OPTICAL SYSTEM AND LASER DEVICE INCLUDING THE SAME

    公开(公告)号:US20240019707A1

    公开(公告)日:2024-01-18

    申请号:US18347447

    申请日:2023-07-05

    CPC classification number: G02B27/0916 G02B27/0977 G02B27/0955

    Abstract: An optical system includes: a splitter reflecting a portion of a laser beam to form a reflected laser beam, and transmitting a portion of the laser beam to form a transmitted laser beam; a reflection module reflecting the laser beam from the splitter; an inversion module including a first lens having a first focal length and a first incident surface and a first exit surface opposite to the first incident surface, and a second lens having a second focal length and including a second incident surface and a second exit surface opposite to the second incident surface, in which the laser beam sequentially passes through the first lens and the second lens so that the transmitted laser beam is converted into an inverted laser beam; and a combiner reflecting the laser beam reflected from the reflection module and transmitting the inverted laser beam emitted from the inversion module.

    LASER IRRADIATION APPARATUS
    3.
    发明申请

    公开(公告)号:US20220063015A1

    公开(公告)日:2022-03-03

    申请号:US17314559

    申请日:2021-05-07

    Abstract: A laser irradiation apparatus includes a laser beam generator that generates a first laser beam, a beam expander that expands the first laser beam and outputs the expanded first laser beam as a second laser beam, a beam splitter that splits the second laser beam into third laser beams and outputs the third laser beams, and a beam condenser that condenses the third laser beams and outputs condensed third laser beams. The beam expander includes a first lens having a first focal length and a second lens having a second focal length. The first lens is disposed between the laser beam generator and the second lens, the second lens is disposed between the first lens and the beam splitter, and the laser beam generator is spaced apart from the first lens by the first focal length.

    METHOD OF MANUFACTURING DISPLAY DEVICE
    4.
    发明公开

    公开(公告)号:US20240107868A1

    公开(公告)日:2024-03-28

    申请号:US18225294

    申请日:2023-07-24

    CPC classification number: H10K71/233 H10K59/1201 H10K59/1213

    Abstract: A method of manufacturing a display device includes forming a first amorphous silicon layer on a substrate on which a first area and a second area are defined, forming a mask in the second area on the first amorphous silicon layer, forming a preliminary second amorphous silicon layer on the first amorphous silicon layer and the mask, forming a second amorphous silicon layer by removing a portion of the preliminary second amorphous silicon layer on the mask, removing the mask, and forming a polycrystalline silicon layer by crystallizing the first amorphous silicon layer and the second amorphous silicon layer.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230215871A1

    公开(公告)日:2023-07-06

    申请号:US18184639

    申请日:2023-03-15

    CPC classification number: H01L29/6675

    Abstract: A display device may include a substrate, a buffer layer on the substrate, a first active pattern on the buffer layer, the first active pattern having a first thickness, a second active pattern on the buffer layer spaced from the first active pattern and having a second thickness smaller than the first thickness, a first gate insulating layer on the first active pattern and the second active pattern, a first gate electrode on the first gate insulating layer, the first gate electrode overlapping the first active pattern, and a second gate electrode on the first gate insulating layer, the second gate electrode overlapping the second active pattern.

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