System and method for automatically correcting for rotational misalignment of wafers on film frames

    公开(公告)号:US10128140B2

    公开(公告)日:2018-11-13

    申请号:US14424427

    申请日:2013-09-02

    Inventor: Jing Lin

    Abstract: Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.

    SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES
    2.
    发明申请
    SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES 审中-公开
    用于自动校正电影框架上波形旋转偏差的系统和方法

    公开(公告)号:US20150228522A1

    公开(公告)日:2015-08-13

    申请号:US14424427

    申请日:2013-09-02

    Inventor: Jing Lin

    Abstract: Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.

    Abstract translation: 自动校正不正确地安装在胶片框架上的晶片的旋转未对准包括在通过检查系统启动晶片检查过程之前使用图像捕获装置捕获晶片的部分图像; 数字地确定晶片相对于胶片框架的旋转未对准角度和旋转未对准方向和/或图像捕获装置的视场的一组参考轴; 以及通过与检查系统分离的胶片框架处理装置校正晶片的旋转未对准,所述检查系统被配置为沿与旋转未对准方向相反的方向旋转胶片框架跨过旋转未对准角度。 在胶片框架放置在晶片台上之前,胶片框架旋转可能发生,而不会降低胶片框架处理量或检查处理量。

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