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公开(公告)号：US10365560B2
公开(公告)日：2019-07-30
申请号：US15085530
申请日：2016-03-30
摘要： A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: wherein Ri51 represents a hydrogen atom or a methyl group, Ri52 and Ri53 each independently represent a hydrogen atom or a C1 to C12 hydrocarbon group, Ri54 represents a C5 to C20 alicyclic hydrocarbon group, Ri55 represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, and “p” represents an integer of 0 to 4.
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公开(公告)号：US09996002B2
公开(公告)日：2018-06-12
申请号：US14854963
申请日：2015-09-15
发明人： Takashi Nishimura , Shota Nakano , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20 , G03F7/32 , C08F222/18 , C08F220/22
CPC分类号： G03F7/0397 , C08F220/22 , C08F222/18 , C08F2222/185 , G03F7/0045 , G03F7/0046 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.
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3.发明申请公开(公告)号：US20180113382A1
公开(公告)日：2018-04-26
申请号：US15848634
申请日：2017-12-20
发明人： Takashi Nishimura , Koji Ichikawa
IPC分类号： G03F7/004 , C07C309/17 , C07C381/12 , G03F7/039 , C07D327/06 , G03F7/38 , C08F222/10
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D327/06 , C08F2222/1013 , G03F7/0046 , G03F7/0397 , G03F7/38
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.
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公开(公告)号：US09880466B2
公开(公告)日：2018-01-30
申请号：US15151618
申请日：2016-05-11
发明人： Takashi Nishimura , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/004 , C07C309/17 , C07C381/12 , C07D327/06 , G03F7/38 , C08F222/10
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D327/06 , C08F2222/1013 , G03F7/0046 , G03F7/0397 , G03F7/38
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.
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公开(公告)号：US11543749B2
公开(公告)日：2023-01-03
申请号：US17178794
申请日：2021-02-18
摘要： The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.
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公开(公告)号：US10599033B2
公开(公告)日：2020-03-24
申请号：US15848634
申请日：2017-12-20
发明人： Takashi Nishimura , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/004 , G03F7/38 , C07C309/17 , C07C381/12 , C07D327/06 , C08F222/10
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.
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公开(公告)号：US09519218B2
公开(公告)日：2016-12-13
申请号：US14854881
申请日：2015-09-15
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20 , G03F7/30 , G03F7/32 , G03F7/38 , C08F222/24 , C08F222/18 , C08F220/22 , C08F214/18 , C08F28/06
CPC分类号： G03F7/0397 , C08F28/06 , C08F214/186 , C08F220/22 , C08F222/18 , C08F222/24 , C08F2222/185 , C08F2222/245 , G03F7/0045 , G03F7/0046 , G03F7/2041 , G03F7/30 , G03F7/322 , G03F7/325 , G03F7/38
摘要： 1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
摘要翻译： 抗蚀剂组合物包括（A1）包含由式（a4）表示的结构单元的树脂和具有磺酰基的结构单元，并且该树脂不具有酸不稳定基团，（A2）具有酸的树脂 可酸性基团和酸发生剂。 其中R3表示氢原子或甲基，R4表示具有氟原子的C1至C24饱和烃基，饱和烃基中所含的亚甲基可以被氧原子或羰基代替。
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公开(公告)号：US11561471B2
公开(公告)日：2023-01-24
申请号：US15371702
申请日：2016-12-07
IPC分类号： G03F7/039 , G03F7/30 , G03F7/38 , C08F220/28 , C08F220/18
摘要： A photoresist composition comprising:
a resin which has a structural unit represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin;
an acid generator; and
a solvent.-
公开(公告)号：US10101657B2
公开(公告)日：2018-10-16
申请号：US15085443
申请日：2016-03-30
发明人： Masako Sugihara , Takashi Nishimura
IPC分类号： G03F7/004 , G03F7/30 , C08F212/02 , C08F216/10 , C08F216/12 , C08F216/14 , G03F7/039 , G03F7/075 , G03F7/085
摘要： A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Ri41 represents a hydrogen atom or a methyl group, Ri42 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom, Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, “p” represents an integer of 0 to 4, Z represents a divalent C3 to C20 hydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *—[(CH2)w—O]r— (Ia): wherein “w” and “r” each independently represents an integer of 1 to 10, and * represent a bonding position.
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公开(公告)号：US09599897B2
公开(公告)日：2017-03-21
申请号：US14835470
申请日：2015-08-25
发明人： Takashi Nishimura , Yuko Mukai , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/20 , G03F7/30 , G03F7/32 , G03F7/16 , G03F7/38 , G03F7/039 , C08F220/18 , C08F12/22 , C08F12/26 , C08F12/30 , C08F12/14 , C08F12/20 , C07C311/48 , C07C381/12
CPC分类号： G03F7/0045 , C07C311/48 , C07C381/12 , C07C2603/74 , C08F12/14 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/30 , C08F220/18 , G03F7/0046 , G03F7/0397 , G03F7/168 , G03F7/2041 , G03F7/30 , G03F7/32 , G03F7/38
摘要： A salt represented by the formula (I); wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation.
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