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公开(公告)号：US10006872B2
公开(公告)日：2018-06-26
申请号：US14955331
申请日：2015-12-01
发明人： Wonguk Seo , Kyoungchon Kim , Kuihyun Yoon , Kyunlae Kim , Jaeyoung Park , Kyoungho Yang , Young Heo
IPC分类号： G01N21/958 , G01N21/88 , G01N21/94 , G01N21/95
CPC分类号： G01N21/94 , G01N21/8806 , G01N21/958 , G01N2021/9513
摘要： Provided is an optical inspection system including a supporting unit, allowing a target object to be loaded thereon, a light source unit configured to emit a laser beam toward the target object, a light condensing unit collecting scattered light that is scattered at the target object when the laser beam is irradiated onto the target object, and a control unit controlling the light source unit and the light condensing unit and analyzing the scattered light to examine whether there are pollutants on the target object. The supporting unit may include a first supporting unit, on which the target object is disposed, and which is formed of a first material, and a second supporting unit, which is disposed under the first supporting unit and is formed of a second material different from the first material.
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公开(公告)号：US20230187236A1
公开(公告)日：2023-06-15
申请号：US17889035
申请日：2022-08-16
发明人： Wonguk Seo , Seok Heo , Sungwook Kang , Byeongsang Kim , Sungkun Hwang , Igor Ivanov
IPC分类号： H01L21/67 , H01L21/687 , H05B3/26 , F27B17/00 , F27D5/00 , B32B9/00 , B32B9/04 , B32B18/00 , B32B7/12 , B32B3/30 , B32B3/14
CPC分类号： H01L21/67109 , B32B3/14 , B32B3/30 , B32B7/12 , B32B9/04 , B32B9/007 , B32B9/041 , B32B18/00 , F27B17/0025 , F27D5/0037 , H01L21/6875 , H05B3/265 , B32B2255/205 , B32B2307/302 , H05B2203/005 , H05B2214/04
摘要： A wafer baking apparatus includes a chamber including a processing space, and a wafer heater disposed in the processing space and configured to support a wafer. The wafer heater includes a first heating plate, a heating resistance pattern disposed on a lower surface of the first heating plate, a second heating plate disposed on the first heating plate, and a heat dispersion layer interposed between the first and second heating plates and having thermal conductivity lower than a thermal conductivity of materials of the first and second heating plates.
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公开(公告)号：US11590460B2
公开(公告)日：2023-02-28
申请号：US17239644
申请日：2021-04-25
发明人： Wonguk Seo , Sungyong Park , Hongju Kim , Ansook Sul , Seok Heo , Yinghu Xu
IPC分类号： B01F23/10 , B01F23/231 , B01F101/56
摘要： A chemical solution vaporization device includes a chemical solution tank including chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room. A first internal wall separating the plurality of chemical solution vaporization rooms from each other includes a first opening at a lower portion thereof. A second internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room includes a second opening at a lower portion thereof. A third internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room includes a third opening at a lower portion thereof. And a lower portion of a fourth internal wall separating the chemical solution sensing room from the chemical solution supply room is combined with the lower wall.
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公开(公告)号：US10532896B2
公开(公告)日：2020-01-14
申请号：US15991668
申请日：2018-05-29
发明人： Kuihyun Yoon , Wonguk Seo , Young Heo
IPC分类号： B65G49/06 , G01N21/88 , H01L21/677
摘要： A substrate inspection system includes a floating unit that floats a substrate, an inspection unit disposed above the floating unit, a grip unit disposed below the inspection unit and including a first grip member that holds the substrate on the floating unit, a grip transfer unit that moves the grip unit in a first direction, and an illumination unit that generates light. The inspection unit inspects the substrate that floats on the floating unit, the illumination unit is disposed on a moving path of the grip unit, and the light generated by the illumination unit is irradiated onto the inspection unit. The first grip member includes a first adsorption pad that adsorbs the substrate, and a first support member that supports the first adsorption pad and that includes a first opening into which the illumination unit is inserted.
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公开(公告)号：US20190092580A1
公开(公告)日：2019-03-28
申请号：US15991668
申请日：2018-05-29
发明人： KUIHYUN YOON , Wonguk Seo , Young Heo
IPC分类号： B65G49/06 , H01L21/677 , G01N21/88
CPC分类号： B65G49/065 , B65G49/064 , G01N21/8806 , G01N21/9501 , H01L21/67288 , H01L21/67784
摘要： A substrate inspection system includes a floating unit that floats a substrate, an inspection unit disposed above the floating unit, a grip unit disposed below the inspection unit and including a first grip member that holds the substrate on the floating unit, a grip transfer unit that moves the grip unit in a first direction, and an illumination unit that generates light. The inspection unit inspects the substrate that floats on the floating unit, the illumination unit is disposed on a moving path of the grip unit, and the light generated by the illumination unit is irradiated onto the inspection unit. The first grip member includes a first adsorption pad that adsorbs the substrate, and a first support member that supports the first adsorption pad and that includes a first opening into which the illumination unit is inserted.
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公开(公告)号：US20160290933A1
公开(公告)日：2016-10-06
申请号：US14955331
申请日：2015-12-01
发明人： Wonguk Seo , Kyoungchon KIM , Kuihyun YOON , Kyunlae KIM , Jaeyoung PARK , Kyoungho YANG , Young HEO
IPC分类号： G01N21/94 , G01N21/958 , G01N21/88
CPC分类号： G01N21/94 , G01N21/8806 , G01N21/958 , G01N2021/9513
摘要： Provided is an optical inspection system including a supporting unit, allowing a target object to be loaded thereon, a light source unit configured to emit a laser beam toward the target object, a light condensing unit collecting scattered light that is scattered at the target object when the laser beam is irradiated onto the target object, and a control unit controlling the light source unit and the light condensing unit and analyzing the scattered light to examine whether there are pollutants on the target object. The supporting unit may include a first supporting unit, on which the target object is disposed, and which is formed of a first material, and a second supporting unit, which is disposed under the first supporting unit and is formed of a second material different from the first material.
摘要翻译： 提供了一种光学检查系统，包括：允许目标物体被装载在其上的支撑单元，被构造成朝向目标物体发射激光束的光源单元，收集在目标物体处散射的散射光的聚光单元， 激光束被照射到目标物体上，控制单元控制光源单元和聚光单元并分析散射光以检查目标物体上是否存在污染物。 所述支撑单元可以包括第一支撑单元，所述目标物体设置在所述第一支撑单元上，并且所述第一支撑单元由第一材料形成，所述第二支撑单元设置在所述第一支撑单元的下方，并且由不同于 第一种材料。
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