公开(公告)号：US20150184285A1

公开(公告)日：2015-07-02

申请号：US14558521

申请日：2014-12-02

Applicant: Samsung Display Co., LTD.

Inventor： Takayuki FUKASAWA ,  Yeon-Keon MOON ,  Sang-woo SOHN ,  Sang-Won SHIN ,  Katsushi KISHIMOTO

IPC: C23C14/35 ,  H01J37/34

CPC classification number: H01J37/3405 ,  C23C14/228 ,  C23C14/35 ,  H01J37/3447

Abstract: A sputtering apparatus includes a chamber, a plate disposed inside the chamber, a target unit including at least one targer facing the plate, a power supply unit coupled to the target, and a filter unit disposed between the substrate and the target. The filter unit includes at least one filter. A substrate is disposed on the plate. The filter unit may include a first filter and a second filter with the first filter disposed between the target and the second filter.

Abstract translation: 溅射装置包括室，设置在室内的板，包括面向板的至少一个更大的目标单元，耦合到靶的电源单元和布置在基板和靶之间的过滤器单元。 过滤器单元包括至少一个过滤器。 基板设置在板上。 过滤器单元可以包括第一过滤器和第二过滤器，其中第一过滤器设置在目标和第二过滤器之间。