公开(公告)号：US20220219284A1

公开(公告)日：2022-07-14

申请号：US17711239

申请日：2022-04-01

Applicant: Samsung Display Co., Ltd. ,  KCTECH CO.,LTD.

Inventor： Junggun NAM ,  Seungik KANG ,  Seungbae KANG ,  Pungseok KIM ,  Heesung YANG ,  Keunwoo LEE ,  Woojin CHO ,  Byoungkwon CHOO

IPC: B24B37/07 ,  B32B38/00

Abstract: An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

公开(公告)号：US20210229236A1

公开(公告)日：2021-07-29

申请号：US17158657

申请日：2021-01-26

Applicant: Samsung Display Co., Ltd. ,  KCTECH CO.,LTD.

Inventor： Junggun NAM ,  Seungik KANG ,  Seungbae KANG ,  Pungseok KIM ,  Heesung YANG ,  Keunwoo LEE ,  Woojin CHO ,  Byoungkwon CHOO

IPC: B24B37/07 ,  B32B38/00

Abstract: An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

公开(公告)号：US20160318149A1

公开(公告)日：2016-11-03

申请号：US15138630

申请日：2016-04-26

Applicant: Samsung Display Co., Ltd.

Inventor： Joowoan CHO ,  Hyunjin CHO ,  Byoungkwon CHOO ,  Oleg PRUDNIKOV ,  Jeongkyun NA ,  Sanghoon AHN ,  Seunghwan LEE ,  Byoungho CHEONG

IPC: B24B37/20

CPC classification number: B24B37/20 ,  B24B27/0015 ,  B24B27/0076 ,  B24B37/10

Abstract: A substrate polishing apparatus includes a support part on which at least one substrate is disposed, a plurality of first moving parts disposed at both opposite sides of the support part in a second direction crossing a first direction, and configured to upwardly extend and reciprocate in the first direction, a second moving part disposed between the plurality of first moving parts in the second direction and connected to an upper side of the first moving parts, a plurality of polishing units disposed at a lower portion of the second moving part and configured to contact an upper surface of the substrate, and a plurality of nozzles disposed at the lower portion of the second moving part and configured to spray slurry to the substrate where the polishing units rotate and revolve along a predetermined trajectory.

Abstract translation: 衬底抛光装置包括：至少一个衬底设置在该支撑部分上的多个第一移动部件，沿与第一方向交叉的第二方向设置在支撑部件的相对侧的多个第一移动部件，并且构造成向上延伸和往复运动 第一方向，第二移动部分，设置在第二方向上的多个第一移动部分之间并连接到第一移动部分的上侧;多个抛光单元，设置在第二移动部分的下部并且被配置为接触 基板的上表面和设置在第二移动部分的下部的多个喷嘴，并且被配置为将抛光单元沿预定轨迹旋转和旋转的浆料喷射到基板。

公开(公告)号：US20190292406A1

公开(公告)日：2019-09-26

申请号：US16247730

申请日：2019-01-15

Applicant: SAMSUNG DISPLAY CO., LTD. ,  UB MATERIALS INC.

Inventor： Hyunjin CHO ,  Joonhwa BAE ,  Byoungkwon CHOO ,  Woojin CHO ,  Jinhyung PARK

IPC: C09G1/02 ,  H01L21/3105

Abstract: A polishing slurry includes an abrasive material, a first oxide polishing promoter, a first nitride polishing inhibitor, and a second nitride polishing inhibitor. The first oxide polishing promoter includes a polymer-based oxide polishing promoter. The first nitride polishing inhibitor includes an anionic nitride polishing inhibitor. The second nitride polishing inhibitor includes at least one selected from a cationic nitride polishing inhibitor and a non-ionic nitride polishing inhibitor.