-
公开(公告)号：US11543749B2
公开(公告)日：2023-01-03
申请号：US17178794
申请日：2021-02-18
摘要： The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.
-
公开(公告)号：US09740097B2
公开(公告)日：2017-08-22
申请号：US15085220
申请日：2016-03-30
发明人： Masako Sugihara , Junji Nakanishi
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/0751 , G03F7/085 , G03F7/30
摘要： A resist composition contains: a resin having an acid-labile group, an acid generator, a compound having two or more phenolic-hydroxy groups and being other than a resin, and a solvent. The resist composition of the disclosure can provide a resist pattern showing excellent shape and detachability, therefore, the present resist composition can be used for semiconductor microfabrication with resist patterns showing excellent shape.
-
公开(公告)号：US10365560B2
公开(公告)日：2019-07-30
申请号：US15085530
申请日：2016-03-30
摘要： A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: wherein Ri51 represents a hydrogen atom or a methyl group, Ri52 and Ri53 each independently represent a hydrogen atom or a C1 to C12 hydrocarbon group, Ri54 represents a C5 to C20 alicyclic hydrocarbon group, Ri55 represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, and “p” represents an integer of 0 to 4.
-
公开(公告)号：US09182663B2
公开(公告)日：2015-11-10
申请号：US13903770
申请日：2013-05-28
发明人： Masako Sugihara , Maki Kawamura
CPC分类号： G03F7/0041 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/38
摘要： A photoresist composition comprising: a resin which shows an increase in solubility in an aqueous alkali solution by an action of an acid; an acid generator; a compound represented by formula (I); and a solvent the amount of which is from 40 to 75% by mass of the total amount of the photoresist composition: wherein the ring W1 is a nitrogen-containing heterocyclic ring, or a benzene ring having a substituted or unsubstituted amino group, A1 represents a phenyl group or a naphtyl group, and n represents an integer of 2 or 3.
摘要翻译： 一种光致抗蚀剂组合物，其包含：通过酸的作用显示在碱性水溶液中的溶解度增加的树脂; 酸发生器; 由式（I）表示的化合物; 和其量为光致抗蚀剂组合物总量的40〜75质量％的溶剂：其中，环W1为含氮杂环，或具有取代或未取代的氨基的苯环，A1表示 苯基或萘基，n表示2或3的整数。
-
公开(公告)号：US11561471B2
公开(公告)日：2023-01-24
申请号：US15371702
申请日：2016-12-07
IPC分类号： G03F7/039 , G03F7/30 , G03F7/38 , C08F220/28 , C08F220/18
摘要： A photoresist composition comprising:
a resin which has a structural unit represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin;
an acid generator; and
a solvent.-
公开(公告)号：US10969685B2
公开(公告)日：2021-04-06
申请号：US14491120
申请日：2014-09-19
发明人： Masako Sugihara , Maki Kawamura , Maiko Goda
摘要： A photoresist composition comprising: a resin which has an acid-labile group; an acid generator; a compound which has a sulfide bond and a mercapto group; and a solvent.
-
公开(公告)号：US10101657B2
公开(公告)日：2018-10-16
申请号：US15085443
申请日：2016-03-30
发明人： Masako Sugihara , Takashi Nishimura
IPC分类号： G03F7/004 , G03F7/30 , C08F212/02 , C08F216/10 , C08F216/12 , C08F216/14 , G03F7/039 , G03F7/075 , G03F7/085
摘要： A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Ri41 represents a hydrogen atom or a methyl group, Ri42 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom, Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, “p” represents an integer of 0 to 4, Z represents a divalent C3 to C20 hydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *—[(CH2)w—O]r— (Ia): wherein “w” and “r” each independently represents an integer of 1 to 10, and * represent a bonding position.
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.019 秒)
