专利检索 ap:("SUMITOMO CHEMICAL COMPANY, LIMITED") AND inv:"Maiko Goda" 第 1 页

1.

发明授权
Photoresist composition 有权

公开(公告)号：US10969685B2

公开(公告)日：2021-04-06

申请号：US14491120

申请日：2014-09-19

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Masako Sugihara , Maki Kawamura , Maiko Goda

IPC分类号： G03F7/038 , G03F7/039

摘要： A photoresist composition comprising: a resin which has an acid-labile group; an acid generator; a compound which has a sulfide bond and a mercapto group; and a solvent.