METHOD OF FABRICATING ZINC OXIDE THIN FILM
    3.
    发明申请
    METHOD OF FABRICATING ZINC OXIDE THIN FILM 审中-公开
    氧化锌薄膜的制备方法

    公开(公告)号:US20140144770A1

    公开(公告)日:2014-05-29

    申请号:US14089080

    申请日:2013-11-25

    IPC分类号: C23C14/00

    摘要: A method of fabricating a zinc oxide (ZnO) thin film in which the surface shape of the ZnO thin film can be controlled during deposition of the ZnO thin film. The method includes depositing the ZnO thin film on a substrate by chemical vapor deposition (CVD). The CVD feeds an etching gas that etches the ZnO thin film concurrently with a source gas and an oxidizer gas, thereby controlling the surface shape of the ZnO thin film that is being deposited.

    摘要翻译: 一种制造氧化锌(ZnO)薄膜的方法,其中可以在ZnO薄膜沉积期间控制ZnO薄膜的表面形状。 该方法包括通过化学气相沉积(CVD)将ZnO薄膜沉积在衬底上。 CVD将蚀刻气体与源气体和氧化剂气体同时蚀刻ZnO薄膜,从而控制正在沉积的ZnO薄膜的表面形状。

    Light Extraction Substrate For OLED And Method Of Fabricating The Same
    6.
    发明申请
    Light Extraction Substrate For OLED And Method Of Fabricating The Same 有权
    用于OLED的光提取衬底及其制造方法

    公开(公告)号:US20130330505A1

    公开(公告)日:2013-12-12

    申请号:US13914916

    申请日:2013-06-11

    IPC分类号: H01L51/52

    摘要: A light extraction substrate for an organic light-emitting device (OLED) which can improve the brightness of a display or an illumination system to which an OLED is applied by improving light extraction efficiency and a method of manufacturing the same. The light extraction substrate for an OLED includes an oxide or nitride thin film formed on a substrate body. The oxide or nitride thin film includes a base layer formed on the substrate body, a first texture formed on the base layer, the first texture having a plurality of first protrusions which protrude continuously or discontinuously from the base layer, and a second texture having a plurality of second protrusions which protrude continuously or discontinuously from each outer surface of the first protrusions.

    摘要翻译: 一种用于有机发光器件(OLED)的光提取衬底,其可以通过提高光提取效率来提高应用OLED的显示器或照明系统的亮度及其制造方法。 用于OLED的光提取基板包括形成在基板主体上的氧化物或氮化物薄膜。 氧化物或氮化物薄膜包括在基体上形成的基底层,形成在基底层上的第一纹理,第一纹理具有从基底层连续地或不连续突出的多个第一突起,以及具有 从第一突起的每个外表面连续地或不连续突出的多个第二突起。