公开(公告)号：US20240081592A1

公开(公告)日：2024-03-14

申请号：US18389347

申请日：2023-11-14

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seehyun KIM ,  Hyeoncheol KIM ,  Hyunju LEE ,  Kihwan KWON ,  Hyunho LEE ,  Seungryong CHA ,  Ingyu CHOI

IPC: A47L9/14 ,  A47L9/00 ,  A47L9/28

CPC classification number: A47L9/149 ,  A47L9/0063 ,  A47L9/1445 ,  A47L9/2873

Abstract: A cleaning apparatus includes a cleaner including a dust container in which contaminants are collected and a dust container cover rotatably coupled to the dust container to open or close the dust container, and a docking station on which the cleaner is detachably mounted, the docking station including a collecting portion to collect the contaminants in the dust container in response to the mounting and a duct portion forming a channel to guide the contaminants in the dust container to the collecting portion in response to the mounting; a cover opening device configured to open the dust container cover, and a cover closing device configured to close the dust container cover, the cover closing device including a rotary lever configured to be movable between a first position forming a portion of the channel of the duct portion and a second position supporting the dust container cover in a closing direction.

公开(公告)号：US20230255418A1

公开(公告)日：2023-08-17

申请号：US18137274

申请日：2023-04-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ingyu CHOI ,  Hyunju LEE ,  Seehyun KIM ,  Shin KIM ,  Sanghyuk PARK ,  Heesuk YOON ,  Seungryong CHA

IPC: A47L9/14 ,  A47L9/00 ,  A47L9/28

CPC classification number: A47L9/149 ,  A47L9/0063 ,  A47L9/1409 ,  A47L9/2842 ,  A47L9/2873 ,  A47L9/2894 ,  A47L9/281 ,  A47L2201/024 ,  A47L2201/022 ,  A47L2201/04

Abstract: A cleaning apparatus comprises: a robot cleaner including a dust collection canister and a first suction device; and a docking station including a second suction device, which communicates with the dust container to suck air including foreign substances from the dust container in response to the robot cleaner being coupled to the docking station, and a trapping portion to capture the foreign substances included in the sucked air. The robot cleaner includes: a communication unit; and a control unit to control the first suction device in response to the robot cleaner being coupled to the docking station, controlling the communication unit to transmit a control command to the docking station, and periodically changing the suction force of either the first suction device and the second suction device.

公开(公告)号：US20230146588A1

公开(公告)日：2023-05-11

申请号：US18089993

申请日：2022-12-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seehyun KIM ,  Hyeoncheol KIM ,  Kihwan KWON ,  Junggyun HAN ,  Hyunju LEE ,  Seungryong CHA ,  Ingyu CHOI

IPC: A47L9/16 ,  A47L9/28 ,  A47L5/26 ,  A47L9/14

CPC classification number: A47L9/1683 ,  A47L9/2873 ,  A47L5/26 ,  A47L9/1418

Abstract: A cleaning apparatus may include a vacuum cleaner with a dust collecting chamber; and a dust collecting station that is connectable to the vacuum cleaner through a seating portion with an opening in the front of the dust collecting station so. A controller is configured to, when the dust collecting chamber is seated on the seating portion, control a driving device to open the dust collecting chamber so that the opening of the seating portion communicates with the dust collecting chamber opening, and control a suction device to suction foreign substances in the dust collecting chamber through the dust collecting chamber opening, and the opening of the seating portion, and into a dust bag in the dust collecting station. A panel at the front of the dust collecting station may be opened to provide an opening at the front of the dust collecting station through which the dust bag is withdrawable.

公开(公告)号：US20230284854A1

公开(公告)日：2023-09-14

申请号：US18199421

申请日：2023-05-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ingyu CHOI ,  Hyunju LEE ,  Seehyun KIM ,  Bosang KIM ,  Woojin NA ,  Seungryong CHA

IPC: A47L9/28

CPC classification number: A47L9/2873 ,  A47L2201/022 ,  A47L2201/024

Abstract: A robot cleaner station includes a cleaner seating portion including a suction port, a collection device including a collection chamber, and a station suction device configured to generate a suction force such that dirt from the dust collection device is suctioned into the collection chamber, and a connection part having one end connectable to the suction port and another end connectable to the collection chamber. The connection part comprises: a guide unit horizontally extending in the cleaner seating portion, a vortex region, inside the guide unit between one side of the guide unit where the guide unit starts to horizontally extend and the suction port, and where a vortex causing settlement of the dirt is formed, and a ventilation hole configured to allow a flow of external air from the one side of the guide unit at which the guide unit starts to horizontally extend to the vortex region.

公开(公告)号：US20230355060A1

公开(公告)日：2023-11-09

申请号：US18350428

申请日：2023-07-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ingyu CHOI ,  Seungryong CHA ,  Seehyun KIM ,  Hyeoncheol KIM ,  Hyunju LEE ,  Hyunho LEE

IPC: A47L9/16

CPC classification number: A47L9/1683 ,  A47L9/1608

Abstract: A multi-cyclone dust collector and a vacuum cleaner having the same are provided. The multi-cyclone dust collector includes a primary cyclone separator provided to separate waste primarily from introduced waste-containing air, and a secondary cyclone separator installed inside the primary cyclone separator to separate dust from air discharged from the primary cyclone separator. The secondary cyclone separator includes a secondary cyclone provided with two inlet holes through which air is introduced and an outlet hole through which the introduced air is discharged, and an upper cover provided to cover an upper end of the secondary cyclone and including an outlet pipe inserted into the outlet hole to discharge the air. The upper cover further includes a plurality of flow guides disposed between adjacent inlet holes to minimize airflow interference between the adjacent inlet holes and provided on an outer surface of the outlet pipe to correspond to the at least two inlet holes.

