公开(公告)号：US20210043661A1

公开(公告)日：2021-02-11

申请号：US16927327

申请日：2020-07-13

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  H01L21/3105 ,  C09G1/02 ,  C09K3/14

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20250015098A1

公开(公告)日：2025-01-09

申请号：US18890313

申请日：2024-09-19

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  C09G1/02 ,  C09K3/14 ,  H01L21/3105

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20220219284A1

公开(公告)日：2022-07-14

申请号：US17711239

申请日：2022-04-01

Applicant: Samsung Display Co., Ltd. ,  KCTECH CO.,LTD.

Inventor： Junggun NAM ,  Seungik KANG ,  Seungbae KANG ,  Pungseok KIM ,  Heesung YANG ,  Keunwoo LEE ,  Woojin CHO ,  Byoungkwon CHOO

IPC: B24B37/07 ,  B32B38/00

Abstract: An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

公开(公告)号：US20210229236A1

公开(公告)日：2021-07-29

申请号：US17158657

申请日：2021-01-26

Applicant: Samsung Display Co., Ltd. ,  KCTECH CO.,LTD.

Inventor： Junggun NAM ,  Seungik KANG ,  Seungbae KANG ,  Pungseok KIM ,  Heesung YANG ,  Keunwoo LEE ,  Woojin CHO ,  Byoungkwon CHOO

IPC: B24B37/07 ,  B32B38/00

Abstract: An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

公开(公告)号：US20190389027A1

公开(公告)日：2019-12-26

申请号：US16411141

申请日：2019-05-14

Applicant: Samsung Display Co., Ltd.

Inventor： Seungbae KANG ,  Joon-hwa BAE ,  Heesung YANG ,  Woojin CHO ,  Kyongkwon CHOO

IPC: B24B29/02 ,  B24B41/047

Abstract: A substrate polishing apparatus including a stage configured to load a substrate, the stage having a flat surface, which is parallel to a first direction and a second direction, and on which the substrate is loaded, a pressing unit configured to exert a pressure on the substrate in a third direction, a rotary unit configured to revolve the pressing unit around a central axis parallel to the third direction, when viewed in a plan view, a plurality of polishing pads provided between the pressing unit and the substrate to be in contact with the substrate, and a nozzle part configured to supply a slurry onto the substrate. The polishing pads may be spaced apart from each other in a direction and may have a rectangular shape in the plan view.