TRANSISTOR STRUCTURE AND SEMICONDUCTOR DEVICE USING THE SAME

    公开(公告)号:US20230269933A1

    公开(公告)日:2023-08-24

    申请号:US18049839

    申请日:2022-10-26

    CPC classification number: H01L27/10814 H01L29/0847 H01L29/24

    Abstract: A transistor structure including an active pattern defined by a first isolation pattern on a substrate, a second isolation pattern at an upper portion of the active pattern, a gate structure extending through the active pattern and the first isolation pattern, at least a lower portion of the gate structure extending through the second isolation pattern, a first oxide semiconductor pattern on a lower surface and a sidewall of the gate structure, the first oxide semiconductor pattern including In-rich IGZO and at least partially contacting the first and second isolation patterns, and source/drain regions at upper portions of the active pattern adjacent to the gate structure may be provided.

    MEMORY CORE CIRCUIT HAVING CELL ON PERIPHERY STRUCTURE AND MEMORY DEVICE INCLUDING THE SAME

    公开(公告)号:US20230337418A1

    公开(公告)日:2023-10-19

    申请号:US18211807

    申请日:2023-06-20

    Abstract: A memory core circuit includes a memory cell array including sub cell arrays and a core control circuit, which includes sub peripheral circuits that are disposed under each sub cell array. Each sub peripheral circuit includes a sense amplifier region, which includes a plurality of bitline sense amplifiers, and a rest circuit region, which includes other circuits. First-type bitline sense amplifiers, which are connected to first-type bitlines, are disposed in the sense amplifier region of each sub peripheral circuit, and the first-type bitlines are disposed above the sense amplifier region of each sub peripheral circuit. Second-type bitline sense amplifiers, which are connected to second-type bitlines, are disposed in the sense amplifier region of a neighboring sub peripheral circuit adjacent in the column direction to a first sub peripheral circuit of the sub peripheral circuit, and the second-type bitlines are disposed above the rest region of each sub peripheral circuit.

    SEMICONDUCTOR DEVICE INCLUDING ACTIVE REGION AND SEMICONDUCTOR LAYER ON SIDE SURFACE OF ACTIVE REGION

    公开(公告)号:US20230232614A1

    公开(公告)日:2023-07-20

    申请号:US18095041

    申请日:2023-01-10

    CPC classification number: H10B12/34 H10B12/485 H10B12/053

    Abstract: A semiconductor device includes a semiconductor substrate, an active region on the semiconductor substrate and including a first semiconductor material, an isolation layer on the semiconductor substrate and a side surface of the active region, a first gate structure in a first gate trench crossing the active region, a second gate structure in a second gate trench in the isolation layer, the second gate structure being parallel to the first gate structure and adjacent to the active region, a semiconductor layer covering at least a part of the side surface of the active region, the semiconductor layer including a second semiconductor material different from the first semiconductor material, and at least a part of the semiconductor layer being between the active region and the second gate structure, and source/drain regions in the active region on opposite sides of the first gate trench.

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