公开(公告)号：US10740604B2

公开(公告)日：2020-08-11

申请号：US15838869

申请日：2017-12-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Juwoan Yoo ,  Kwanghyun Lee ,  Heejun Lee ,  Alexei Fartukov ,  Gleb Odinokikh ,  Vitalii Gnatiuk ,  Vladimir Eremeev ,  Dae-Kyu Shin ,  Jeong-Min Park ,  Ji-Yoon Park

IPC: G06K9/00 ,  G06K9/68

Abstract: An electronic device for iris recognition and an operating method thereof are provided. The electronic device includes a housing including a first surface, a display exposed through a first region of the first surface, a light emitting unit comprising light emitting circuitry disposed in a second region of the first surface, an image device comprising image acquiring circuitry disposed in a third region of the first surface, at least one processor disposed within the housing and electrically connected with the display, the light emitting unit and the image device, and a memory disposed within the housing and electrically connected with the at least one processor. The memory stores instructions that, when executed by the processor, cause the electronic device to store a reference template based on a first iris image which has been recognized using the light emitting unit and the image device, to authenticate a second iris image which has been recognized using the light emitting unit and the image device, using the stored reference template, and to store a template of the second iris image succeeded in authentication, as an additional template.

公开(公告)号：US20240280891A1

公开(公告)日：2024-08-22

申请号：US18111785

申请日：2023-02-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Heejun Lee ,  Wooyong Cho ,  Bayram Yenikaya ,  Joobyoung Kim ,  Useong Kim

IPC: G03F1/36 ,  G03F1/84

CPC classification number: G03F1/36 ,  G03F1/84

Abstract: Provided are an optical proximity correction (OPC) method capable of addressing the limitations of patterning and improving the reliability of patterning, and a mask manufacturing method using the OPC method. In the OPC method, a rectangular mask layout for a target pattern is created, the edge of the rectangular mask layout is dissected into segments, a first shape variable point is created, and a second shape variable point is created by shifting the first shape variable point on a rounded target pattern. Thereafter, a curvilinear mask layout is created based on the second shape variable point, a contour is extracted based on the curvilinear mask layout, an edge placement error (EPE) is determined, and the operations are repeated according to a predetermined criterion, thereby realizing a mask layout with minimal EPEs.

公开(公告)号：US12158932B2

公开(公告)日：2024-12-03

申请号：US17288256

申请日：2019-08-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Gleb Andreevich Odinokikh ,  Ivan Andreevich Solomatin ,  Aleksei Mikhailovich Fartukov ,  Iurii Sergeevich Efimov ,  Vitaly Sergeevich Gnatyuk ,  Vladimir Alekseevich Eremeev ,  Juwoan Yoo ,  Kwanghyun Lee ,  Heejun Lee

IPC: G06F21/32 ,  G06F21/45 ,  G06N3/04 ,  G06N3/045

Abstract: According to an embodiment of the disclosure, there is provided a biometrics-based user authentication method including: obtaining a user's biometric image, obtaining a shallow biometric feature from the user's biometric image by using a first neutral network of a learning network model, obtaining a deep biometric feature from the user's biometric image by using a second neutral network of the learning network model, determining a similarity between the shallow and deep biometric features and a valid user's biometric features stored in advance, and determining whether the user matches the valid user, based on the determined similarity.

公开(公告)号：US12013923B2

公开(公告)日：2024-06-18

申请号：US17167376

申请日：2021-02-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Heejun Lee ,  Tushar Balasaheb Sandhan ,  Hyeongwook Yang ,  Juwoan Yoo ,  Wonsuk Jang ,  Dasom Lee

IPC: H04N25/58 ,  G06F21/32 ,  G06V10/44 ,  G06V10/50 ,  G06V40/16 ,  G06V40/40 ,  H04N25/46 ,  H04N25/705

CPC classification number: G06F21/32 ,  G06V10/44 ,  G06V10/50 ,  G06V40/161 ,  G06V40/40 ,  G06V40/45 ,  H04N25/46 ,  H04N25/58 ,  H04N25/705

Abstract: An electronic device is provided. The electronic device includes a camera including an image sensor including a plurality of pixels, a memory, and a processor that controls the camera. Each pixel included in the plurality of pixels includes a plurality of photodiodes and a microlens covering the plurality of photodiodes. The processor obtains phase images and image data for an external object using the plurality of photodiodes of the image sensor and authenticates the external object using the phase images and the image data. In addition, various embodiments recognized through the specification are possible.

