-adjusting agent, and an ammonium salt or a diamine compound, and deionized water (DIW). In the diamine compound, a main chain between amines may have 4 or fewer carbon atoms.

公开(公告)号：US20250129288A1

公开(公告)日：2025-04-24

申请号：US18916329

申请日：2024-10-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol HAM ,  Byungjoon KANG ,  Giho KO ,  Sungmin KIM ,  Mihyun PARK ,  Insun PARK ,  Jinhye BAE ,  Kum Hee LEE ,  Minhyung CHO ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

Abstract: Provided are an etching composition, a method of etching a metal-containing film by using the same, and a method of manufacturing a semiconductor device by using the same. The etching composition may include an oxidizing agent, a buffer, and a selective etching inhibitor. The selective etching inhibitor may include a first compound represented by Formula 1 and a second compound different from the first compound. The second compound may include a ring. The ring may be a pyrazole group, an imidazole group, a triazole group, or a tetrazole group, or the ring may be a pyrazole group, an imidazole group, or a triazole group, each condensed with a benzene group, a pyridine group, a pyrimidine group, a pyrazine group, a pyridazine group, or any combination thereof. A description of Formula 1 is provided in the present specification.