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公开(公告)号:US10277847B2
公开(公告)日:2019-04-30
申请号:US14890460
申请日:2014-05-27
Applicant: SONY CORPORATION
Inventor: Masashi Nakata , Koji Takahashi , Yuuji Inoue , Kenji Ikeda , Osamu Oka , Yoshiro Hattori , Shinya Sato , Hideaki Kato , Yasuhiro Chouji , Emi Nishioka , Hiroshi Kawanobe
Abstract: There is provided a solid-state imaging device including: a pixel region that includes a plurality of pixels arranged in a two-dimensional matrix pattern. Some of the plurality of pixels are configured to be phase difference detection pixels that include a photoelectric conversion section disposed on a semiconductor substrate and a light blocking film disposed above a portion of the photoelectric conversion section. In particular a location of the light blocking film for the phase difference detection pixels varies according to a location of the phase difference detection pixel. For example, the location of the light blocking film for a phase difference detection pixel positioned at a periphery of the pixel region is different than a location of the light blocking film for a phase difference detection pixel positioned in a center portion of the pixel region.