公开(公告)号：USD785611S1

公开(公告)日：2017-05-02

申请号：US29539249

申请日：2015-09-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Designer： Minhyouk Lee ,  Seungho Lee ,  Kisung Kim ,  Jaewoong Chung ,  Duyeong Choi ,  Jisu Hwang

公开(公告)号：US11567879B2

公开(公告)日：2023-01-31

申请号：US17118091

申请日：2020-12-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Youngmin Jo ,  Daeseok Byeon ,  Kisung Kim

IPC: G06F12/14 ,  G06F21/72 ,  G06F21/79 ,  G06F21/85 ,  H04L9/06 ,  G06F21/74

Abstract: A method of encrypting data in a nonvolatile memory device (NVM) includes; programming data in selected memory cells, sensing the selected memory cells at a first time during a develop period to provide random data, sensing the selected memory cells at a second time during the develop period to provide main data, encrypting the main data using the random data to generate encrypted main data, and outputting the encrypted main data to an external circuit, wherein the randomness of the random data is based on a threshold voltage distribution of the selected memory cells.

公开(公告)号：USD789317S1

公开(公告)日：2017-06-13

申请号：US29539218

申请日：2015-09-11

Applicant: Samsung Electronics Co., Ltd.

Designer： Minhyouk Lee ,  Seungho Lee ,  Kisung Kim ,  Jaewoong Chung ,  Duyeong Choi ,  Jisu Hwang

公开(公告)号：US11736599B2

公开(公告)日：2023-08-22

申请号：US17682750

申请日：2022-02-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Ha ,  Sungmin Shin ,  Kisung Kim ,  Minhoo Park

IPC: H04M1/02 ,  G02B5/00 ,  G02B5/08

CPC classification number: H04M1/0283 ,  G02B5/003 ,  G02B5/0808

Abstract: Disclosed is a cover for an electronic device and includes a transparent substrate including a first surface and a second surface opposite to the first surface, a pattern layer having a first color and formed on a first area and a second area of the second surface of the transparent substrate, the pattern layer including one or more holes formed in a portion of the pattern layer corresponding to the second area, a light reflection layer formed beneath the pattern layer and including a reflecting surface facing the pattern layer, and a color layer having a second color different than the first color, the color layer being formed between the pattern layer and the light reflection layer, wherein the reflecting surface is formed such that light reflected on the reflecting surface passes through the color layer and at least a portion of the one or more holes.

公开(公告)号：US11493955B2

公开(公告)日：2022-11-08

申请号：US16937725

申请日：2020-07-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Ha ,  Wonseok Oh ,  Saewon Kwon ,  Kisung Kim ,  Sangkyu Park ,  Junghyuck Im

IPC: G06F1/16

Abstract: An electronic device according to an embodiment includes: a front plate facing a first direction; a rear plate facing a second direction opposite to the first direction; and a support member including a first camera and a second camera, and disposed between the front plate and the rear plate, and, when the front plate slides in a third direction in a first state in which the first camera is occluded by the front plate and the second camera is occluded by the rear plate, the electronic device is configured into a second state in which the first camera is visible, and when the front plate slides in a fourth direction opposite to the third direction in the first state, the support member is configured to slide along with the front plate and the electronic device is configured into a third state in which the second camera is visible.

公开(公告)号：USD772230S1

公开(公告)日：2016-11-22

申请号：US29539251

申请日：2015-09-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Designer： Minhyouk Lee ,  Seungho Lee ,  Kisung Kim ,  Jaewoong Chung ,  Duyeong Choi ,  Jisu Hwang

公开(公告)号：US12282249B2

公开(公告)日：2025-04-22

申请号：US17859288

申请日：2022-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kisung Kim ,  Donggon Woo ,  Heejun Lee ,  Dongho Kim

IPC: G03F1/36 ,  G03F1/70 ,  G03F7/00

Abstract: A full-chip cell critical dimension (CD) correction method and a method of manufacturing a mask by using the same are provided. The full-chip cell CD correction method includes receiving a database (DB) about a full-shot; analyzing a hierarchy of the DB; generating a density map of a full-chip by using the DB and converting the density map into a retarget rule table, the converting including mapping the density map by using a density rule; reconfiguring cell blocks of the full-chip into an optical proximity correction (OPC) target cell layout for OPC; applying a first bias to the OPC target cell layout, based on the retarget rule table; and generating an optical proximity corrected (OPC'ed) layout for the full-chip by performing hierarchical OPC.

公开(公告)号：USD1067904S1

公开(公告)日：2025-03-25

申请号：US29889534

申请日：2023-04-13

Applicant: Samsung Electronics Co., Ltd.

Designer： Ki-Eon Lee ,  Saewon Kwon ,  Seungbin Im ,  Keemoon Lee ,  Kisung Kim ,  Sangsik Park

公开(公告)号：USD959424S1

公开(公告)日：2022-08-02

申请号：US29739327

申请日：2020-06-24

Applicant: Samsung Electronics Co., Ltd.

Designer： Jisang Park ,  Kisung Kim

公开(公告)号：US11265409B2

公开(公告)日：2022-03-01

申请号：US16530031

申请日：2019-08-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Ha ,  Sungmin Shin ,  Kisung Kim ,  Minhoo Park

IPC: H04M1/02 ,  G02B5/00 ,  G02B5/08

Abstract: A cover window is provided that includes a glass substrate, an optical pattern layer stacked on a first area and a second area of the glass substrate, the optical pattern layer having a plurality of patterns formed in the second area, a color layer stacked on the optical pattern layer having the plurality of patterns formed therein; and a mirror layer stacked on the color layer such that the mirror layer and the color layer are separated from each other, wherein in the second area of the glass substrate, natural light exhibits a color of the color layer due to an optical reaction between the color layer and the mirror layer.