-
公开(公告)号:US20180331046A1
公开(公告)日:2018-11-15
申请号:US16026937
申请日:2018-07-03
Applicant: Samsung Electronics Co., Ltd.
Inventor: Kiseok LEE , Sooho SHIN , Juik LEE , Jun Ho LEE , Kwangmin KIM , Ilyoung MOON , Jemin PARK , Bumseok SEO , Chan-Sic YOON , Hoin LEE
IPC: H01L23/544 , H01L27/108
CPC classification number: H01L23/544 , H01L27/10814 , H01L27/10823 , H01L27/10876 , H01L27/10885 , H01L27/10894 , H01L27/10897 , H01L2223/5442 , H01L2223/54426 , H01L2223/5446
Abstract: A semiconductor device includes an alignment key on a substrate. The alignment key includes a first sub-alignment key pattern with a first conductive pattern, a second conductive pattern, and a capping dielectric pattern that are sequentially stacked on the substrate, an alignment key trench that penetrates at least a portion of the first sub-alignment key pattern, and a lower conductive pattern in the alignment key trench. The alignment key trench includes an upper trench that is provided in the capping dielectric pattern that has a first width, and a lower trench that extends downward from the upper trench and that has a second width less than the first width. The lower conductive pattern includes sidewall conductive patterns that are separately disposed on opposite sidewalls of the lower trench.