公开(公告)号：US20240027653A1

公开(公告)日：2024-01-25

申请号：US18220473

申请日：2023-07-11

Applicant: SK Innovation Co., Ltd.

Inventor： Chun Ho Kim ,  Cheol Min Yun

IPC: G02B1/14 ,  C09D179/08 ,  C09D183/04

CPC classification number: G02B1/14 ,  C09D179/08 ,  C09D183/04

Abstract: Provided is an optical multilayer structure including a shatterproof layer including a polyimide resin including a siloxane structure and an adhesion promoting layer. Since the adhesion promoting layer and the shatterproof layer of the optical multilayer structure according to one implementation are connected by a chemical bond (imide bond), interlayer adhesiveness is high and durability is excellent. In addition, the optical multilayer structure according to one implementation has excellent heat resistance, so that curling is reduced to minimize substrate bending, has high surface hardness, so that mechanical properties are excellent, and has a low haze and is transparent, so that optical properties are excellent.

公开(公告)号：US20240019607A1

公开(公告)日：2024-01-18

申请号：US18201236

申请日：2023-05-24

Applicant: SK Innovation Co., Ltd.

Inventor： Cheol Min Yun ,  Chun Ho Kim

IPC: G02B1/14 ,  G02B1/00

CPC classification number: G02B1/14 ,  G02B1/002

Abstract: An optical multilayer structure including: a substrate; a shatterproof layer which is formed on at least one surface of the substrate and includes a polyimide film including a polyimide precursor, a polyimide, or a combination thereof including a structure of the following Chemical Formula 1, and inorganic particles; and a hard coating layer formed on the other surface of the substrate:






wherein R1 and R2 are independently of each other C1-5 alkyl which is unsubstituted or substituted with one or more halogens; R3 and R4 are independently of each other C6-10 aryl which is unsubstituted or substituted with one or more halogens; L1 and L2 are independently of each other C1-10 alkylene; and x and y are independently of each other an integer of 1 or more.

公开(公告)号：US20230374344A1

公开(公告)日：2023-11-23

申请号：US18200114

申请日：2023-05-22

Applicant: SK Innovation Co., Ltd.

Inventor： Cheol Min Yun ,  Chun Ho Kim

IPC: C09D179/08 ,  C08G73/10 ,  C08K3/36 ,  C09D183/06 ,  C09D7/61 ,  B32B17/10 ,  C03C17/34

CPC classification number: C09D179/08 ,  C08G73/106 ,  C08G73/1071 ,  C08G73/1042 ,  C08K3/36 ,  C09D183/06 ,  C09D7/61 ,  B32B17/10018 ,  B32B17/10733 ,  B32B17/10807 ,  C03C17/3405 ,  B32B2457/20 ,  B32B2255/20 ,  C03C2217/78 ,  C03C2218/11

Abstract: Provided are polyimide precursor composition including a polyimide precursor including a siloxane structure, and inorganic particles, and an optical multilayer structure including a structure in which a polyimide shatterproof layer formed using the composition is formed on a substrate. The optical multilayer structure according to one implementation is less curled to minimize substrate bending and has significantly improved surface hardness, and thus, has excellent mechanical properties.

公开(公告)号：US20230257525A1

公开(公告)日：2023-08-17

申请号：US18108875

申请日：2023-02-13

Applicant: SK Innovation Co., Ltd.

Inventor： Cheol Min Yun ,  Chun Ho Kim ,  Hye Jin Park ,  Chang Q Lee

IPC: C08G73/10 ,  C08J5/18 ,  C09D179/08 ,  C09D7/20

CPC classification number: C08G73/106 ,  C08G73/1032 ,  C08G73/1042 ,  C08G73/1082 ,  C08J5/18 ,  C09D179/08 ,  C09D7/20 ,  C08J2379/08

Abstract: Provided is a polyimide precursor composition including a polyimide precursor including a siloxane structure and a solvent having a negative partition coefficient (log P). The polyimide precursor composition may be used to alleviate thermal expansion-contraction behavior, thereby producing a polyimide film with minimal curling.