公开(公告)号：US11449590B2

公开(公告)日：2022-09-20

申请号：US16765298

申请日：2018-11-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Gleb Andreevich Odinokikh ,  Aleksei Mikhailovich Fartukov ,  Vitaly Sergeevich Gnatyuk ,  Vladimir Alekseevich Eremeev ,  Juwoan Yoo ,  Kwanghyun Lee ,  Heejun Lee ,  Daekyu Shin

IPC: G06F21/00 ,  G06F21/32 ,  G06F21/45 ,  G06K9/62 ,  G06V40/19 ,  G06V40/18

Abstract: Provided are a user authentication device and method based on iris recognition. The user authentication method includes: acquiring an image of a user's left and right eyes; extracting a pupil image and an iris image from the image; obtaining a first iris feature by analyzing the iris image; obtaining a second iris feature by analyzing the iris image and the pupil image; obtaining a similarity score based on the first iris feature, the second iris feature, and prestored reference iris data; and determining whether to approve user authentication based on the similarity score.

公开(公告)号：US12282249B2

公开(公告)日：2025-04-22

申请号：US17859288

申请日：2022-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kisung Kim ,  Donggon Woo ,  Heejun Lee ,  Dongho Kim

IPC: G03F1/36 ,  G03F1/70 ,  G03F7/00

Abstract: A full-chip cell critical dimension (CD) correction method and a method of manufacturing a mask by using the same are provided. The full-chip cell CD correction method includes receiving a database (DB) about a full-shot; analyzing a hierarchy of the DB; generating a density map of a full-chip by using the DB and converting the density map into a retarget rule table, the converting including mapping the density map by using a density rule; reconfiguring cell blocks of the full-chip into an optical proximity correction (OPC) target cell layout for OPC; applying a first bias to the OPC target cell layout, based on the retarget rule table; and generating an optical proximity corrected (OPC'ed) layout for the full-chip by performing hierarchical OPC.

公开(公告)号：US11983965B2

公开(公告)日：2024-05-14

申请号：US17520400

申请日：2021-11-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Wonsuk Jang ,  Juwoan Yoo ,  Heejun Lee

IPC: G06V40/50 ,  G06F16/22 ,  G06F18/22 ,  G06F21/32 ,  G06V10/75 ,  G06V10/98 ,  G06V40/12 ,  G06V40/14 ,  G06V40/16 ,  G06V40/18

CPC classification number: G06V40/50 ,  G06F16/22 ,  G06F18/22 ,  G06F21/32 ,  G06V10/751 ,  G06V10/993 ,  G06V40/1365 ,  G06V40/14 ,  G06V40/172 ,  G06V40/197

Abstract: An electronic device includes at least one processor connected with a biometric sensor and memory, and configured to perform biometric authentication using a first matching algorithm and a first template DB, install a second matching algorithm and a second template DB and set the second template DB to an inactive state, determine whether a predetermined template registration condition is met when biometric authentication using the first matching algorithm and the first template DB is successful, generate a template including input biometric information of the successful biometric authentication and register the template in the second template DB in the inactive state in case that the template registration condition is met, set the second template DB to an active state in case that the second template DB meets a predetermined template activation condition, and perform the biometric authentication using the second matching algorithm and the second template DB in the active state.

公开(公告)号：US20230176470A1

公开(公告)日：2023-06-08

申请号：US17860139

申请日：2022-07-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Wooyong Cho ,  Useong Kim ,  Heejun Lee

IPC: G03F1/36 ,  G06F30/398 ,  G03F7/20

CPC classification number: G03F1/36 ,  G06F30/398 ,  G03F7/70441

Abstract: Disclosed is a method of generating a curvilinear sub-resolution assist feature (SRAF) capable of easily generating a curvilinear SRAF satisfying mask rule check (MRC) conditions, an MRC verification method for easy MRC verification of the curvilinear SRAF, and a mask manufacturing method including the method of generating the same. The method of generating a curvilinear SRAF includes generating a curve axis for generating the curvilinear SRAF corresponding to a main feature, generating curve points on a line of the curve axis, and generating the curvilinear SRAF based on the curve points.

公开(公告)号：US11645373B2

公开(公告)日：2023-05-09

申请号：US17130098

申请日：2020-12-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Juwoan Yoo ,  Wonsuk Jang ,  Heejun Lee

IPC: G06F21/32 ,  G06V40/16

CPC classification number: G06F21/32 ,  G06V40/168 ,  G06V40/172

Abstract: Certain embodiments provide a biometric recognition apparatus and a method for lowering false recognition rate of biometric information in an electronic device adopting biometric recognition technology. In doing so, the electronic device may store first feature values extracted at M-ary feature points from owner biometric information, and additionally store auxiliary biometric information from a biometric information stored in one or more memories or an external server. The electronic device may perform biometric recognition on input biometric information using the first feature values and second feature values extracted from the biometric information additionally stored.