公开(公告)号：US11729896B2

公开(公告)日：2023-08-15

申请号：US17468644

申请日：2021-09-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jihoon Na ,  Mun Ja Kim ,  Jaewhan Sung ,  Byungchul Yoo ,  Jibeom Yoo ,  Hakseok Lee ,  Myeongjin Jeong ,  Hyunjune Cho

IPC: H05G2/00 ,  G03F7/20 ,  G02B5/20 ,  G02B5/08 ,  G03F7/00

CPC classification number: H05G2/008 ,  G02B5/0891 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

Abstract: An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

公开(公告)号：US11073757B2

公开(公告)日：2021-07-27

申请号：US16598180

申请日：2019-10-10

Applicant: Samsung Electronics Co., Ltd. ,  Research & Business Foundation SUNGKYUNKWAN UNIVERSITY

Inventor： Mun Ja Kim ,  Seulgi Kim ,  Kibong Nam ,  Jinho Yeo ,  Jibeom Yoo

IPC: G03F1/64 ,  G03F1/62

Abstract: Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.