NON-PLUGGING D.C. PLASMA GUN
    5.
    发明申请
    NON-PLUGGING D.C. PLASMA GUN 审中-公开
    非扩散等离子枪

    公开(公告)号:US20140318318A1

    公开(公告)日:2014-10-30

    申请号:US14328360

    申请日:2014-07-10

    Abstract: A plasma gun system comprising: a plasma gun comprising an outlet, wherein the plasma gun is configured to generate a plasma stream and provide the plasma stream to the outlet; and a plasma gun extension assembly configured to be coupled to the plasma gun, wherein the plasma gun extension assembly comprises an extension chamber and a port, the extension chamber having an interior diameter defined by a chamber wall and being configured to receive the plasma stream from the outlet of the plasma gun and to enable the plasma stream to expand upon entering the extension chamber, and the port being configured to introduce a powder to the expanded plasma stream at a location outside of the plasma gun.

    Abstract translation: 一种等离子枪系统,包括:等离子体枪,其包括出口,其中所述等离子体枪被配置为产生等离子体流并将等离子流提供给所述出口; 以及等离子体枪延伸组件,其被配置为耦合到所述等离子体枪,其中所述等离子体枪延伸组件包括延伸室和端口,所述延伸室具有由室壁限定的内部直径,并且被配置为从 等离子体枪的出口并且使等离子体流在进入延伸室时能够膨胀,并且该端口构造成在等离子体枪外部的位置处将粉末引入到扩展的等离子体流中。

    HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM
    7.
    发明申请
    HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM 审中-公开
    使用等离子体系统的高通量颗粒生产

    公开(公告)号:US20140263190A1

    公开(公告)日:2014-09-18

    申请号:US14207087

    申请日:2014-03-12

    CPC classification number: B05B7/226 C23C4/134

    Abstract: The present disclosure relates to a nanoparticle production system and methods of using the system. The nanoparticle production system includes a plasma gun including a male electrode, a female electrodes and a working gas supply configured to deliver a working gas in a vortexing helical flow direction across a plasma generation region. The system also includes a continuous feed systems, a quench chamber, a cooling conduit that includes a laminar flow disruptor, a system overpressure module, and a conditioning fluid purification and recirculation system.

    Abstract translation: 本公开涉及纳米颗粒生产系统和使用该系统的方法。 纳米颗粒生产系统包括等离子体枪,其包括阳电极,阴电极和工作气体供应,其被配置为跨越等离子体产生区域以涡旋螺旋流动方向输送工作气体。 该系统还包括连续进料系统,骤冷室,包括层流破坏器的冷却导管,系统超压模块和调节流体净化和再循环系统。

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