公开(公告)号：US20170218508A1

公开(公告)日：2017-08-03

申请号：US15492941

申请日：2017-04-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo HUH ,  Suk-Won JUNG ,  Jeong-Ho YI ,  Sang-Hyuk HONG ,  Yong-Suk LEE

IPC: C23C16/04 ,  H01L51/00 ,  C23C16/52 ,  C23C16/50 ,  C23C16/44 ,  H01L51/56 ,  C23C16/458

CPC classification number: C23C16/042 ,  C23C16/4405 ,  C23C16/4585 ,  C23C16/50 ,  C23C16/52 ,  H01L21/681 ,  H01L21/682 ,  H01L21/68735 ,  H01L21/68742 ,  H01L27/3244 ,  H01L51/0012 ,  H01L51/56

Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.

公开(公告)号：US20160376698A1

公开(公告)日：2016-12-29

申请号：US15261629

申请日：2016-09-09

Applicant: Samsung Display Co., Ltd.

Inventor： Yong-Suk LEE ,  Myung-Soo HUH ,  Suk-Won JUNG ,  Jeong-Ho YI ,  Mi-Ra AN

IPC: C23C14/54

CPC classification number: C23C14/543 ,  B05D1/60 ,  C23C14/12 ,  C23C14/246 ,  C23C14/544 ,  C23C16/4481

Abstract: A monomer vaporizing device and a method of controlling the same are disclosed. The monomer vaporizing device includes: a first vaporizer and a second vaporizer that receive a purge gas and vaporize a first monomer and a second monomer, respectively; a first flow pipe and a second flow pipe that are connected to the respective vaporizers and allow the first monomer and the second monomer, vaporized by the respective vaporizers, to flow therethrough; a transition tube that is connected to the first flow pipe and the second flow pipe and supplies at least one of the first monomer and the second monomer to a deposition chamber; and a control valve apparatus that regulates monomer flow into the deposition chamber. The device facilitates smooth and uninterrupted application of monomer to the interior of a deposition chamber.

Abstract translation: 公开了一种单体蒸发装置及其控制方法。 单体蒸发装置包括：第一蒸发器和第二蒸发器，其分别接收吹扫气体并蒸发第一单体和第二单体; 第一流管和第二流管，其连接到相应的蒸发器并允许由各蒸发器蒸发的第一单体和第二单体流过其中; 过渡管，其连接到所述第一流管和所述第二流管，并且将至少一个所述第一单体和所述第二单体供应到沉积室; 以及调节单体流入沉积室的控制阀装置。 该装置有助于将单体平滑且不间断地应用于沉积室的内部。

公开(公告)号：US20140162385A1

公开(公告)日：2014-06-12

申请号：US14020849

申请日：2013-09-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo HUH ,  Suk-Won JUNG ,  Jeong-Ho YI ,  Sang-Hyuk HONG ,  Yong-Suk LEE

IPC: H01L27/32

CPC classification number: C23C16/042 ,  C23C16/4405 ,  C23C16/4585 ,  C23C16/50 ,  C23C16/52 ,  H01L21/681 ,  H01L21/682 ,  H01L21/68735 ,  H01L21/68742 ,  H01L27/3244 ,  H01L51/0012 ,  H01L51/56

Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.

Abstract translation: 一种用于通过使用相对于基板的掩模进行沉积处理的沉积装置，所述沉积装置包括室，所述室中的支撑单元，所述支撑单元包括第一孔并被构造成支撑所述基板，所述供给单元构造成 向衬底提供至少一个沉积原材料，以及通过支撑单元的第一孔的可移动对准单元，对准单元构造成支撑掩模并使掩模相对于衬底对准。