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公开(公告)号:US20230269933A1
公开(公告)日:2023-08-24
申请号:US18049839
申请日:2022-10-26
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jaepil LEE , Minhee Cho
IPC: H01L27/108 , H01L29/08 , H01L29/24
CPC classification number: H01L27/10814 , H01L29/0847 , H01L29/24
Abstract: A transistor structure including an active pattern defined by a first isolation pattern on a substrate, a second isolation pattern at an upper portion of the active pattern, a gate structure extending through the active pattern and the first isolation pattern, at least a lower portion of the gate structure extending through the second isolation pattern, a first oxide semiconductor pattern on a lower surface and a sidewall of the gate structure, the first oxide semiconductor pattern including In-rich IGZO and at least partially contacting the first and second isolation patterns, and source/drain regions at upper portions of the active pattern adjacent to the gate structure may be provided.
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2.
公开(公告)号:US20230337418A1
公开(公告)日:2023-10-19
申请号:US18211807
申请日:2023-06-20
Applicant: Samsung Electronics CO., LTD.
Inventor: Jaepil LEE , Chulkwon Park
IPC: H10B12/00 , G11C11/4074 , G11C11/408 , G11C11/4091
CPC classification number: H10B12/50 , H10B12/315 , G11C11/4074 , G11C11/4085 , G11C11/4087 , G11C11/4091
Abstract: A memory core circuit includes a memory cell array including sub cell arrays and a core control circuit, which includes sub peripheral circuits that are disposed under each sub cell array. Each sub peripheral circuit includes a sense amplifier region, which includes a plurality of bitline sense amplifiers, and a rest circuit region, which includes other circuits. First-type bitline sense amplifiers, which are connected to first-type bitlines, are disposed in the sense amplifier region of each sub peripheral circuit, and the first-type bitlines are disposed above the sense amplifier region of each sub peripheral circuit. Second-type bitline sense amplifiers, which are connected to second-type bitlines, are disposed in the sense amplifier region of a neighboring sub peripheral circuit adjacent in the column direction to a first sub peripheral circuit of the sub peripheral circuit, and the second-type bitlines are disposed above the rest region of each sub peripheral circuit.
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3.
公开(公告)号:US20230232614A1
公开(公告)日:2023-07-20
申请号:US18095041
申请日:2023-01-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jaepil LEE , Hijung KIM
IPC: H10B12/00
CPC classification number: H10B12/34 , H10B12/485 , H10B12/053
Abstract: A semiconductor device includes a semiconductor substrate, an active region on the semiconductor substrate and including a first semiconductor material, an isolation layer on the semiconductor substrate and a side surface of the active region, a first gate structure in a first gate trench crossing the active region, a second gate structure in a second gate trench in the isolation layer, the second gate structure being parallel to the first gate structure and adjacent to the active region, a semiconductor layer covering at least a part of the side surface of the active region, the semiconductor layer including a second semiconductor material different from the first semiconductor material, and at least a part of the semiconductor layer being between the active region and the second gate structure, and source/drain regions in the active region on opposite sides of the first gate trench.
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