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公开(公告)号:US11211415B2
公开(公告)日:2021-12-28
申请号:US16867141
申请日:2020-05-05
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Yuuji Inoue , Masashi Nakata
IPC: H01L27/146
Abstract: A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.
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2.
公开(公告)号:US20190214419A9
公开(公告)日:2019-07-11
申请号:US15722960
申请日:2017-10-02
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Yuuji Inoue , Masashi Nakata
IPC: H01L27/146
CPC classification number: H01L27/14621 , H01L27/14605 , H01L27/14623 , H01L27/14627 , H01L27/14634 , H01L27/14656 , H01L27/14685
Abstract: A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.
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公开(公告)号:US09780139B2
公开(公告)日:2017-10-03
申请号:US14764685
申请日:2014-12-03
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Yuuji Inoue , Masashi Nakata
IPC: H04N5/228 , H01L27/146 , H01L27/148 , H04N5/374 , H04N5/378 , H04N9/077
CPC classification number: H01L27/14645 , H01L27/14607 , H01L27/14612 , H01L27/14621 , H01L27/14623 , H01L27/14634 , H01L27/14685 , H01L27/14689 , H01L27/14818 , H04N5/374 , H04N5/378 , H04N9/077
Abstract: A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.
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公开(公告)号:US10680022B2
公开(公告)日:2020-06-09
申请号:US15722960
申请日:2017-10-02
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Yuuji Inoue , Masashi Nakata
IPC: H01L27/146
Abstract: A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.
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5.
公开(公告)号:US20190103430A1
公开(公告)日:2019-04-04
申请号:US15722960
申请日:2017-10-02
Applicant: SONY CORPORATION
Inventor: Hiroshi Tayanaka , Yuuji Inoue , Masashi Nakata
IPC: H01L27/146
Abstract: A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.
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6.
公开(公告)号:US10277847B2
公开(公告)日:2019-04-30
申请号:US14890460
申请日:2014-05-27
Applicant: SONY CORPORATION
Inventor: Masashi Nakata , Koji Takahashi , Yuuji Inoue , Kenji Ikeda , Osamu Oka , Yoshiro Hattori , Shinya Sato , Hideaki Kato , Yasuhiro Chouji , Emi Nishioka , Hiroshi Kawanobe
Abstract: There is provided a solid-state imaging device including: a pixel region that includes a plurality of pixels arranged in a two-dimensional matrix pattern. Some of the plurality of pixels are configured to be phase difference detection pixels that include a photoelectric conversion section disposed on a semiconductor substrate and a light blocking film disposed above a portion of the photoelectric conversion section. In particular a location of the light blocking film for the phase difference detection pixels varies according to a location of the phase difference detection pixel. For example, the location of the light blocking film for a phase difference detection pixel positioned at a periphery of the pixel region is different than a location of the light blocking film for a phase difference detection pixel positioned in a center portion of the pixel region.
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