公开(公告)号：US20230371311A1

公开(公告)日：2023-11-16

申请号：US18355732

申请日：2023-07-20

Applicant: Samsung Display Co., Ltd.

Inventor： Jongjun BAEK ,  Jaewoo JEONG ,  Byungsoo SO

IPC: H10K59/121 ,  H01L29/16 ,  H01L29/04 ,  H01L29/786 ,  H10K50/12 ,  H10K50/165 ,  H10K59/123 ,  H10K71/00

CPC classification number: H10K59/1213 ,  H01L29/1604 ,  H01L29/045 ,  H01L29/78675 ,  H10K50/12 ,  H10K50/165 ,  H10K59/123 ,  H10K71/00

Abstract: A display apparatus includes a substrate, a first thin film transistor on the substrate, the first thin film transistor including an active layer including a source region, a drain region, and a channel region between the source region and the drain region, and a display device on the substrate and electrically connected to the first thin film transistor. The source region, the drain region, and the channel region include a first dopant and a second dopant, the second dopant being different from the first dopant. A concentration of the first dopant in the channel region is less than a concentration of the first dopant in the source region and the drain region.

公开(公告)号：US20210320268A1

公开(公告)日：2021-10-14

申请号：US17077648

申请日：2020-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Minkyung KANG ,  Byungsoo SO ,  Jaewoo JEONG ,  Jongjun BAEK ,  Hiroshi OKUMURA

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56

Abstract: A method of manufacturing a display apparatus includes forming a first substrate on a support substrate; forming a first barrier layer on the first substrate; and forming a conductive layer by implanting n-type impurities or p-type impurities in the first barrier layer and at least a portion of the first substrate. A display apparatus includes a conductive layer arranged on a substrate and a barrier layer arranged on the conductive layer. The conductive layer is doped with n-type impurities when the first barrier layer is doped with n-type impurities, and the conductive layer is doped with p-type impurities when the first barrier layer is doped with p-type impurities.

公开(公告)号：US20210033853A1

公开(公告)日：2021-02-04

申请号：US16802011

申请日：2020-02-26

Applicant: Samsung Display Co., Ltd.

Inventor： Jihwan KIM ,  Jongjun BAEK ,  Byungsoo SO ,  Hiroshi OKUMURA

IPC: G02B26/12 ,  G02F1/07 ,  H01L21/67 ,  H01L21/02 ,  B23K26/064 ,  B23K26/082 ,  B23K26/354

Abstract: Provided are a laser annealing apparatus and a method of manufacturing a substrate having a poly-Si layer using the laser annealing apparatus. The laser annealing apparatus includes a laser beam source that emits a linearly polarized laser beam, a polygon mirror that rotates around a rotation axis and reflects the laser beam emitted from the laser beam source, a first Kerr cell disposed on a laser beam path between the laser beam source and the polygon mirror, and a first optical element that directs the laser beam reflected by the polygon mirror toward an amorphous Si layer where the laser beam is irradiated upon the amorphous Si layer.

公开(公告)号：US20200185222A1

公开(公告)日：2020-06-11

申请号：US16592087

申请日：2019-10-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hiroshi OKUMURA ,  Jongjun BAEK ,  Dong-Sung LEE

IPC: H01L21/02 ,  H01L21/67

Abstract: A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.

公开(公告)号：US20200168743A1

公开(公告)日：2020-05-28

申请号：US16594284

申请日：2019-10-07

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Tae Hoon YANG ,  Kibum KIM ,  Jongjun BAEK ,  Byung Soo SO ,  Jong chan LEE ,  Woong Hee JEONG ,  Jaewoo JEONG

IPC: H01L29/786 ,  H01L27/12

Abstract: A display apparatus includes a base substrate, an active pattern on the base substrate including a source region, a drain region, and a channel region that is doped between the source region and the drain region, the channel region including polycrystalline silicon, and a gate electrode overlapping the channel region of the active pattern. The channel region may include a lower portion, an upper portion, and an intermediate portion between the upper portion and the lower portion, and a dopant density of the lower portion may be 80% or more of a dopant density of the upper portion.

公开(公告)号：US20220115233A1

公开(公告)日：2022-04-14

申请号：US17559415

申请日：2021-12-22

Applicant: Samsung Display Co., Ltd.

Inventor： Hiroshi OKUMURA ,  Jongjun BAEK ,  Dong-Sung LEE

IPC: H01L21/02 ,  H01L21/67

Abstract: A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.

公开(公告)号：US20200335560A1

公开(公告)日：2020-10-22

申请号：US16843368

申请日：2020-04-08

Applicant: Samsung Display Co., Ltd.

Inventor： Jongjun BAEK ,  Jaewoo JEONG ,  Byungsoo SO

IPC: H01L27/32 ,  H01L29/66

Abstract: A display panel includes: a base substrate; a circuit layer on the base substrate; and a display element layer on the circuit layer, wherein the circuit layer includes an active layer on the base substrate and containing boron and fluorine; a control electrode on the active layer; and a control electrode insulation layer between the active layer and the control electrode, wherein the active layer includes: a core layer in which a concentration of the boron is greater than a concentration of the fluorine; and a surface layer on the core layer and in which a concentration of the fluorine is greater than a concentration of the boron.

公开(公告)号：US20220384538A1

公开(公告)日：2022-12-01

申请号：US17819616

申请日：2022-08-12

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jongjun BAEK ,  Jaewoo JEONG ,  Byungsoo SO

IPC: H01L27/32 ,  H01L29/66

Abstract: A display panel includes: a base substrate; a circuit layer on the base substrate; and a display element layer on the circuit layer, wherein the circuit layer includes an active layer on the base substrate and containing boron and fluorine; a control electrode on the active layer; and a control electrode insulation layer between the active layer and the control electrode, wherein the active layer includes: a core layer in which a concentration of the boron is greater than a concentration of the fluorine; and a surface layer on the core layer and in which a concentration of the fluorine is greater than a concentration of the boron.

公开(公告)号：US20210265440A1

公开(公告)日：2021-08-26

申请号：US17317304

申请日：2021-05-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jongjun BAEK ,  Jaewoo JEONG ,  Byungsoo SO

IPC: H01L27/32 ,  H01L51/50 ,  H01L29/16 ,  H01L29/04 ,  H01L29/786 ,  H01L51/56

Abstract: A display apparatus includes a substrate, a first thin film transistor on the substrate, the first thin film transistor including an active layer including a source region, a drain region, and a channel region between the source region and the drain region, and a display device on the substrate and electrically connected to the first thin film transistor. The source region, the drain region, and the channel region include a first dopant and a second dopant, the second dopant being different from the first dopant. A concentration of the first dopant in the channel region is less than a concentration of the first dopant in the source region and the drain region.