公开(公告)号：US20230117115A1

公开(公告)日：2023-04-20

申请号：US17865913

申请日：2022-07-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ingyu CHOI ,  Seehyun KIM ,  Hyunho LEE ,  Hyeoncheol KIM ,  Hyunju LEE ,  Seungryong CHA

IPC: A47L9/14 ,  A47L5/28 ,  A47L9/24 ,  A47L9/00

Abstract: A cleaning device including a cleaner and a station on which the cleaner is mounted is provided. The cleaner includes a suction head, a dust container to collect dust contained in air vacuumed through the suction head, and an extension tube connecting the suction head with the dust container. The station includes a main body configured to suck dust of the dust container of the cleaner and contain the dust, a support configured to support the main body and guide rotation of the main body, and a rotation driving device disposed in the support and configured to transmit a rotational force to the support.

公开(公告)号：US20230346183A1

公开(公告)日：2023-11-02

申请号：US18340315

申请日：2023-06-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ingyu CHOI ,  Hyunju LEE ,  Seehyun KIM ,  Seungryong CHA

IPC: A47L9/14 ,  A47L9/28

CPC classification number: A47L9/149 ,  A47L9/2873 ,  A47L9/1409

Abstract: A docking station, which includes a cover opening and closing device for automatically opening and closing a dust container cover, and a cleaning device is provided. The cleaning device includes a cleaner which includes a dust container for collecting foreign substances, a dust container cover rotatably coupled to the dust container so as to open and close the dust container, and a button provided to open the dust container, a docking station to which the cleaner is coupled, and which charges the cleaner coupled thereto, and a cover opening and closing device which opens the dust container cover by pressing the button and closes the dust container cover by pressing the dust container cover.

公开(公告)号：US20230138243A1

公开(公告)日：2023-05-04

申请号：US18064469

申请日：2022-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyeoncheol KIM ,  Seehyun KIM ,  Kihwan KWON ,  Hyunju LEE ,  Hyunho LEE ,  Wonkyu LIM ,  Seungryong CHA ,  Ingyu CHOI

IPC: B08B1/02 ,  A47L11/283 ,  A47L11/40 ,  B08B3/04 ,  B08B1/00

Abstract: A cleaning device for cleaning a mop of a mop-vacuum, and a cleaning system including same are provided. The cleaning system includes the mop, the mop-vacuum on which the mop is separably provided, and the mop cleaning device for cleaning the mop, wherein the mop cleaning device includes a main body having an opening, a cover for opening/closing the opening of the main body, a mop accommodation part provided in the opening of the main body to accommodate the mop, a water supply part provided in the main body to supply water to the mop accommodation part, a water discharge part provided in the main body to drain the water of the mop accommodation part, and a driving device which is provided at the cover, and which rotates the mop accommodated in the mop accommodation part.

公开(公告)号：US20170140937A1

公开(公告)日：2017-05-18

申请号：US14940184

申请日：2015-11-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dougyong SUNG ,  Sejin OH ,  Je-Hun WOO ,  Hyunju LEE ,  Seungkyu LIM ,  Kiho HWANG

IPC: H01L21/263 ,  H01L21/66 ,  H01L21/683

CPC classification number: H01L21/2633 ,  H01J37/32935 ,  H01L21/31116 ,  H01L21/6831 ,  H01L22/26

Abstract: Provided are a semiconductor device fabricating apparatus configured to perform an atomic layer etching process and a method of fabricating a semiconductor device including performing the atomic layer etching process. The method includes loading a wafer onto an electrostatic chuck in a chamber, performing a first periodical process in which a first gas is supplied to an inside of the chamber and the first gas is adsorbed onto the wafer, performing a second periodical process in which a second gas is supplied to the inside of the chamber and the first gas remaining in the chamber is exhausted to an outside of the chamber, performing a third periodical process in which a third gas is supplied to the inside of the chamber, plasma including the third gas is generated, the plasma collides with the wafer, and the first gas adsorbed onto the wafer is removed, and unloading the wafer to the outside of the chamber.

公开(公告)号：US20230180983A1

公开(公告)日：2023-06-15

申请号：US17981788

申请日：2022-11-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ingyu CHOI ,  Hyunju LEE ,  Seehyun KIM ,  Seungryong CHA ,  Junggyun HAN

IPC: A47L9/14 ,  A47L9/00

CPC classification number: A47L9/149 ,  A47L9/0063

Abstract: A dust collection device which includes a support plate comprising a protrusion rib formed to extend from one surface, and an opening; and an opening/closing cover configured to open or close the opening of the support plate while one side of the opening/closing cover is fixed to the support plate, the opening/closing cover being configured to be spaced apart from the protrusion rib to open the opening and to be in close contact with the protrusion rib to close the opening. The protrusion rib extends more at a first point that is further from the one side of the opening/closing cover fixed to the support plate than a second point closer to the one side of the opening/closing cover.