公开(公告)号：US12140734B2

公开(公告)日：2024-11-12

申请号：US16789675

申请日：2020-02-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeongyub Lee ,  Changseung Lee ,  Kideok Bae ,  Eunhyoung Cho

IPC: G02B1/00 ,  C01G15/00 ,  C01G28/00 ,  G02B1/14 ,  G02B5/18 ,  G02B5/20 ,  G02B27/10 ,  B82Y20/00

Abstract: An optical thin film includes a support layer and a dielectric layer on the support layer. The dielectric layer has a refractive index greater than that of the support layer. The dielectric layer includes a compound ADX, which includes a Group 3 element A, a Group 5 element D, and an element X having an atomic weight smaller than an atomic weight of A or D. The optical thin film may exhibit light transmission having a high refractive index and low absorptivity.

公开(公告)号：US10124438B2

公开(公告)日：2018-11-13

申请号：US15065488

申请日：2016-03-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeongyub Lee ,  Yunsung Woo ,  Changseung Lee ,  Eunhyoung Cho

IPC: H05K3/02 ,  B23K26/0622 ,  B23K26/384 ,  H05K3/18 ,  B23K26/08 ,  H01L31/18 ,  H05K3/00 ,  B23K26/386 ,  B23K26/082 ,  H05K3/14

Abstract: A method of patterning holes includes placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof, generating a pulse laser from the laser system, and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.

公开(公告)号：US10678359B2

公开(公告)日：2020-06-09

申请号：US16134471

申请日：2018-09-18

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eunhyoung Cho ,  Bonwon Koo ,  Hyunjoon Kim ,  Haesung Kim ,  Jungyun Won

IPC: G06F3/041 ,  H01L27/32 ,  G06K9/00 ,  G06F3/044

Abstract: Provided are a pattern structure for preventing a moiré pattern from becoming visible, and a display apparatus using the same. The pattern structure includes a first element pattern including a plurality of first elements arranged regularly at a first pitch; a second element pattern including a plurality of second elements arranged regularly at a second pitch, the second element pattern being provided on the first element pattern; and a filling layer configured to fill gaps among the plurality of second elements, between adjacent ones thereof. A difference between transmittances of the second element and the filling layer is about 5% or less and thus, a moiré pattern occurring due to the overlapping of the first element pattern and the second element pattern may be prevented from becoming visible.

公开(公告)号：US10438715B2

公开(公告)日：2019-10-08

申请号：US14808360

申请日：2015-07-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunhyoung Cho ,  Inyong Song ,  Changseung Lee ,  Chan Kwak ,  Jaekwan Kim ,  Jooho Lee ,  Jinyoung Hwang

IPC: H01B1/22 ,  B82Y10/00 ,  B82Y40/00 ,  C23F1/14 ,  C23F1/30 ,  G06F3/041 ,  H01L29/41 ,  G06F3/044 ,  H01L31/0224 ,  C23F1/02 ,  C23F1/40 ,  H01L29/06 ,  H01L33/42

Abstract: Example embodiments relate to a nanostructure including a conductive region and a nonconductive region, wherein the conductive region includes at least one first nanowire, and the nonconductive region includes at least one second nanowire that is at least partially sectioned, a method of preparing the nanostructure, and a panel unit including the nanostructure.