METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGES

    公开(公告)号:US20240404931A1

    公开(公告)日:2024-12-05

    申请号:US18436993

    申请日:2024-02-08

    Abstract: A method includes: forming a first photoresist layer on a first insulating layer; forming a first photoresist pattern having first opening patterns using a first exposure mask; etching the first insulating layer using the first photoresist pattern to form first via holes; removing the first photoresist pattern; forming a second photoresist layer on the first insulating layer; forming a second photoresist pattern having second opening patterns using a second exposure mask; etching the first insulating layer using the second photoresist pattern to form second via holes; removing the first photoresist pattern; forming a redistribution wiring layer on the first insulating layer, the redistribution wiring layer having first redistribution wirings connected to first bonding pads under the first insulating layer through the via holes; and mounting a semiconductor chip on the redistribution wiring layer, the semiconductor chip comprising chip pads connected to the first redistribution wirings.

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