- 专利标题: Salt, resin, resist composition and method for producing resist pattern
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申请号: US14835470申请日: 2015-08-25
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公开(公告)号: US09599897B2公开(公告)日: 2017-03-21
- 发明人: Takashi Nishimura , Yuko Mukai , Koji Ichikawa
- 申请人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2014-170761 20140825
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/20 ; G03F7/30 ; G03F7/32 ; G03F7/16 ; G03F7/38 ; G03F7/039 ; C08F220/18 ; C08F12/22 ; C08F12/26 ; C08F12/30 ; C08F12/14 ; C08F12/20 ; C07C311/48 ; C07C381/12
摘要:
A salt represented by the formula (I); wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation.
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